JPH0422345B2 - - Google Patents
Info
- Publication number
- JPH0422345B2 JPH0422345B2 JP60074804A JP7480485A JPH0422345B2 JP H0422345 B2 JPH0422345 B2 JP H0422345B2 JP 60074804 A JP60074804 A JP 60074804A JP 7480485 A JP7480485 A JP 7480485A JP H0422345 B2 JPH0422345 B2 JP H0422345B2
- Authority
- JP
- Japan
- Prior art keywords
- mask
- region
- nitride film
- source
- gate electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/13—Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
- H10D62/149—Source or drain regions of field-effect devices
- H10D62/151—Source or drain regions of field-effect devices of IGFETs
Landscapes
- Element Separation (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60074804A JPS61232678A (ja) | 1985-04-09 | 1985-04-09 | 半導体集積回路装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60074804A JPS61232678A (ja) | 1985-04-09 | 1985-04-09 | 半導体集積回路装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61232678A JPS61232678A (ja) | 1986-10-16 |
| JPH0422345B2 true JPH0422345B2 (enrdf_load_stackoverflow) | 1992-04-16 |
Family
ID=13557859
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60074804A Granted JPS61232678A (ja) | 1985-04-09 | 1985-04-09 | 半導体集積回路装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61232678A (enrdf_load_stackoverflow) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2676769B2 (ja) * | 1988-03-08 | 1997-11-17 | 日本電気株式会社 | 半導体装置 |
| JPH0756893B2 (ja) * | 1988-12-05 | 1995-06-14 | 日本電気株式会社 | 耐放射線性ｍｉｓ型半導体集積回路の製造方法 |
| JP2500318B2 (ja) * | 1989-05-25 | 1996-05-29 | 工業技術院長 | 半導体装置の製造方法 |
-
1985
- 1985-04-09 JP JP60074804A patent/JPS61232678A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61232678A (ja) | 1986-10-16 |
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