JPS6331532U - - Google Patents
Info
- Publication number
- JPS6331532U JPS6331532U JP12638486U JP12638486U JPS6331532U JP S6331532 U JPS6331532 U JP S6331532U JP 12638486 U JP12638486 U JP 12638486U JP 12638486 U JP12638486 U JP 12638486U JP S6331532 U JPS6331532 U JP S6331532U
- Authority
- JP
- Japan
- Prior art keywords
- wafer chuck
- cup
- annular wall
- inner tank
- tank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims description 3
- 235000012431 wafers Nutrition 0.000 claims 4
Description
第１図及び第２図はこの考案に係る半導体製造
装置の一実施例を示す各動作状態での図面、第３
図及び第４図は従来の各半導体製造装置を示す図
面である。 １１……ウエーハチヤツク、１２……ウエーハ
、１３……カツプ、１５……内側槽、１６……外
側槽、１９……スプラツシユガード、２１……シ
リンダ。
装置の一実施例を示す各動作状態での図面、第３
図及び第４図は従来の各半導体製造装置を示す図
面である。 １１……ウエーハチヤツク、１２……ウエーハ
、１３……カツプ、１５……内側槽、１６……外
側槽、１９……スプラツシユガード、２１……シ
リンダ。
Claims (1)
- ウエーハを吸着保持する回転可能なウエーハチ
ヤツクと、ウエーハチヤツクの側方及び下方を囲
い、その底面に環状壁を形成して内側槽と外側槽
に区割し、当該内側槽と外側槽に別個の排液管を
備えたカツプと、ウエーハチヤツクとカツプの環
状壁との間に上下動可能に設けられたスプラツシ
ユガードとを具備したことを特徴とする半導体製
造装置。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986126384U JPH0249708Y2 (ja) | 1986-08-18 | 1986-08-18 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1986126384U JPH0249708Y2 (ja) | 1986-08-18 | 1986-08-18 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6331532U true JPS6331532U (ja) | 1988-03-01 |
| JPH0249708Y2 JPH0249708Y2 (ja) | 1990-12-27 |
Family
ID=31020139
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1986126384U Expired JPH0249708Y2 (ja) | 1986-08-18 | 1986-08-18 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0249708Y2 (ja) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01228129A (ja) * | 1988-03-09 | 1989-09-12 | Tokyo Electron Ltd | 液処理方法 |
| JP2003297801A (ja) * | 2002-03-28 | 2003-10-17 | Shibaura Mechatronics Corp | スピン処理装置 |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6151732U (ja) * | 1984-09-10 | 1986-04-07 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5767841A (en) * | 1980-10-16 | 1982-04-24 | Kano Hajime | Sizing device used for calibrating device for measuring device of mass and concentration of dust |
-
1986
- 1986-08-18 JP JP1986126384U patent/JPH0249708Y2/ja not_active Expired
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6151732U (ja) * | 1984-09-10 | 1986-04-07 |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01228129A (ja) * | 1988-03-09 | 1989-09-12 | Tokyo Electron Ltd | 液処理方法 |
| JP2003297801A (ja) * | 2002-03-28 | 2003-10-17 | Shibaura Mechatronics Corp | スピン処理装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0249708Y2 (ja) | 1990-12-27 |