JPS6360546B2 - - Google Patents
Info
- Publication number
- JPS6360546B2 JPS6360546B2 JP55119323A JP11932380A JPS6360546B2 JP S6360546 B2 JPS6360546 B2 JP S6360546B2 JP 55119323 A JP55119323 A JP 55119323A JP 11932380 A JP11932380 A JP 11932380A JP S6360546 B2 JPS6360546 B2 JP S6360546B2
- Authority
- JP
- Japan
- Prior art keywords
- region
- transistor region
- conductivity type
- transistor
- ion implantation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
- H10D84/0123—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs
- H10D84/0126—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs the components including insulated gates, e.g. IGFETs
- H10D84/0165—Integrating together multiple components covered by H10D12/00 or H10D30/00, e.g. integrating multiple IGBTs the components including insulated gates, e.g. IGFETs the components including complementary IGFETs, e.g. CMOS devices
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/01—Manufacture or treatment
- H10D84/02—Manufacture or treatment characterised by using material-based technologies
- H10D84/03—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology
- H10D84/038—Manufacture or treatment characterised by using material-based technologies using Group IV technology, e.g. silicon technology or silicon-carbide [SiC] technology using silicon technology, e.g. SiGe
Landscapes
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55119323A JPS5743456A (en) | 1980-08-29 | 1980-08-29 | Manufacture of cmos integrated circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55119323A JPS5743456A (en) | 1980-08-29 | 1980-08-29 | Manufacture of cmos integrated circuit |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5743456A JPS5743456A (en) | 1982-03-11 |
JPS6360546B2 true JPS6360546B2 (enrdf_load_stackoverflow) | 1988-11-24 |
Family
ID=14758611
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55119323A Granted JPS5743456A (en) | 1980-08-29 | 1980-08-29 | Manufacture of cmos integrated circuit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5743456A (enrdf_load_stackoverflow) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62149163A (ja) * | 1985-08-30 | 1987-07-03 | Nec Corp | 相補型mos集積回路の製造方法 |
JP2653632B2 (ja) * | 1993-12-24 | 1997-09-17 | 株式会社東芝 | マスクldd構造のmos型半導体装置の製造方法 |
-
1980
- 1980-08-29 JP JP55119323A patent/JPS5743456A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5743456A (en) | 1982-03-11 |
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