JPS6433930A - Spinner type photoresist developing method - Google Patents

Spinner type photoresist developing method

Info

Publication number
JPS6433930A
JPS6433930A JP19093587A JP19093587A JPS6433930A JP S6433930 A JPS6433930 A JP S6433930A JP 19093587 A JP19093587 A JP 19093587A JP 19093587 A JP19093587 A JP 19093587A JP S6433930 A JPS6433930 A JP S6433930A
Authority
JP
Japan
Prior art keywords
waste liquid
acceptor
wafer
turntable
washing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19093587A
Other languages
Japanese (ja)
Other versions
JPH0253940B2 (en
Inventor
Tsutomu Minagawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanken Electric Co Ltd
Original Assignee
Sanken Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanken Electric Co Ltd filed Critical Sanken Electric Co Ltd
Priority to JP19093587A priority Critical patent/JPS6433930A/en
Publication of JPS6433930A publication Critical patent/JPS6433930A/en
Publication of JPH0253940B2 publication Critical patent/JPH0253940B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To separate high concentration waste liquid and low concentration waste liquid with a relatively simple constitution, by using an apparatus having a first waste liquid acceptor and a second waste liquid acceptor, which is arranged at the outside of the first acceptor, preliminarily washing a wafer with a turntable stopped or rotated at a low speed, and thereafter performing main washing with the turntable rotated at a high speed. CONSTITUTION:A developing apparatus having a turntable 2, a first waste liquid acceptor 6 surrounding the turntable and a second waste liquid acceptor 7 at the outside of the first acceptor is used. A wafer 1, on which photoresist is applied, is fixed on the turntable 2. Developper is supplied on the surface of the wafer 1. The wafer 1 is rotated, and the developer is spread on the entire surface of the wafer 1. Thus development is performed. Then, the turntable 2 is stopped or rotated at a low speed. Under this state, the wafer 1 is preliminarily washed with first washing liquid. Thereafter, the turntable 2 is rotated at a speed higher than that in the preliminary washing, and the wafer 1 undergoes main washing with second washing liquid. The first waste liquid in the preliminary washing and in steps before the preliminary washing is recovered into the first waste liquid acceptor 6. The second waste liquid in the main washing step is recovered in the second waste liquid acceptor 7.
JP19093587A 1987-07-29 1987-07-29 Spinner type photoresist developing method Granted JPS6433930A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19093587A JPS6433930A (en) 1987-07-29 1987-07-29 Spinner type photoresist developing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19093587A JPS6433930A (en) 1987-07-29 1987-07-29 Spinner type photoresist developing method

Publications (2)

Publication Number Publication Date
JPS6433930A true JPS6433930A (en) 1989-02-03
JPH0253940B2 JPH0253940B2 (en) 1990-11-20

Family

ID=16266132

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19093587A Granted JPS6433930A (en) 1987-07-29 1987-07-29 Spinner type photoresist developing method

Country Status (1)

Country Link
JP (1) JPS6433930A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05144723A (en) * 1991-11-20 1993-06-11 Fujitsu Ltd Developing method
WO2012004976A1 (en) * 2010-07-09 2012-01-12 住友ベークライト株式会社 Method for forming cured film

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6151732U (en) * 1984-09-10 1986-04-07

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5767841A (en) * 1980-10-16 1982-04-24 Kano Hajime Sizing device used for calibrating device for measuring device of mass and concentration of dust

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6151732U (en) * 1984-09-10 1986-04-07

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05144723A (en) * 1991-11-20 1993-06-11 Fujitsu Ltd Developing method
WO2012004976A1 (en) * 2010-07-09 2012-01-12 住友ベークライト株式会社 Method for forming cured film

Also Published As

Publication number Publication date
JPH0253940B2 (en) 1990-11-20

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees