JPH0310709B2 - - Google Patents

Info

Publication number
JPH0310709B2
JPH0310709B2 JP61293742A JP29374286A JPH0310709B2 JP H0310709 B2 JPH0310709 B2 JP H0310709B2 JP 61293742 A JP61293742 A JP 61293742A JP 29374286 A JP29374286 A JP 29374286A JP H0310709 B2 JPH0310709 B2 JP H0310709B2
Authority
JP
Japan
Prior art keywords
sputtering
target
aluminum
thin film
crystal orientation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61293742A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63145771A (ja
Inventor
Tadao Ueda
Shiro Matsuoka
Kazunari Takemura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Kasei Naoetsu Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kasei Naoetsu Industries Ltd filed Critical Kasei Naoetsu Industries Ltd
Priority to JP29374286A priority Critical patent/JPS63145771A/ja
Publication of JPS63145771A publication Critical patent/JPS63145771A/ja
Publication of JPH0310709B2 publication Critical patent/JPH0310709B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
JP29374286A 1986-12-10 1986-12-10 スパツタリングタ−ゲツト Granted JPS63145771A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP29374286A JPS63145771A (ja) 1986-12-10 1986-12-10 スパツタリングタ−ゲツト

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP29374286A JPS63145771A (ja) 1986-12-10 1986-12-10 スパツタリングタ−ゲツト

Publications (2)

Publication Number Publication Date
JPS63145771A JPS63145771A (ja) 1988-06-17
JPH0310709B2 true JPH0310709B2 (enrdf_load_stackoverflow) 1991-02-14

Family

ID=17798652

Family Applications (1)

Application Number Title Priority Date Filing Date
JP29374286A Granted JPS63145771A (ja) 1986-12-10 1986-12-10 スパツタリングタ−ゲツト

Country Status (1)

Country Link
JP (1) JPS63145771A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110205591A (zh) * 2015-06-05 2019-09-06 株式会社钢臂功科研 铝合金溅射靶材

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63216966A (ja) * 1987-03-06 1988-09-09 Toshiba Corp スパツタタ−ゲツト
JP2928330B2 (ja) * 1990-05-11 1999-08-03 株式会社神戸製鋼所 光メディア用スパッタリングターゲット溶製材
JPH0426757A (ja) * 1990-05-22 1992-01-29 Kobe Steel Ltd Ａｌ合金薄膜及び溶製Ａｌ合金スパッタリングターゲット
US5500301A (en) 1991-03-07 1996-03-19 Kabushiki Kaisha Kobe Seiko Sho A1 alloy films and melting A1 alloy sputtering targets for depositing A1 alloy films
JP2857015B2 (ja) * 1993-04-08 1999-02-10 株式会社ジャパンエナジー 高純度アルミニウムまたはその合金からなるスパッタリングターゲット
US6030511A (en) * 1995-02-03 2000-02-29 Nec Corporation Collimated sputtering method and system used therefor
WO2005031028A1 (ja) 2003-09-26 2005-04-07 Kabushiki Kaisha Toshiba スパッタリングターゲットとそれを用いたＳｉ酸化膜の製造方法

Non-Patent Citations (5)

* Cited by examiner, † Cited by third party
Title
10TH INTERNATIONAL VACUUM CONGRESS(IVC-10) *
J.APPL.PHYS.=1981 *
J.VAC.SCI.TECHNOL.A=1986 *
RADIATION EFFECTS=1981 *
THIN SOLID FILMS,96(1982) *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110205591A (zh) * 2015-06-05 2019-09-06 株式会社钢臂功科研 铝合金溅射靶材
CN110205591B (zh) * 2015-06-05 2021-04-30 株式会社钢臂功科研 铝合金溅射靶材

Also Published As

Publication number Publication date
JPS63145771A (ja) 1988-06-17

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