JPS6327850B2 - - Google Patents

Info

Publication number
JPS6327850B2
JPS6327850B2 JP54125441A JP12544179A JPS6327850B2 JP S6327850 B2 JPS6327850 B2 JP S6327850B2 JP 54125441 A JP54125441 A JP 54125441A JP 12544179 A JP12544179 A JP 12544179A JP S6327850 B2 JPS6327850 B2 JP S6327850B2
Authority
JP
Japan
Prior art keywords
substrate
hydrophilicity
film
degree
silane compound
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP54125441A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5649526A (en
Inventor
Chiharu Kato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP12544179A priority Critical patent/JPS5649526A/ja
Publication of JPS5649526A publication Critical patent/JPS5649526A/ja
Publication of JPS6327850B2 publication Critical patent/JPS6327850B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P95/00—

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Weting (AREA)
JP12544179A 1979-09-29 1979-09-29 Manufacture of semiconductor device Granted JPS5649526A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12544179A JPS5649526A (en) 1979-09-29 1979-09-29 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12544179A JPS5649526A (en) 1979-09-29 1979-09-29 Manufacture of semiconductor device

Publications (2)

Publication Number Publication Date
JPS5649526A JPS5649526A (en) 1981-05-06
JPS6327850B2 true JPS6327850B2 (OSRAM) 1988-06-06

Family

ID=14910158

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12544179A Granted JPS5649526A (en) 1979-09-29 1979-09-29 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS5649526A (OSRAM)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5768834A (en) * 1980-10-17 1982-04-27 Matsushita Electric Ind Co Ltd Photographic etching method
JPS5844715A (ja) * 1981-09-11 1983-03-15 Fujitsu Ltd 微細パタ−ン形成方法
JPS59136935A (ja) * 1983-01-27 1984-08-06 Nec Corp 半導体装置の製造方法
KR20020006735A (ko) * 2000-07-13 2002-01-26 이형도 미세 디바이스의 표면처리물질 및 표면처리방법
US8617799B2 (en) * 2008-09-22 2013-12-31 Api Technologies Corp. Post arrays and methods of making the same
KR102189379B1 (ko) 2008-10-21 2020-12-11 도오꾜오까고오교 가부시끼가이샤 표면 처리액 및 표면 처리 방법, 그리고 소수화 처리 방법 및 소수화된 기판

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5434769A (en) * 1977-08-24 1979-03-14 Fuji Electric Co Ltd Photoetching method for silicon semiconductor wafer

Also Published As

Publication number Publication date
JPS5649526A (en) 1981-05-06

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