JPH0572470B2 - - Google Patents

Info

Publication number
JPH0572470B2
JPH0572470B2 JP62150376A JP15037687A JPH0572470B2 JP H0572470 B2 JPH0572470 B2 JP H0572470B2 JP 62150376 A JP62150376 A JP 62150376A JP 15037687 A JP15037687 A JP 15037687A JP H0572470 B2 JPH0572470 B2 JP H0572470B2
Authority
JP
Japan
Prior art keywords
aluminum
sputtering
target
center
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62150376A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63312975A (ja
Inventor
Tadao Ueda
Shiro Matsuoka
Kazunari Takemura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chemical Industries Ltd filed Critical Mitsubishi Chemical Industries Ltd
Priority to JP15037687A priority Critical patent/JPS63312975A/ja
Publication of JPS63312975A publication Critical patent/JPS63312975A/ja
Publication of JPH0572470B2 publication Critical patent/JPH0572470B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP15037687A 1987-06-17 1987-06-17 アルミニウムスパツタリングタ−ゲツト Granted JPS63312975A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15037687A JPS63312975A (ja) 1987-06-17 1987-06-17 アルミニウムスパツタリングタ−ゲツト

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15037687A JPS63312975A (ja) 1987-06-17 1987-06-17 アルミニウムスパツタリングタ−ゲツト

Publications (2)

Publication Number Publication Date
JPS63312975A JPS63312975A (ja) 1988-12-21
JPH0572470B2 true JPH0572470B2 (enrdf_load_stackoverflow) 1993-10-12

Family

ID=15495641

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15037687A Granted JPS63312975A (ja) 1987-06-17 1987-06-17 アルミニウムスパツタリングタ−ゲツト

Country Status (1)

Country Link
JP (1) JPS63312975A (enrdf_load_stackoverflow)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2928330B2 (ja) * 1990-05-11 1999-08-03 株式会社神戸製鋼所 光メディア用スパッタリングターゲット溶製材
US5500301A (en) 1991-03-07 1996-03-19 Kabushiki Kaisha Kobe Seiko Sho A1 alloy films and melting A1 alloy sputtering targets for depositing A1 alloy films
JP2857015B2 (ja) * 1993-04-08 1999-02-10 株式会社ジャパンエナジー 高純度アルミニウムまたはその合金からなるスパッタリングターゲット
US5772860A (en) 1993-09-27 1998-06-30 Japan Energy Corporation High purity titanium sputtering targets
JP3720456B2 (ja) * 1996-05-17 2005-11-30 キヤノン株式会社 光起電力素子
US9752228B2 (en) * 2009-04-03 2017-09-05 Applied Materials, Inc. Sputtering target for PVD chamber

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5558369A (en) * 1978-10-20 1980-05-01 Nec Corp Preparation of electric conductive film of aluminum-silicon alloy

Also Published As

Publication number Publication date
JPS63312975A (ja) 1988-12-21

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