JPS5536812A - Formation method for sand blast resist image of photosensitive resin - Google Patents

Formation method for sand blast resist image of photosensitive resin

Info

Publication number
JPS5536812A
JPS5536812A JP10915478A JP10915478A JPS5536812A JP S5536812 A JPS5536812 A JP S5536812A JP 10915478 A JP10915478 A JP 10915478A JP 10915478 A JP10915478 A JP 10915478A JP S5536812 A JPS5536812 A JP S5536812A
Authority
JP
Japan
Prior art keywords
photosensitive resin
sand blast
image
unhardened
solid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10915478A
Other languages
Japanese (ja)
Inventor
Nobuyoshi Miyata
Tomoo Konakawa
Akio Yanagida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kansai Paint Co Ltd
Original Assignee
Kansai Paint Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kansai Paint Co Ltd filed Critical Kansai Paint Co Ltd
Priority to JP10915478A priority Critical patent/JPS5536812A/en
Publication of JPS5536812A publication Critical patent/JPS5536812A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)

Abstract

PURPOSE:To enable formation of a sand blast resist image of high image precision, by coating a body surface with an unhardened liquid photosensitive resin and laminating a solid unhardened photosensitive resin sheet on this coated layer. CONSTITUTION:The surface of a body, such as silicon wafer is thinly coated with a liquid unhardened photosensitive resin. A solid unhardened photosensitive resin sheet is laminated on this coated layer using a rubber roller. On this solid resin an image film is placed, exposed, and developed to form a resist image for sand blast. This method permits the resist layer to be fastly sticked to the body surface and to be prevented from stripping and deformation during sand blast, and thus, a high precision image to be formed on the body surface.
JP10915478A 1978-09-07 1978-09-07 Formation method for sand blast resist image of photosensitive resin Pending JPS5536812A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10915478A JPS5536812A (en) 1978-09-07 1978-09-07 Formation method for sand blast resist image of photosensitive resin

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10915478A JPS5536812A (en) 1978-09-07 1978-09-07 Formation method for sand blast resist image of photosensitive resin

Publications (1)

Publication Number Publication Date
JPS5536812A true JPS5536812A (en) 1980-03-14

Family

ID=14502991

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10915478A Pending JPS5536812A (en) 1978-09-07 1978-09-07 Formation method for sand blast resist image of photosensitive resin

Country Status (1)

Country Link
JP (1) JPS5536812A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02115845A (en) * 1988-10-26 1990-04-27 Tokyo Ohka Kogyo Co Ltd Photopolymerizable composition for sand blast and method for engraving by using the same
JP2003050463A (en) * 2001-08-08 2003-02-21 Nippon Synthetic Chem Ind Co Ltd:The Pattern forming method

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50137201A (en) * 1974-04-17 1975-10-31
JPS52110106A (en) * 1976-03-10 1977-09-16 Tokyo Shibaura Electric Co Method of making screen printing form

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50137201A (en) * 1974-04-17 1975-10-31
JPS52110106A (en) * 1976-03-10 1977-09-16 Tokyo Shibaura Electric Co Method of making screen printing form

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02115845A (en) * 1988-10-26 1990-04-27 Tokyo Ohka Kogyo Co Ltd Photopolymerizable composition for sand blast and method for engraving by using the same
JP2003050463A (en) * 2001-08-08 2003-02-21 Nippon Synthetic Chem Ind Co Ltd:The Pattern forming method
JP4723764B2 (en) * 2001-08-08 2011-07-13 日本合成化学工業株式会社 Pattern formation method

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