JPS6433930A - Spinner type photoresist developing method - Google Patents
Spinner type photoresist developing methodInfo
- Publication number
- JPS6433930A JPS6433930A JP19093587A JP19093587A JPS6433930A JP S6433930 A JPS6433930 A JP S6433930A JP 19093587 A JP19093587 A JP 19093587A JP 19093587 A JP19093587 A JP 19093587A JP S6433930 A JPS6433930 A JP S6433930A
- Authority
- JP
- Japan
- Prior art keywords
- waste liquid
- acceptor
- wafer
- turntable
- washing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To separate high concentration waste liquid and low concentration waste liquid with a relatively simple constitution, by using an apparatus having a first waste liquid acceptor and a second waste liquid acceptor, which is arranged at the outside of the first acceptor, preliminarily washing a wafer with a turntable stopped or rotated at a low speed, and thereafter performing main washing with the turntable rotated at a high speed. CONSTITUTION:A developing apparatus having a turntable 2, a first waste liquid acceptor 6 surrounding the turntable and a second waste liquid acceptor 7 at the outside of the first acceptor is used. A wafer 1, on which photoresist is applied, is fixed on the turntable 2. Developper is supplied on the surface of the wafer 1. The wafer 1 is rotated, and the developer is spread on the entire surface of the wafer 1. Thus development is performed. Then, the turntable 2 is stopped or rotated at a low speed. Under this state, the wafer 1 is preliminarily washed with first washing liquid. Thereafter, the turntable 2 is rotated at a speed higher than that in the preliminary washing, and the wafer 1 undergoes main washing with second washing liquid. The first waste liquid in the preliminary washing and in steps before the preliminary washing is recovered into the first waste liquid acceptor 6. The second waste liquid in the main washing step is recovered in the second waste liquid acceptor 7.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19093587A JPS6433930A (en) | 1987-07-29 | 1987-07-29 | Spinner type photoresist developing method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19093587A JPS6433930A (en) | 1987-07-29 | 1987-07-29 | Spinner type photoresist developing method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6433930A true JPS6433930A (en) | 1989-02-03 |
JPH0253940B2 JPH0253940B2 (en) | 1990-11-20 |
Family
ID=16266132
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19093587A Granted JPS6433930A (en) | 1987-07-29 | 1987-07-29 | Spinner type photoresist developing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6433930A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05144723A (en) * | 1991-11-20 | 1993-06-11 | Fujitsu Ltd | Developing method |
WO2012004976A1 (en) * | 2010-07-09 | 2012-01-12 | 住友ベークライト株式会社 | Method for forming cured film |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6151732U (en) * | 1984-09-10 | 1986-04-07 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5767841A (en) * | 1980-10-16 | 1982-04-24 | Kano Hajime | Sizing device used for calibrating device for measuring device of mass and concentration of dust |
-
1987
- 1987-07-29 JP JP19093587A patent/JPS6433930A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6151732U (en) * | 1984-09-10 | 1986-04-07 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05144723A (en) * | 1991-11-20 | 1993-06-11 | Fujitsu Ltd | Developing method |
WO2012004976A1 (en) * | 2010-07-09 | 2012-01-12 | 住友ベークライト株式会社 | Method for forming cured film |
Also Published As
Publication number | Publication date |
---|---|
JPH0253940B2 (en) | 1990-11-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
MY106618A (en) | Non-photographic method for patterning organic polymer films. | |
JPS5420719A (en) | Photosensitive material for image formation and image formation method | |
FI854215A0 (en) | FRAMKALLARE FOER EXPONERADE NEGATIVT ARBETANDE REPRODUKTIONSSKIKT SAMT FOERFARANDE FOER FRAMSTAELLNING AV TRYCKFORMAR OCH ANVAENDNING AV FRAMKALLAREN. | |
JPS5328375A (en) | Inspecting method | |
EP0368625A3 (en) | Method and apparatus for forming layout pattern of semiconductor integrated circuit | |
JPS6433930A (en) | Spinner type photoresist developing method | |
JPS5747744A (en) | Etching method for glass | |
KR970003412A (en) | Method of forming fine pattern of semiconductor device | |
TW255021B (en) | Testing data processing apparatus | |
JPS57183030A (en) | Manufacture of semiconductor device | |
JPS6437016A (en) | Wet processor and substrate holding jig used for same | |
KR910005081B1 (en) | A manufacturing method of a flourescent screen of color picture tube | |
JPS51147260A (en) | Inspecting method of resist pattern | |
JPS5888749A (en) | Developing device | |
EP0782074A3 (en) | Game apparatus and method for debugging game program | |
KR920004905A (en) | Coating method of pad photoresist | |
KR970051935A (en) | Spinner facility for semiconductor device manufacturing | |
JPS5352133A (en) | Electrophotographic method | |
JPH06132208A (en) | Method of patterning substrate | |
JPS6459352A (en) | Image forming method | |
KR970018118A (en) | Photosensitive film developing method and apparatus | |
Kostromin et al. | Detecting the relation between the diffusion parameters and the point defect microscopic characteristics by a computer simulation method | |
JPS6444018A (en) | Device for developing photoresist | |
JPS56110933A (en) | Developing method | |
JPS5366174A (en) | Finding method for defective part of semiconductor unit |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |