JPS5768834A - Photographic etching method - Google Patents

Photographic etching method

Info

Publication number
JPS5768834A
JPS5768834A JP14616880A JP14616880A JPS5768834A JP S5768834 A JPS5768834 A JP S5768834A JP 14616880 A JP14616880 A JP 14616880A JP 14616880 A JP14616880 A JP 14616880A JP S5768834 A JPS5768834 A JP S5768834A
Authority
JP
Japan
Prior art keywords
film
photosensitive resin
etching method
coating
hexamethyldisilazane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14616880A
Other languages
Japanese (ja)
Inventor
Masaru Sasako
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP14616880A priority Critical patent/JPS5768834A/en
Publication of JPS5768834A publication Critical patent/JPS5768834A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)

Abstract

PURPOSE:To prevent deterioration of resist sensitivity, uniting of patterns, and uneven coating in photographic etching, by coating a liquid mixture of hexamethyldisilazane and a nonpolar organic solvent on a film, forming a photosensitive resin on this mixture, and subjecting this layer to exposure processing. CONSTITUTION:In this photgraphic etching method in which a photosensitive resin is coated on the film to be etched, and this resin is subjected to exposure processing, before coating the photosensitive resin on said film, a liquid mixture of hexamethyldisilazane and a nonpolar organic solvent, preferably, ethyl cellosolve acetate is coated on said film.
JP14616880A 1980-10-17 1980-10-17 Photographic etching method Pending JPS5768834A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14616880A JPS5768834A (en) 1980-10-17 1980-10-17 Photographic etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14616880A JPS5768834A (en) 1980-10-17 1980-10-17 Photographic etching method

Publications (1)

Publication Number Publication Date
JPS5768834A true JPS5768834A (en) 1982-04-27

Family

ID=15401663

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14616880A Pending JPS5768834A (en) 1980-10-17 1980-10-17 Photographic etching method

Country Status (1)

Country Link
JP (1) JPS5768834A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5723259A (en) * 1992-01-07 1998-03-03 Fujitsu Limited Negative type composition for chemically amplified resist and process and apparatus of formation of chemically amplified resist pattern

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4953629A (en) * 1972-07-31 1974-05-24
JPS5040126A (en) * 1973-08-15 1975-04-12
JPS5649526A (en) * 1979-09-29 1981-05-06 Toshiba Corp Manufacture of semiconductor device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4953629A (en) * 1972-07-31 1974-05-24
JPS5040126A (en) * 1973-08-15 1975-04-12
JPS5649526A (en) * 1979-09-29 1981-05-06 Toshiba Corp Manufacture of semiconductor device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5723259A (en) * 1992-01-07 1998-03-03 Fujitsu Limited Negative type composition for chemically amplified resist and process and apparatus of formation of chemically amplified resist pattern

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