JPS6356199B2 - - Google Patents
Info
- Publication number
- JPS6356199B2 JPS6356199B2 JP58135136A JP13513683A JPS6356199B2 JP S6356199 B2 JPS6356199 B2 JP S6356199B2 JP 58135136 A JP58135136 A JP 58135136A JP 13513683 A JP13513683 A JP 13513683A JP S6356199 B2 JPS6356199 B2 JP S6356199B2
- Authority
- JP
- Japan
- Prior art keywords
- molecular beam
- crystal
- intensity ratio
- beam intensity
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
- C30B23/002—Controlling or regulating
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58135136A JPS6027689A (ja) | 1983-07-26 | 1983-07-26 | AlGaAs結晶の分子線結晶成長法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58135136A JPS6027689A (ja) | 1983-07-26 | 1983-07-26 | AlGaAs結晶の分子線結晶成長法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6027689A JPS6027689A (ja) | 1985-02-12 |
JPS6356199B2 true JPS6356199B2 (enrdf_load_stackoverflow) | 1988-11-07 |
Family
ID=15144644
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58135136A Granted JPS6027689A (ja) | 1983-07-26 | 1983-07-26 | AlGaAs結晶の分子線結晶成長法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6027689A (enrdf_load_stackoverflow) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61227164A (ja) * | 1985-03-29 | 1986-10-09 | Agency Of Ind Science & Technol | 固体蒸発制御法 |
JPS6217093A (ja) * | 1985-07-13 | 1987-01-26 | Agency Of Ind Science & Technol | 薄膜結晶成長法 |
JPH01176292A (ja) * | 1987-12-29 | 1989-07-12 | Nec Corp | 分子線エピタキシャル成長方法及び装置 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5141546A (ja) * | 1974-10-05 | 1976-04-07 | Tokyo Seimitsu Co Ltd | Setsushokukaitengatachotsukeisokuteisochi |
JPS5537092A (en) * | 1978-09-05 | 1980-03-14 | Ibm | Mode switch for setting threshold value |
-
1983
- 1983-07-26 JP JP58135136A patent/JPS6027689A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6027689A (ja) | 1985-02-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4159919A (en) | Molecular beam epitaxy using premixing | |
JPS6134929A (ja) | 半導体結晶成長装置 | |
US5406906A (en) | Preparation of crystallographically aligned films of silicon carbide by laser deposition of carbon onto silicon | |
JPS6356199B2 (enrdf_load_stackoverflow) | ||
Ambrico et al. | Structural and optical parameters of films deposited on quartz substrates by laser ablation | |
JPH04292499A (ja) | 炭化珪素単結晶の製造方法 | |
US5057183A (en) | Process for preparing epitaxial II-VI compound semiconductor | |
JPS5992998A (ja) | 分子線結晶成長方法 | |
JP3002720B2 (ja) | 酸化バナジウム薄膜及びその製造方法 | |
JP2850642B2 (ja) | 分子線エピタキシー装置の水銀カドミウムテルル薄膜用基板ホルダー | |
JPH03145119A (ja) | 分子線源用シャッタ | |
JPH06177038A (ja) | 分子線エピタキシー法による水銀カドミウムテルル薄膜の形成方法およびそれに用いる基板ホルダー | |
JPH04332138A (ja) | 半導体装置の製造方法 | |
JPH05182910A (ja) | 分子線エピタキシャル成長方法 | |
JPS6134922A (ja) | 超格子半導体装置の製造方法 | |
Iga et al. | A new technique for fabricating InGaAsP superlattice by laser-assisted metalorganic molecular beam epitaxy | |
KR100466825B1 (ko) | 펄스 레이저를 이용한 박막 증착 장치 | |
JPH06280014A (ja) | 薄膜成長表面その場評価法及び薄膜形成装置 | |
JPS6142125A (ja) | Mbe用基板およびその温度測定法 | |
JPS6340793A (ja) | 2−6族化合物半導体単結晶薄膜の成長法 | |
Martínez‐Collazo et al. | Growth and material characterization of PbSnSe/PbSe heterostructures | |
JPH05323400A (ja) | 有機非線形光学結晶薄膜の気相成長方法 | |
JPS62211379A (ja) | 蒸着方法 | |
JPH0566354B2 (enrdf_load_stackoverflow) | ||
JPS63200522A (ja) | 半導体結晶成長装置 |