JPS6151732U - - Google Patents
Info
- Publication number
- JPS6151732U JPS6151732U JP13748584U JP13748584U JPS6151732U JP S6151732 U JPS6151732 U JP S6151732U JP 13748584 U JP13748584 U JP 13748584U JP 13748584 U JP13748584 U JP 13748584U JP S6151732 U JPS6151732 U JP S6151732U
- Authority
- JP
- Japan
- Prior art keywords
- rotary table
- discharging
- outer container
- wafer
- semiconductor device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007599 discharging Methods 0.000 claims description 4
- 238000004140 cleaning Methods 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 239000004065 semiconductor Substances 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
Description
第１図は本考案に係る半導体装置の製造装置の
一例の現像液を示す断面図、第２図は洗浄時の状
態を示す断面図、第３図は従来の製造装置を示す
断面図である。 １……ウエーハ、１０……回転テーブル、１１
……載置台、１２……支柱、１３……モータ、１
４……洗浄水排出用外容器、１６……防水カバー
、１７……現像液排出用内グ容器。
一例の現像液を示す断面図、第２図は洗浄時の状
態を示す断面図、第３図は従来の製造装置を示す
断面図である。 １……ウエーハ、１０……回転テーブル、１１
……載置台、１２……支柱、１３……モータ、１
４……洗浄水排出用外容器、１６……防水カバー
、１７……現像液排出用内グ容器。
Claims (1)
- ウエハーハを保持する回転テーブルと、回転テ
ーブルを回転させる回転制御可能なモータと、回
転テーブルの周囲を囲繞する洗浄水排出用外容器
と、回転テーブルの外容器との間に前記回転テー
ブルに対して相対的に上下動自在に設けられた現
像液排出用内容器とを有することを特徴とする半
導体装置の製造装置。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13748584U JPS6151732U (ja) | 1984-09-10 | 1984-09-10 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13748584U JPS6151732U (ja) | 1984-09-10 | 1984-09-10 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6151732U true JPS6151732U (ja) | 1986-04-07 |
Family
ID=30695900
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13748584U Pending JPS6151732U (ja) | 1984-09-10 | 1984-09-10 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6151732U (ja) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6331532U (ja) * | 1986-08-18 | 1988-03-01 | ||
| JPS63111960U (ja) * | 1987-01-13 | 1988-07-19 | ||
| JPS6433930A (en) * | 1987-07-29 | 1989-02-03 | Sanken Electric Co Ltd | Spinner type photoresist developing method |
| JPH01228129A (ja) * | 1988-03-09 | 1989-09-12 | Tokyo Electron Ltd | 液処理方法 |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS513743U (ja) * | 1974-06-25 | 1976-01-12 | ||
| JPS57107032A (en) * | 1980-12-25 | 1982-07-03 | Toshiba Corp | Coating device for semiconductor substrate |
| JPS58114426A (ja) * | 1981-12-28 | 1983-07-07 | Oki Electric Ind Co Ltd | レジスト塗布装置 |
-
1984
- 1984-09-10 JP JP13748584U patent/JPS6151732U/ja active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS513743U (ja) * | 1974-06-25 | 1976-01-12 | ||
| JPS57107032A (en) * | 1980-12-25 | 1982-07-03 | Toshiba Corp | Coating device for semiconductor substrate |
| JPS58114426A (ja) * | 1981-12-28 | 1983-07-07 | Oki Electric Ind Co Ltd | レジスト塗布装置 |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6331532U (ja) * | 1986-08-18 | 1988-03-01 | ||
| JPS63111960U (ja) * | 1987-01-13 | 1988-07-19 | ||
| JPS6433930A (en) * | 1987-07-29 | 1989-02-03 | Sanken Electric Co Ltd | Spinner type photoresist developing method |
| JPH01228129A (ja) * | 1988-03-09 | 1989-09-12 | Tokyo Electron Ltd | 液処理方法 |