JPS6334620B2 - - Google Patents

Info

Publication number
JPS6334620B2
JPS6334620B2 JP9429081A JP9429081A JPS6334620B2 JP S6334620 B2 JPS6334620 B2 JP S6334620B2 JP 9429081 A JP9429081 A JP 9429081A JP 9429081 A JP9429081 A JP 9429081A JP S6334620 B2 JPS6334620 B2 JP S6334620B2
Authority
JP
Japan
Prior art keywords
developer
substrate
spray
resist
spraying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP9429081A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57208135A (en
Inventor
Katsuyuki Arii
Akira Morishige
Shinya Kato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP9429081A priority Critical patent/JPS57208135A/ja
Publication of JPS57208135A publication Critical patent/JPS57208135A/ja
Publication of JPS6334620B2 publication Critical patent/JPS6334620B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP9429081A 1981-06-18 1981-06-18 Spray type resist developing apparatus Granted JPS57208135A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9429081A JPS57208135A (en) 1981-06-18 1981-06-18 Spray type resist developing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9429081A JPS57208135A (en) 1981-06-18 1981-06-18 Spray type resist developing apparatus

Publications (2)

Publication Number Publication Date
JPS57208135A JPS57208135A (en) 1982-12-21
JPS6334620B2 true JPS6334620B2 (enrdf_load_stackoverflow) 1988-07-11

Family

ID=14106124

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9429081A Granted JPS57208135A (en) 1981-06-18 1981-06-18 Spray type resist developing apparatus

Country Status (1)

Country Link
JP (1) JPS57208135A (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61251135A (ja) * 1985-04-30 1986-11-08 Toshiba Corp 自動現像装置
JP2646205B2 (ja) * 1986-07-02 1997-08-27 大日本印刷株式会社 感光性樹脂層の形成法
JP4947711B2 (ja) * 2006-04-26 2012-06-06 東京エレクトロン株式会社 現像処理方法、現像処理プログラム、及びそのプログラムを記録したコンピュータ読み取り可能な記録媒体
JP5003773B2 (ja) * 2010-02-15 2012-08-15 東京エレクトロン株式会社 現像装置、現像方法及び記憶媒体

Also Published As

Publication number Publication date
JPS57208135A (en) 1982-12-21

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