JPS57208135A - Spray type resist developing apparatus - Google Patents

Spray type resist developing apparatus

Info

Publication number
JPS57208135A
JPS57208135A JP9429081A JP9429081A JPS57208135A JP S57208135 A JPS57208135 A JP S57208135A JP 9429081 A JP9429081 A JP 9429081A JP 9429081 A JP9429081 A JP 9429081A JP S57208135 A JPS57208135 A JP S57208135A
Authority
JP
Japan
Prior art keywords
pipe
developer
supplying
substrate
developing apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9429081A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6334620B2 (enrdf_load_stackoverflow
Inventor
Katsuyuki Arii
Akira Morishige
Shinya Kato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP9429081A priority Critical patent/JPS57208135A/ja
Publication of JPS57208135A publication Critical patent/JPS57208135A/ja
Publication of JPS6334620B2 publication Critical patent/JPS6334620B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP9429081A 1981-06-18 1981-06-18 Spray type resist developing apparatus Granted JPS57208135A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9429081A JPS57208135A (en) 1981-06-18 1981-06-18 Spray type resist developing apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9429081A JPS57208135A (en) 1981-06-18 1981-06-18 Spray type resist developing apparatus

Publications (2)

Publication Number Publication Date
JPS57208135A true JPS57208135A (en) 1982-12-21
JPS6334620B2 JPS6334620B2 (enrdf_load_stackoverflow) 1988-07-11

Family

ID=14106124

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9429081A Granted JPS57208135A (en) 1981-06-18 1981-06-18 Spray type resist developing apparatus

Country Status (1)

Country Link
JP (1) JPS57208135A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6310157A (ja) * 1986-07-02 1988-01-16 Dainippon Printing Co Ltd 感光性樹脂層の形成法
US4755844A (en) * 1985-04-30 1988-07-05 Kabushiki Kaisha Toshiba Automatic developing device
US7775729B2 (en) * 2006-04-26 2010-08-17 Tokyo Electron Limited Developing apparatus, developing processing method, developing processing program, and computer readable recording medium recording the program
JP2011166086A (ja) * 2010-02-15 2011-08-25 Tokyo Electron Ltd 現像装置、現像方法及び記憶媒体

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4755844A (en) * 1985-04-30 1988-07-05 Kabushiki Kaisha Toshiba Automatic developing device
JPS6310157A (ja) * 1986-07-02 1988-01-16 Dainippon Printing Co Ltd 感光性樹脂層の形成法
US7775729B2 (en) * 2006-04-26 2010-08-17 Tokyo Electron Limited Developing apparatus, developing processing method, developing processing program, and computer readable recording medium recording the program
JP2011166086A (ja) * 2010-02-15 2011-08-25 Tokyo Electron Ltd 現像装置、現像方法及び記憶媒体
US8333522B2 (en) 2010-02-15 2012-12-18 Tokyo Electron Limited Developing apparatus, developing method and storage medium

Also Published As

Publication number Publication date
JPS6334620B2 (enrdf_load_stackoverflow) 1988-07-11

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