JPS6352453B2 - - Google Patents

Info

Publication number
JPS6352453B2
JPS6352453B2 JP58244350A JP24435083A JPS6352453B2 JP S6352453 B2 JPS6352453 B2 JP S6352453B2 JP 58244350 A JP58244350 A JP 58244350A JP 24435083 A JP24435083 A JP 24435083A JP S6352453 B2 JPS6352453 B2 JP S6352453B2
Authority
JP
Japan
Prior art keywords
plane
mask
wafer
radiation
marks
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58244350A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59134830A (ja
Inventor
Fuei Berunaaru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
TOMUSON SA
Original Assignee
TOMUSON SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by TOMUSON SA filed Critical TOMUSON SA
Publication of JPS59134830A publication Critical patent/JPS59134830A/ja
Publication of JPS6352453B2 publication Critical patent/JPS6352453B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7023—Aligning or positioning in direction perpendicular to substrate surface

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58244350A 1982-12-30 1983-12-26 ２つのクロ−ズアツプ平面上のパタ−ンの光学的配列方法およびその装置 Granted JPS59134830A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR8222080A FR2538923A1 (fr) 1982-12-30 1982-12-30 Procede et dispositif d'alignement optique de motifs dans deux plans rapproches dans un appareil d'exposition comprenant une source de rayonnement divergent
FR8222080 1982-12-30

Publications (2)

Publication Number Publication Date
JPS59134830A JPS59134830A (ja) 1984-08-02
JPS6352453B2 true JPS6352453B2 (en, 2012) 1988-10-19

Family

ID=9280689

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58244350A Granted JPS59134830A (ja) 1982-12-30 1983-12-26 ２つのクロ−ズアツプ平面上のパタ−ンの光学的配列方法およびその装置

Country Status (5)

Country Link
US (1) US4600309A (en, 2012)
EP (1) EP0113633B1 (en, 2012)
JP (1) JPS59134830A (en, 2012)
DE (1) DE3370199D1 (en, 2012)
FR (1) FR2538923A1 (en, 2012)

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JPH01285803A (ja) * 1988-05-13 1989-11-16 Fujitsu Ltd フレネル・ゾーン・プレートおよびそれを用いる位置合せ方法
US5319444A (en) * 1988-02-16 1994-06-07 Canon Kabushiki Kaisha Position detecting method and apparatus
JPH01283993A (ja) * 1988-05-11 1989-11-15 Hitachi Ltd 回路プリント板、その面付け部品位置認識装置、及び面付け部品検査装置
EP0355496A3 (en) * 1988-08-15 1990-10-10 Sumitomo Heavy Industries Co., Ltd. Position detector employing a sector fresnel zone plate
JPH0267903A (ja) * 1988-09-02 1990-03-07 Canon Inc 光量調節装置
JPH07119574B2 (ja) * 1988-09-12 1995-12-20 富士通株式会社 二次元位置検出方法
JP2666859B2 (ja) * 1988-11-25 1997-10-22 日本電気株式会社 目合せ用バーニヤパターンを備えた半導体装置
JP2704002B2 (ja) * 1989-07-18 1998-01-26 キヤノン株式会社 位置検出方法
US5229617A (en) * 1989-07-28 1993-07-20 Canon Kabushiki Kaisha Position detecting method having reflectively scattered light prevented from impinging on a detector
DE4006365A1 (de) * 1990-03-01 1991-10-17 Heidenhain Gmbh Dr Johannes Positionsmesseinrichtung
JPH10166460A (ja) * 1996-12-06 1998-06-23 Toyota Motor Corp 積層造形方法及び積層造形装置
CA2227672A1 (en) * 1997-01-29 1998-07-29 Toyota Jidosha Kabushiki Kaisha Method for producing a laminated object and apparatus for producing the same
JPH11233397A (ja) * 1998-02-13 1999-08-27 Mitsubishi Electric Corp アライメント方法及び半導体装置
US6136517A (en) * 1998-03-06 2000-10-24 Raytheon Company Method for photo composition of large area integrated circuits
US6592673B2 (en) * 1999-05-27 2003-07-15 Applied Materials, Inc. Apparatus and method for detecting a presence or position of a substrate
US6301798B1 (en) * 1999-06-09 2001-10-16 United Microelectronics Corp. Method of measuring misalignment
US6873087B1 (en) 1999-10-29 2005-03-29 Board Of Regents, The University Of Texas System High precision orientation alignment and gap control stages for imprint lithography processes
CN100504598C (zh) * 2000-07-16 2009-06-24 得克萨斯州大学系统董事会 用于平版印刷工艺中的高分辨率重叠对齐方法和系统
CN1262883C (zh) 2000-07-17 2006-07-05 得克萨斯州大学系统董事会 影印用于平版印刷工艺中的自动化液体分配的方法和系统
CN1221858C (zh) * 2000-08-01 2005-10-05 得克萨斯州大学系统董事会 判定模板与衬底之间的间隔的方法
WO2002017383A2 (en) 2000-08-21 2002-02-28 Board Of Regents, The University Of Texas System Flexure based translation stage
JP2004523906A (ja) * 2000-10-12 2004-08-05 ボード・オブ・リージエンツ，ザ・ユニバーシテイ・オブ・テキサス・システム 室温かつ低圧マイクロおよびナノ転写リソグラフィのためのテンプレート
US6964793B2 (en) 2002-05-16 2005-11-15 Board Of Regents, The University Of Texas System Method for fabricating nanoscale patterns in light curable compositions using an electric field
US20050064344A1 (en) * 2003-09-18 2005-03-24 University Of Texas System Board Of Regents Imprint lithography templates having alignment marks
JP3953355B2 (ja) * 2002-04-12 2007-08-08 Ｎｅｃエレクトロニクス株式会社 画像処理アライメント方法及び半導体装置の製造方法
US7037639B2 (en) * 2002-05-01 2006-05-02 Molecular Imprints, Inc. Methods of manufacturing a lithography template
US20030235787A1 (en) * 2002-06-24 2003-12-25 Watts Michael P.C. Low viscosity high resolution patterning material
US6926929B2 (en) 2002-07-09 2005-08-09 Molecular Imprints, Inc. System and method for dispensing liquids
US6908861B2 (en) * 2002-07-11 2005-06-21 Molecular Imprints, Inc. Method for imprint lithography using an electric field
US7019819B2 (en) 2002-11-13 2006-03-28 Molecular Imprints, Inc. Chucking system for modulating shapes of substrates
US6932934B2 (en) 2002-07-11 2005-08-23 Molecular Imprints, Inc. Formation of discontinuous films during an imprint lithography process
US6900881B2 (en) 2002-07-11 2005-05-31 Molecular Imprints, Inc. Step and repeat imprint lithography systems
US7077992B2 (en) 2002-07-11 2006-07-18 Molecular Imprints, Inc. Step and repeat imprint lithography processes
US7070405B2 (en) * 2002-08-01 2006-07-04 Molecular Imprints, Inc. Alignment systems for imprint lithography
US6916584B2 (en) 2002-08-01 2005-07-12 Molecular Imprints, Inc. Alignment methods for imprint lithography
US7027156B2 (en) 2002-08-01 2006-04-11 Molecular Imprints, Inc. Scatterometry alignment for imprint lithography
US7071088B2 (en) 2002-08-23 2006-07-04 Molecular Imprints, Inc. Method for fabricating bulbous-shaped vias
US8349241B2 (en) 2002-10-04 2013-01-08 Molecular Imprints, Inc. Method to arrange features on a substrate to replicate features having minimal dimensional variability
US6929762B2 (en) 2002-11-13 2005-08-16 Molecular Imprints, Inc. Method of reducing pattern distortions during imprint lithography processes
US6980282B2 (en) * 2002-12-11 2005-12-27 Molecular Imprints, Inc. Method for modulating shapes of substrates
US6871558B2 (en) * 2002-12-12 2005-03-29 Molecular Imprints, Inc. Method for determining characteristics of substrate employing fluid geometries
WO2004054784A1 (en) * 2002-12-13 2004-07-01 Molecular Imprints, Inc. Magnification corrections employing out-of-plane distortions on a substrate
JP3785141B2 (ja) * 2002-12-27 2006-06-14 株式会社東芝 荷電粒子ビーム描画装置の縮小率測定方法、荷電粒子ビーム描画装置のステージ位相測定方法、荷電粒子ビーム描画装置の制御方法、及び荷電粒子ビーム描画装置
US7452574B2 (en) 2003-02-27 2008-11-18 Molecular Imprints, Inc. Method to reduce adhesion between a polymerizable layer and a substrate employing a fluorine-containing layer
US7122079B2 (en) 2004-02-27 2006-10-17 Molecular Imprints, Inc. Composition for an etching mask comprising a silicon-containing material
US7179396B2 (en) 2003-03-25 2007-02-20 Molecular Imprints, Inc. Positive tone bi-layer imprint lithography method
US7396475B2 (en) * 2003-04-25 2008-07-08 Molecular Imprints, Inc. Method of forming stepped structures employing imprint lithography
US7157036B2 (en) 2003-06-17 2007-01-02 Molecular Imprints, Inc Method to reduce adhesion between a conformable region and a pattern of a mold
US7150622B2 (en) * 2003-07-09 2006-12-19 Molecular Imprints, Inc. Systems for magnification and distortion correction for imprint lithography processes
US7136150B2 (en) 2003-09-25 2006-11-14 Molecular Imprints, Inc. Imprint lithography template having opaque alignment marks
US7090716B2 (en) * 2003-10-02 2006-08-15 Molecular Imprints, Inc. Single phase fluid imprint lithography method
US8211214B2 (en) 2003-10-02 2012-07-03 Molecular Imprints, Inc. Single phase fluid imprint lithography method
US20050084804A1 (en) * 2003-10-16 2005-04-21 Molecular Imprints, Inc. Low surface energy templates
US8076386B2 (en) 2004-02-23 2011-12-13 Molecular Imprints, Inc. Materials for imprint lithography
US7906180B2 (en) 2004-02-27 2011-03-15 Molecular Imprints, Inc. Composition for an etching mask comprising a silicon-containing material
EP1774407B1 (en) * 2004-06-03 2017-08-09 Board of Regents, The University of Texas System System and method for improvement of alignment and overlay for microlithography
US7768624B2 (en) * 2004-06-03 2010-08-03 Board Of Regents, The University Of Texas System Method for obtaining force combinations for template deformation using nullspace and methods optimization techniques
US20050270516A1 (en) * 2004-06-03 2005-12-08 Molecular Imprints, Inc. System for magnification and distortion correction during nano-scale manufacturing
US7785526B2 (en) * 2004-07-20 2010-08-31 Molecular Imprints, Inc. Imprint alignment method, system, and template
US20070231421A1 (en) * 2006-04-03 2007-10-04 Molecular Imprints, Inc. Enhanced Multi Channel Alignment
US7292326B2 (en) * 2004-11-30 2007-11-06 Molecular Imprints, Inc. Interferometric analysis for the manufacture of nano-scale devices
US7630067B2 (en) 2004-11-30 2009-12-08 Molecular Imprints, Inc. Interferometric analysis method for the manufacture of nano-scale devices
KR20070086766A (ko) * 2004-12-01 2007-08-27 몰레큘러 임프린츠 인코퍼레이티드 임프린트 리소그래피 공정용 열관리를 위한 노출 방법
US20070228608A1 (en) * 2006-04-03 2007-10-04 Molecular Imprints, Inc. Preserving Filled Features when Vacuum Wiping
EP1897142A2 (en) * 2005-06-14 2008-03-12 Koninklijke Philips Electronics N.V. Multi view display device
WO2007117524A2 (en) 2006-04-03 2007-10-18 Molecular Imprints, Inc. Method of concurrently patterning a substrate having a plurality of fields and alignment marks
JP5027468B2 (ja) * 2006-09-15 2012-09-19 日本ミクロコーティング株式会社 プローブクリーニング用又はプローブ加工用シート、及びプローブ加工方法
TWI347428B (en) * 2007-11-02 2011-08-21 Ind Tech Res Inst Overlay alignment structure and method for overlay metrology using the same
JP4919521B2 (ja) * 2009-03-30 2012-04-18 孝彰 福田 文字入力方法、及び入力文字校正方法
KR101122520B1 (ko) * 2011-11-25 2012-03-19 짚트랙코리아 주식회사 짚 트렉 시스템
JP2015079830A (ja) * 2013-10-16 2015-04-23 三菱電機株式会社 光半導体装置、光半導体装置の製造方法、及び光モジュールの製造方法
WO2021156069A1 (en) 2020-02-05 2021-08-12 Asml Holding N.V. Apparatus for sensing alignment marks

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4037969A (en) * 1976-04-02 1977-07-26 Bell Telephone Laboratories, Incorporated Zone plate alignment marks
US4200395A (en) * 1977-05-03 1980-04-29 Massachusetts Institute Of Technology Alignment of diffraction gratings
DE2723902C2 (de) * 1977-05-26 1983-12-08 Siemens AG, 1000 Berlin und 8000 München Verfahren zur Parallelausrichtung und Justierung der Lage einer Halbleiterscheibe relativ zu einer Bestrahlungsmaske bei der Röntgenstrahl-Fotolithografie
FR2436967A1 (fr) * 1978-09-19 1980-04-18 Thomson Csf Procede d'alignement optique de motifs dans deux plans rapproches et dispositif d'alignement mettant en oeuvre un tel procede
JPS5655041A (en) * 1979-10-11 1981-05-15 Nippon Telegr & Teleph Corp <Ntt> Positioning exposure
US4292576A (en) * 1980-02-29 1981-09-29 The United States Of America As Represented By The Secretary Of The Air Force Mask-slice alignment method
US4326805A (en) * 1980-04-11 1982-04-27 Bell Telephone Laboratories, Incorporated Method and apparatus for aligning mask and wafer members
JPS5717132A (en) * 1980-07-07 1982-01-28 Fujitsu Ltd Formation of microscopic pattern using lithography and device thereof
JPS57109335A (en) * 1980-12-26 1982-07-07 Toshiba Corp Positional matching method between mask substrate and wafer

Also Published As

Publication number Publication date
EP0113633B1 (fr) 1987-03-11
FR2538923A1 (fr) 1984-07-06
FR2538923B1 (en, 2012) 1985-03-08
JPS59134830A (ja) 1984-08-02
DE3370199D1 (en) 1987-04-16
EP0113633A1 (fr) 1984-07-18
US4600309A (en) 1986-07-15

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