JPS6348420B2 - - Google Patents

Info

Publication number
JPS6348420B2
JPS6348420B2 JP16256182A JP16256182A JPS6348420B2 JP S6348420 B2 JPS6348420 B2 JP S6348420B2 JP 16256182 A JP16256182 A JP 16256182A JP 16256182 A JP16256182 A JP 16256182A JP S6348420 B2 JPS6348420 B2 JP S6348420B2
Authority
JP
Japan
Prior art keywords
pattern
patterns
position detection
relative position
interval
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP16256182A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5951529A (ja
Inventor
Kazuhiko Tsuji
Masaru Sasako
Koichi Kugimya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP57162561A priority Critical patent/JPS5951529A/ja
Publication of JPS5951529A publication Critical patent/JPS5951529A/ja
Publication of JPS6348420B2 publication Critical patent/JPS6348420B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P95/00—

Landscapes

  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP57162561A 1982-09-17 1982-09-17 相対位置検出パタ−ン Granted JPS5951529A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57162561A JPS5951529A (ja) 1982-09-17 1982-09-17 相対位置検出パタ−ン

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57162561A JPS5951529A (ja) 1982-09-17 1982-09-17 相対位置検出パタ−ン

Publications (2)

Publication Number Publication Date
JPS5951529A JPS5951529A (ja) 1984-03-26
JPS6348420B2 true JPS6348420B2 (enExample) 1988-09-29

Family

ID=15756924

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57162561A Granted JPS5951529A (ja) 1982-09-17 1982-09-17 相対位置検出パタ−ン

Country Status (1)

Country Link
JP (1) JPS5951529A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH023217U (enExample) * 1988-06-20 1990-01-10

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS633416A (ja) * 1986-06-24 1988-01-08 Sony Corp 半導体装置
US6828647B2 (en) * 2001-04-05 2004-12-07 Infineon Technologies Ag Structure for determining edges of regions in a semiconductor wafer
JP2009004601A (ja) * 2007-06-22 2009-01-08 Jeol Ltd 荷電粒子ビーム描画装置のフィールド接合精度測定方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH023217U (enExample) * 1988-06-20 1990-01-10

Also Published As

Publication number Publication date
JPS5951529A (ja) 1984-03-26

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