JPS6341042B2 - - Google Patents

Info

Publication number
JPS6341042B2
JPS6341042B2 JP57043395A JP4339582A JPS6341042B2 JP S6341042 B2 JPS6341042 B2 JP S6341042B2 JP 57043395 A JP57043395 A JP 57043395A JP 4339582 A JP4339582 A JP 4339582A JP S6341042 B2 JPS6341042 B2 JP S6341042B2
Authority
JP
Japan
Prior art keywords
conical
light beam
aperture stop
optical integrator
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57043395A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58160914A (ja
Inventor
Makoto Uehara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kogaku KK filed Critical Nippon Kogaku KK
Priority to JP57043395A priority Critical patent/JPS58160914A/ja
Priority to US06/416,029 priority patent/US4498742A/en
Publication of JPS58160914A publication Critical patent/JPS58160914A/ja
Publication of JPS6341042B2 publication Critical patent/JPS6341042B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/06—Means for illuminating specimens

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)
  • Projection-Type Copiers In General (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP57043395A 1981-09-10 1982-03-18 ミラ−集光型照明光学系 Granted JPS58160914A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP57043395A JPS58160914A (ja) 1982-03-18 1982-03-18 ミラ−集光型照明光学系
US06/416,029 US4498742A (en) 1981-09-10 1982-09-08 Illumination optical arrangement

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57043395A JPS58160914A (ja) 1982-03-18 1982-03-18 ミラ−集光型照明光学系

Publications (2)

Publication Number Publication Date
JPS58160914A JPS58160914A (ja) 1983-09-24
JPS6341042B2 true JPS6341042B2 (enrdf_load_stackoverflow) 1988-08-15

Family

ID=12662592

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57043395A Granted JPS58160914A (ja) 1981-09-10 1982-03-18 ミラ−集光型照明光学系

Country Status (1)

Country Link
JP (1) JPS58160914A (enrdf_load_stackoverflow)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2503451B2 (ja) * 1985-12-26 1996-06-05 株式会社ニコン 投影露光方法及び装置
JPS633205A (ja) * 1986-06-23 1988-01-08 Asahi Optical Co Ltd 光学式厚み測定装置
JPS63162320U (enrdf_load_stackoverflow) * 1987-04-10 1988-10-24
JPH02250016A (ja) * 1989-03-23 1990-10-05 Mitsutoyo Corp 落射暗視野照明装置
JPH02308106A (ja) * 1989-05-23 1990-12-21 Citizen Watch Co Ltd 直線遍光光源
JP2748342B2 (ja) * 1989-12-28 1998-05-06 ウシオ電機株式会社 光照射装置
JP2748343B2 (ja) * 1989-12-28 1998-05-06 ウシオ電機株式会社 光照射装置
JP2748341B2 (ja) * 1989-12-28 1998-05-06 ウシオ電機株式会社 光学ユニット及びこの光学ユニットが接合される光照射装置
JP2673915B2 (ja) * 1991-05-24 1997-11-05 日本電信電話株式会社 微細パタン投影露光装置
JPH0541342A (ja) * 1991-08-05 1993-02-19 Nippon Telegr & Teleph Corp <Ntt> 微細パタン投影露光装置
JP3278896B2 (ja) * 1992-03-31 2002-04-30 キヤノン株式会社 照明装置及びそれを用いた投影露光装置
NL194929C (nl) * 1992-10-20 2003-07-04 Samsung Electronics Co Ltd Projectiebelichtingssysteem.
JP3879142B2 (ja) * 1996-04-22 2007-02-07 株式会社ニコン 露光装置
JP4563557B2 (ja) * 2000-07-18 2010-10-13 株式会社トプコン 露光装置の照明光学系

Also Published As

Publication number Publication date
JPS58160914A (ja) 1983-09-24

Similar Documents

Publication Publication Date Title
JPH043528B2 (enrdf_load_stackoverflow)
US4498742A (en) Illumination optical arrangement
US5357312A (en) Illuminating system in exposure apparatus for photolithography
US6259512B1 (en) Illumination system and exposure apparatus having the same
KR100450556B1 (ko) 투사형-마이크로리소그래피장치용조명장치
JPS6341042B2 (enrdf_load_stackoverflow)
JPH086175A (ja) 照明システム
JPH0378607B2 (enrdf_load_stackoverflow)
JPH0831736A (ja) 照明光学装置
JPS597359A (ja) 照明装置
JP3295956B2 (ja) 露光装置及び半導体素子の製造方法
KR100384551B1 (ko) 조광시스템
JP2001135560A (ja) 照明光学装置、該照明光学装置を備えた露光装置、および該露光装置を用いたマイクロデバイス製造方法
JP3722547B2 (ja) 照明光学系
JP2000021765A (ja) 照明装置及びそれを用いた投影露光装置
JP2002516650A (ja) 投影光源
JPS5949514A (ja) 環状照明装置
JPH08148407A (ja) 照明光学装置
JP2002075835A (ja) 照明光学装置および該照明光学装置を備えた露光装置
JP4051473B2 (ja) 照明光学装置および該照明光学装置を備えた露光装置
US5386266A (en) Projection exposure system
JP3367569B2 (ja) 照明光学装置、露光装置、及び該露光装置を用いた転写方法
JP2002083759A (ja) 照明光学装置および該照明光学装置を備えた露光装置
JPS5843416A (ja) ミラ−集光型逆エキスパンドアフオ−カル照明光学系
JPH01271718A (ja) 照明光学装置