JPS63312975A - アルミニウムスパツタリングタ−ゲツト - Google Patents

アルミニウムスパツタリングタ−ゲツト

Info

Publication number
JPS63312975A
JPS63312975A JP15037687A JP15037687A JPS63312975A JP S63312975 A JPS63312975 A JP S63312975A JP 15037687 A JP15037687 A JP 15037687A JP 15037687 A JP15037687 A JP 15037687A JP S63312975 A JPS63312975 A JP S63312975A
Authority
JP
Japan
Prior art keywords
sputtering
target
aluminum
center
crystal orientation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15037687A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0572470B2 (enrdf_load_stackoverflow
Inventor
Tadao Ueda
上田　忠雄
Shiro Matsuoka
松岡　司郎
Kazunari Takemura
一成 竹村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Kasei Naoetsu Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kasei Naoetsu Industries Ltd filed Critical Kasei Naoetsu Industries Ltd
Priority to JP15037687A priority Critical patent/JPS63312975A/ja
Publication of JPS63312975A publication Critical patent/JPS63312975A/ja
Publication of JPH0572470B2 publication Critical patent/JPH0572470B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP15037687A 1987-06-17 1987-06-17 アルミニウムスパツタリングタ−ゲツト Granted JPS63312975A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15037687A JPS63312975A (ja) 1987-06-17 1987-06-17 アルミニウムスパツタリングタ−ゲツト

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15037687A JPS63312975A (ja) 1987-06-17 1987-06-17 アルミニウムスパツタリングタ−ゲツト

Publications (2)

Publication Number Publication Date
JPS63312975A true JPS63312975A (ja) 1988-12-21
JPH0572470B2 JPH0572470B2 (enrdf_load_stackoverflow) 1993-10-12

Family

ID=15495641

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15037687A Granted JPS63312975A (ja) 1987-06-17 1987-06-17 アルミニウムスパツタリングタ−ゲツト

Country Status (1)

Country Link
JP (1) JPS63312975A (enrdf_load_stackoverflow)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0417670A (ja) * 1990-05-11 1992-01-22 Kobe Steel Ltd 光メディア用スパッタリングターゲット溶製材
US5456815A (en) * 1993-04-08 1995-10-10 Japan Energy Corporation Sputtering targets of high-purity aluminum or alloy thereof
EP0785293A1 (en) 1993-09-27 1997-07-23 Japan Energy Corporation High purity titanium sputtering targets
JPH09307129A (ja) * 1996-05-17 1997-11-28 Canon Inc 光起電力素子
US5976641A (en) * 1991-03-07 1999-11-02 Kabushiki Kaisha Kobe Seiko Sho A1 alloy films and melting A1 alloy sputtering targets for depositing A1 alloy films
JP2012522894A (ja) * 2009-04-03 2012-09-27 アプライド マテリアルズ インコーポレイテッド Ｐｖｄチャンバ用スパッターターゲット

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5558369A (en) * 1978-10-20 1980-05-01 Nec Corp Preparation of electric conductive film of aluminum-silicon alloy

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5558369A (en) * 1978-10-20 1980-05-01 Nec Corp Preparation of electric conductive film of aluminum-silicon alloy

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0417670A (ja) * 1990-05-11 1992-01-22 Kobe Steel Ltd 光メディア用スパッタリングターゲット溶製材
US5976641A (en) * 1991-03-07 1999-11-02 Kabushiki Kaisha Kobe Seiko Sho A1 alloy films and melting A1 alloy sputtering targets for depositing A1 alloy films
US6206985B1 (en) 1991-03-07 2001-03-27 Kabushiki Kaisha Kobe Seiko Sho A1 alloy films and melting A1 alloy sputtering targets for depositing A1 alloy films
US5456815A (en) * 1993-04-08 1995-10-10 Japan Energy Corporation Sputtering targets of high-purity aluminum or alloy thereof
EP0785293A1 (en) 1993-09-27 1997-07-23 Japan Energy Corporation High purity titanium sputtering targets
EP0785292A1 (en) 1993-09-27 1997-07-23 Japan Energy Corporation High purity titanium sputtering targets
JPH09307129A (ja) * 1996-05-17 1997-11-28 Canon Inc 光起電力素子
JP2012522894A (ja) * 2009-04-03 2012-09-27 アプライド マテリアルズ インコーポレイテッド Ｐｖｄチャンバ用スパッターターゲット

Also Published As

Publication number Publication date
JPH0572470B2 (enrdf_load_stackoverflow) 1993-10-12

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