JPS63204513A - Apparatus for producing magnetic recording medium - Google Patents
Apparatus for producing magnetic recording mediumInfo
- Publication number
- JPS63204513A JPS63204513A JP3592987A JP3592987A JPS63204513A JP S63204513 A JPS63204513 A JP S63204513A JP 3592987 A JP3592987 A JP 3592987A JP 3592987 A JP3592987 A JP 3592987A JP S63204513 A JPS63204513 A JP S63204513A
- Authority
- JP
- Japan
- Prior art keywords
- evaporation source
- vapor
- vapor flow
- flow control
- evaporation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005291 magnetic effect Effects 0.000 title claims description 18
- 238000001704 evaporation Methods 0.000 claims abstract description 56
- 230000008020 evaporation Effects 0.000 claims abstract description 55
- 238000010438 heat treatment Methods 0.000 claims abstract description 29
- 239000003302 ferromagnetic material Substances 0.000 claims abstract description 16
- 230000006698 induction Effects 0.000 claims abstract description 14
- 239000000758 substrate Substances 0.000 claims abstract description 14
- 238000004519 manufacturing process Methods 0.000 claims description 15
- 238000007740 vapor deposition Methods 0.000 abstract description 15
- 229920000642 polymer Polymers 0.000 abstract description 9
- 239000011810 insulating material Substances 0.000 abstract description 3
- 238000000465 moulding Methods 0.000 abstract description 2
- 239000000463 material Substances 0.000 description 10
- 238000010894 electron beam technology Methods 0.000 description 8
- 239000010408 film Substances 0.000 description 6
- -1 polyethylene terephthalate Polymers 0.000 description 4
- 238000000151 deposition Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 239000004698 Polyethylene Substances 0.000 description 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 229920000573 polyethylene Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004962 Polyamide-imide Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 239000010425 asbestos Substances 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229910052895 riebeckite Inorganic materials 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
Landscapes
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は真空蒸着等に使用する蒸着装置、特に基体と強
磁性材料蒸発源との間に蒸気流制御壁面を備えてなる磁
気記録媒体の製造装置に関するものである。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to an evaporation apparatus used for vacuum evaporation, etc., and particularly to a magnetic recording medium comprising a vapor flow control wall surface between a substrate and a ferromagnetic material evaporation source. This relates to manufacturing equipment.
近年、記録密度が一段と優れたものとして、強磁性材料
を薄膜として基体上に被着してなる、所謂金泥薄膜型磁
気記録媒体が注目を集めている。In recent years, so-called gold mud thin film magnetic recording media, which are formed by depositing a ferromagnetic material as a thin film on a substrate, have been attracting attention as a medium with even higher recording density.
この様な金泥薄膜型磁気記録媒体は、通常真空状態で、
蒸着・スパッタ等によって製造されるものである。Such a gold mud thin film type magnetic recording medium is usually in a vacuum state.
It is manufactured by vapor deposition, sputtering, etc.
従来の蒸着装置の１例を第２図を用いて説明すると、真
空［１は真空ポンプ１４によって真空雰囲気に保たれて
おり、強磁性材料３は蒸発源２ｂにおいて、電子銃用電
源１６によって電子銃１５より発せられる電子ビームに
より蒸発させられる。An example of a conventional vapor deposition apparatus will be described with reference to FIG. 2. A vacuum [1] is maintained in a vacuum atmosphere by a vacuum pump 14, and a ferromagnetic material 3 is heated with electrons by an electron gun power source 16 in an evaporation source 2b. It is vaporized by the electron beam emitted from the gun 15.
−刃高分子成形物基体９は送り出しロール６から送りだ
され、蒸着ドラム７上でマスク１０によって入射角を規
制された強磁性材料３の蒸気が蒸着され、巻き取りロー
ル８に巻き取られる。- Blade The polymer molded substrate 9 is sent out from the delivery roll 6, and the vapor of the ferromagnetic material 3 whose incident angle is regulated by the mask 10 is deposited on the vapor deposition drum 7, and then wound onto the take-up roll 8.
電子ビームの通路１７を確保するために蒸発源１２と蒸
気流制御壁面１８との間には間隙１９が設けられている
のが基本的な装置であった。しかしながらこの間隙１９
から蒸発源２ｂよりの強磁性利料３の蒸気が散乱して蒸
着効率がよくなかったので、改良装置として蒸発源２ｂ
に蒸気流制御壁面１８を接続させ蒸気流制御壁面１８の
上部から電子ビームが入射可能な様に蒸気流制御壁面１
８の一部を外方に拡げたものが開示されている（例えば
特開昭５７−１９４２５２号公報参＠） 。The basic device was that a gap 19 was provided between the evaporation source 12 and the vapor flow control wall surface 18 in order to secure a passage 17 for the electron beam. However, this gap 19
Since the vapor of the ferromagnetic material 3 from the evaporation source 2b was scattered and the evaporation efficiency was not good, we decided to use the evaporation source 2b as an improved device.
The vapor flow control wall surface 18 is connected to the vapor flow control wall surface 1 so that the electron beam can be incident from the upper part of the vapor flow control wall surface 18.
8 has been disclosed in which a part of it is expanded outward (for example, see Japanese Patent Application Laid-open No. 57-194252@).
しかしながら、電子ビームによる蒸着装置ではやはり蒸
着効率を良くする事は難しく、さらに、蒸気流制御壁面
を加熱するために通電加熱を行うと、壁面に流れる電流
の影響により、電子銃の電子ビームを収束するための磁
場が乱れ、充分な蒸発速度が得られなくなるといった欠
点を持っていた。However, it is still difficult to improve the evaporation efficiency with electron beam evaporation equipment, and furthermore, when current heating is used to heat the vapor flow control wall surface, the electron beam of the electron gun is focused due to the influence of the current flowing through the wall surface. This had the disadvantage that the magnetic field used for this process was disturbed, making it impossible to obtain a sufficient evaporation rate.
本発明の目的は上記問題点を解消し、蒸発源よりの蒸発
効率を向上させ、蒸発速度も充分な磁気記録媒体の製造
装置を提供することにある。SUMMARY OF THE INVENTION An object of the present invention is to solve the above-mentioned problems and provide an apparatus for manufacturing a magnetic recording medium that improves the evaporation efficiency of an evaporation source and has a sufficient evaporation rate.
本発明者等は上記問題点解決のため鋭！努力した結果
■ 蒸気流制御壁面を蒸発源の直上に配し、蒸気流の周
囲を完全に包囲させること。The inventors have worked hard to solve the above problems! As a result of our efforts ■ A vapor flow control wall was placed directly above the evaporation source to completely surround the vapor flow.
■ 蒸発源の加熱手段として蒸発速度の速い高周波誘導
加熱手段を用いること。■ Use high-frequency induction heating means with a high evaporation rate as a heating means for the evaporation source.
によって目的を達成出来ることを見出した。I discovered that I could achieve my goal by
部ち本発明は、真空下において基体と強磁性材料蒸発源
との間に蒸気流制御壁面を備えてなる磁気記録媒体の製
造装置において、該蒸気流制御壁面が蒸発源の直上に配
され、蒸気流の周囲を完全に包囲していることを特徴と
する磁気記録媒体の製造装置を要旨とするものである。Particularly, the present invention provides an apparatus for manufacturing a magnetic recording medium comprising a vapor flow control wall surface between a substrate and a ferromagnetic material evaporation source under vacuum, wherein the vapor flow control wall surface is disposed directly above the evaporation source, The gist of the present invention is an apparatus for manufacturing a magnetic recording medium, which is characterized by completely surrounding a vapor flow.
尚本発明においては蒸発源の加熱手段として高周波誘導
加熱手段を使用することが好ましい。In the present invention, it is preferable to use high frequency induction heating means as the heating means for the evaporation source.
本発明の実施態様について図を用いて説明する。Embodiments of the present invention will be described using figures.
第１図は本発明の装置の概略説明図である。FIG. 1 is a schematic explanatory diagram of the apparatus of the present invention.
第１図において、真空槽１は、真空ポンプ１４によって
真空雰囲気に保たれている０強磁性材料３は、蒸発源２
ａにおいて加熱コイル４を用いて、高周波誘導加熱電源
５で高周波誘導加熱によって加熱される。一方、高分子
成形物基体９は送り出しロール６から送りだされ、蒸着
ドラム７上でマスク１０によって入射角の規制された強
磁性材料３の蒸気が蒸着され、巻き取りロール８に巻き
取られる。蒸発源２ａは、高周波誘導加熱によって加熱
されるため、蒸気流制御壁面１１は、蒸発源２ａの直上
に配置され、且つ蒸気流路の周囲を完全に包囲している
。尚、蒸気流制御壁面１１は蒸発蒸気の付着堆積を防止
するため、電源１２によって通電加熱され、さらに断熱
材１３で囲まれており、温度制御可能な構造となってい
る。In FIG. 1, a vacuum chamber 1 is maintained in a vacuum atmosphere by a vacuum pump 14, and a ferromagnetic material 3 is kept at an evaporation source 2.
In a, heating is performed by high-frequency induction heating using a high-frequency induction heating power source 5 using a heating coil 4. On the other hand, the polymer molded substrate 9 is sent out from the delivery roll 6, vapor of the ferromagnetic material 3 whose incident angle is regulated by the mask 10 is vapor-deposited on the vapor deposition drum 7, and then wound onto the take-up roll 8. Since the evaporation source 2a is heated by high-frequency induction heating, the vapor flow control wall surface 11 is disposed directly above the evaporation source 2a and completely surrounds the vapor flow path. The vapor flow control wall surface 11 is electrically heated by a power source 12 in order to prevent adhesion and accumulation of evaporated vapor, and is further surrounded by a heat insulating material 13, so that the temperature can be controlled.
次に、本発明の製造方法における蒸着プロセスに関して
説明する０強磁性材料３の蒸発面より蒸発した蒸気は、
「余弦法則ｊに従った方向に蒸発する。従って、蒸着ド
ラム７上の高分子成形物基体９に到達（蒸着）した以外
の蒸気成分に関しても、蒸気流制御壁面１１によって捕
らえられ、再蒸発或は熔解回収されて蒸着効率を向上さ
せる事が可能となった。Next, the vapor evaporated from the evaporation surface of the zero ferromagnetic material 3, which will be explained regarding the vapor deposition process in the manufacturing method of the present invention, is
"It evaporates in the direction according to the cosine law j. Therefore, vapor components other than those that have reached (evaporated) the polymer molded substrate 9 on the evaporation drum 7 are also captured by the vapor flow control wall 11 and are not re-evaporated or was melted and recovered, making it possible to improve vapor deposition efficiency.
本発明で使用する基体としては非磁性材料として特に制
限はなく通常使用れているものを用いることができる。The substrate used in the present invention is not particularly limited as a nonmagnetic material, and any commonly used nonmagnetic material can be used.
具体的例としてポリエチレンテレフタレート（ＰＥＴ）
、ポリプロピレン、ポリカーボネート、ポリエチレンツ
クレート。ポリアミド、ポリアミドイミド、ポリイミド
等の高分子成形物基体であり、目的に応じてアルミ箔、
ステンレス箔などの非磁性全屈材料でもよい、基体の厚
さは一般には３〜５０μｍ、好ましくは５〜３０μｍで
ある。A specific example is polyethylene terephthalate (PET)
, polypropylene, polycarbonate, polyethylene trate. Polymer molded base material such as polyamide, polyamideimide, polyimide, etc. Depending on the purpose, aluminum foil,
The thickness of the substrate, which may be a non-magnetic fully flexible material such as stainless steel foil, is generally between 3 and 50 μm, preferably between 5 and 30 μm.
本発明における強磁性材料としてはＦｅ、Ｃｏ。The ferromagnetic materials used in the present invention include Fe and Co.
Ｎｉおよびこれらの合金又は目的に応じてＶ。Ni and alloys thereof or V depending on the purpose.
Ｍｏ、Ｍｎ、ｐｄ等の元素を添加したものが用いられる
。また、必要に応じ、Ｎ、０１等を上記金泥膜中に含有
させてもよい。Those to which elements such as Mo, Mn, and pd are added are used. Further, if necessary, N, 01, etc. may be contained in the gold mud film.
本発明の蒸発源のルツボはＭｇｏ、ＺｒＯ２。The crucible for the evaporation source of the present invention is Mgo and ZrO2.
Ａｌｘ ０３ 、ＣａＱ等のセラミックで作られる。Made of ceramic such as Alx 03 and CaQ.
本発明における蒸気流制御壁面とは、蒸気流の通路を制
御する案内管であり、蒸着材料の蒸発温度より高いある
温度以上に加熱され、表面に蒸着材料を付着させること
なく、蒸気流を反射し、蒸気流を効率よく被蒸着物に向
ける役目を果す、従って材料としては導電材料で蒸発材
料より融点が高いものとしてたとえばＦｅ、Ｃｏに対し
ては、Ｔａ、Ｗ等が用いられる。又蒸気流制御壁面の外
側は断熱材料で保温され、その材料としてはセラミック
、アスベスト等が用いられる。The vapor flow control wall surface in the present invention is a guide tube that controls the passage of vapor flow, and is heated to a certain temperature higher than the evaporation temperature of the vapor deposition material, and reflects the vapor flow without adhering the vapor deposition material to the surface. However, the material plays the role of efficiently directing the vapor flow toward the object to be evaporated. Therefore, the material used is a conductive material with a higher melting point than the evaporation material, such as Ta or W in place of Fe or Co. Further, the outside of the vapor flow control wall surface is kept warm with a heat insulating material, and the material used is ceramic, asbestos, etc.
本発明における蒸発源に加熱手段としての高周波誘導加
熱の条件としては周波数５０〜２００ＫＨ２，出力容量
２０ＫＷ〜１１００Ｋが用いられる。The conditions for high frequency induction heating as a heating means for the evaporation source in the present invention are a frequency of 50 to 200 KH2 and an output capacity of 20 KW to 1100 K.
本発明は真空下において基体と強磁性材料蒸発源との間
に蒸気流制御壁面を備えてなる磁気記録媒体の製造装置
において、該蒸気流制御壁面が蒸発源の直上に配され、
かつ蒸気流の周囲を完全に包囲していることにより、蒸
気の散乱がなく蒸着効率が飛躍的に向上する。The present invention provides a magnetic recording medium manufacturing apparatus comprising a vapor flow control wall surface between a substrate and a ferromagnetic material evaporation source under vacuum, wherein the vapor flow control wall surface is disposed directly above the evaporation source,
Moreover, by completely surrounding the vapor flow, there is no scattering of the vapor, and the vapor deposition efficiency is dramatically improved.
又蒸発源の加熱手段として高量波誘導加熱手段を使用す
ることによって、蒸気流制御壁面に通電加熱しても、従
来の電子ビームの様に蒸発速度が低下するようなことは
なく充分な蒸発速度で蒸着することが出来る。In addition, by using high-volume induction heating means as a heating means for the evaporation source, even if the vapor flow control wall surface is heated with electricity, the evaporation rate will not decrease as with conventional electron beams, and sufficient evaporation will be achieved. It can be deposited at high speed.
本発明の実施例について説明する。 Examples of the present invention will be described.
実施例
蒸発源として内径５０龍坩堝、高周波誘導加熱電源とし
て周波数２００ＫＨ７，、出力容Ｉ ＫＷ。Example: The evaporation source is a 50mm inner diameter dragon crucible, the high frequency induction heating power source is 200KH7 frequency, and the output capacity is 1KW.
高分子成形物基体としてポリエチレンテレツクレートフ
ィルム１００龍幅・１３μｍ厚、蒸着ドラムとして直径
３００１ｍ（表面温度約０℃）、蒸気流制御壁面として
タングステン（Ｗ）（内径５０膣区、高さ９０ｍｍ）を
用いた蒸気流制御壁面ば、芸発源坩堝の直上に隙間をあ
けずに配置させた。高周波電源の出力を９ＫＷ、高分子
成形物基体の搬送速度を１５ｍ／ｍｉｎで、約１５００
人の膜厚でＣｏを蒸発させた結果、蒸着効率が、１９％
を得た。尚、蒸気流制御壁面は、蒸発源の直上に配置さ
れているので、蒸発場面からの輻射熱を多量にうけるた
め、蒸気流制御壁面への通電加熱は、３Ｖ、４００Ａで
強磁性材料の蒸気流制御壁面への付着堆積は、起こらな
かった。A polyethylene telescrate film of 100 mm width and 13 μm thickness was used as the base of the polymer molding, a diameter of 3001 m (surface temperature of about 0°C) was used as the vapor deposition drum, and tungsten (W) (inner diameter of 50 mm, height of 90 mm) was used as the vapor flow control wall. The steam flow control wall used was placed directly above the Geishagen crucible without any gaps. The output of the high frequency power supply is 9KW, and the conveyance speed of the polymer molded substrate is 15m/min, approximately 1500 m/min.
As a result of evaporating Co with human film thickness, the evaporation efficiency was 19%.
I got it. In addition, since the vapor flow control wall is placed directly above the evaporation source, it receives a large amount of radiant heat from the evaporation scene. No adhesion deposition occurred on the control wall.
比較例
一方、蒸発源加熱手段として電子銃加熱（出力容１５Ｋ
Ｗ）を用い、電子ビームの通路を確保するために、蒸発
源より４Ｑｍａ隙間をあけて蒸気流制御壁面（タングス
テン（Ｗ）、内径５０ ａｍ・高さ５０龍）を設置した
。電子銃の出力５ＫＷで高分子成形物基体の搬送速度を
５ ｍ ／ ｍ ｉ ｎで、蒸気流制御壁面に５Ｖ、８
００Ａの通電加熱を行いながら、Ｃｏを蒸着させた。し
かし、蒸気流制御壁面の通電加熱の電流のため、電子ビ
ームが充分に収束せず、約８００人の蒸着膜厚しか得ら
れなかった。尚、この時の蒸着効率は、８％であった。Comparative Example On the other hand, electron gun heating (output capacity 15K) was used as the evaporation source heating means.
A vapor flow control wall (tungsten (W), inner diameter 50 am, height 50 mm) was installed with a gap of 4 Qma from the evaporation source to ensure a path for the electron beam. The output of the electron gun was 5KW, the conveyance speed of the polymer molded substrate was 5 m/min, and the vapor flow control wall was set at 5V, 8
Co was deposited while heating with a current of 00A. However, due to the current applied to the vapor flow control wall for heating, the electron beam could not be sufficiently focused, and a deposited film thickness of only about 800 nm could be obtained. Note that the vapor deposition efficiency at this time was 8%.
また、参考のために、蒸気流制御壁面を用いない場合の
蒸着効率は、４％であった。Also, for reference, the vapor deposition efficiency when no vapor flow control wall was used was 4%.
上記実施例で明らかなように本発明により蒸発効率が従
来の２倍以上にも向上し、更に膜厚を厚くし、生産速度
を上昇させることが容易に可能になった。As is clear from the above examples, the present invention improves the evaporation efficiency by more than twice that of the conventional method, and makes it easy to increase the film thickness and increase the production rate.
本発明は真空下において基体と強磁性材料蒸発源との間
に蒸気流制御壁面を備えてなる磁気記録媒体の製造装置
において、該蒸気流制御壁面が蒸発源の直上に配され、
かつ蒸気流の周囲を完全に包囲していることを特徴とす
る磁気記録媒体の製造装置により、又蒸発加熱手段とし
て高周波誘導加熱手段を使用することによって、蒸発源
よりの蒸発効率を著しく向上させることが出来た。又蒸
発速度も充分大にすることが出来ることにより蒸着膜厚
を厚く、且蒸着速度を著しく上昇させることが可能にな
り磁気記録媒体製造の品質改良及びコスト低減に大いに
寄与した。The present invention provides a magnetic recording medium manufacturing apparatus comprising a vapor flow control wall surface between a substrate and a ferromagnetic material evaporation source under vacuum, wherein the vapor flow control wall surface is disposed directly above the evaporation source,
The evaporation efficiency from the evaporation source is significantly improved by using a magnetic recording medium manufacturing apparatus that completely surrounds the vapor flow and by using high-frequency induction heating means as the evaporation heating means. I was able to do it. Furthermore, since the evaporation rate can be increased sufficiently, it is possible to increase the thickness of the deposited film and to significantly increase the deposition rate, which greatly contributes to quality improvement and cost reduction in the production of magnetic recording media.
第１図は本発明の磁気記録媒体の製造装置の概略説明図
、第２図は従来の磁気記録媒体の製造装置の概略説明図
である。
１・・・真空槽
’ｌａ、’ｌｂ・・・蒸発源
３・・・強磁性材料
４・・・加熱コイル
５・・・高周波誘導加熱電源
６・・・送り出しロール
７・・・蒸着ドラム
８・・・巻き取りロール
９・・・高分子成形物基体
１０・・・入射角規制用マスク
１１・・・葎気流制御壁面
１２・・・電源 １３・・・断熱材１４・・・
真空ポンプ １５・・・電子銃１６・・・電子銃用電
源
１７・・・電子ビーム通路
１８・・・蒸気流制御壁面
１９・・・間隙
第 ２ 図
■１ 続 ン山 丁ｌ三 ；彎］
６． ？１ＩｉｉｌにＪ、り増加Ｊる発明の数二 〇
（１） 明細書箱６真第１Ｇ〜１７ｆ７１７Ｌ、「慕発
温度」を「融点」と補正する。
（２） 同ぶ第７頁第６行口、「５０〜２００」を「３
〜２００」と補正する。
（ご３） 同３！第７頁第７行目、ｒ２０ＫＷ〜１００
ＫＷＪをｒ２０ＫＷ〜３００ＫＷＪと祉正ジる。
（４） 同、１１第８貞第５行目、ｒＫＷｌの萌に「２
０」を挿入１Ｊる。
（５） 同一：第８頁第１０行目、「用いた」の後に「
、」をシ【入する。FIG. 1 is a schematic explanatory diagram of a magnetic recording medium manufacturing apparatus of the present invention, and FIG. 2 is a schematic explanatory diagram of a conventional magnetic recording medium manufacturing apparatus. 1... Vacuum chamber 'la,'lb... Evaporation source 3... Ferromagnetic material 4... Heating coil 5... High frequency induction heating power source 6... Delivery roll 7... Vapor deposition drum 8 . . . Winding roll 9 . . . Polymer molded product base 10 . . . Incident angle regulation mask 11 . . . Airflow control wall surface 12 . . . Power source 13 .
Vacuum pump 15...Electron gun 16...Electron gun power supply 17...Electron beam passage 18...Vapor flow control wall surface 19...Gap 2nd figure 6. ? Number 20 (1) of specification box 6, number 1G to 17f, 717L, "melting temperature" is corrected as "melting point". (2) On the same page, page 7, line 6, change “50 to 200” to “3”.
〜200''. (3) Same 3! Page 7, line 7, r20KW~100
KWJ is adjusted to r20KW~300KWJ. (4) Same, 11th 8th line 5th line, Moe of rKWl says ``2
Insert "0". (5) Same: page 8, line 10, after “used” “
,".
Claims (2)
蒸気流制御壁面を備えてなる磁気記録媒体の製造装置に
おいて、該蒸気流制御壁面が、蒸発源の直上に配され、
かつ蒸気流の周囲を完全に包囲していることを特徴とす
る磁気記録媒体の製造装置。(1) In a magnetic recording medium manufacturing apparatus comprising a vapor flow control wall surface between a substrate and a ferromagnetic material evaporation source under vacuum, the vapor flow control wall surface is disposed directly above the evaporation source,
An apparatus for producing a magnetic recording medium, characterized in that the vapor flow is completely surrounded.
用することを特徴とする特許請求の範囲第（１）項記載
の磁気記録媒体の製造装置。(2) The apparatus for manufacturing a magnetic recording medium according to claim (1), characterized in that high frequency induction heating means is used as heating means for the evaporation source.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3592987A JPS63204513A (en) | 1987-02-20 | 1987-02-20 | Apparatus for producing magnetic recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3592987A JPS63204513A (en) | 1987-02-20 | 1987-02-20 | Apparatus for producing magnetic recording medium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63204513A true JPS63204513A (en) | 1988-08-24 |
Family
ID=12455720
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3592987A Pending JPS63204513A (en) | 1987-02-20 | 1987-02-20 | Apparatus for producing magnetic recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63204513A (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57155369A (en) * | 1981-03-20 | 1982-09-25 | Fuji Photo Film Co Ltd | High vacuum ion plating method and apparatus |
| JPS57194252A (en) * | 1981-05-25 | 1982-11-29 | Fuji Photo Film Co Ltd | Vapor depositing device by electron beam |
-
1987
- 1987-02-20 JP JP3592987A patent/JPS63204513A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57155369A (en) * | 1981-03-20 | 1982-09-25 | Fuji Photo Film Co Ltd | High vacuum ion plating method and apparatus |
| JPS57194252A (en) * | 1981-05-25 | 1982-11-29 | Fuji Photo Film Co Ltd | Vapor depositing device by electron beam |
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