JPS5710145A - Lithographic photosensitive resin plate - Google Patents

Lithographic photosensitive resin plate

Info

Publication number
JPS5710145A
JPS5710145A JP8444480A JP8444480A JPS5710145A JP S5710145 A JPS5710145 A JP S5710145A JP 8444480 A JP8444480 A JP 8444480A JP 8444480 A JP8444480 A JP 8444480A JP S5710145 A JPS5710145 A JP S5710145A
Authority
JP
Japan
Prior art keywords
carboxylic acid
complex salt
chromium complex
layer
plastic film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8444480A
Other languages
Japanese (ja)
Other versions
JPS6158033B2 (en
Inventor
Minoru Wada
Akira Tomita
Toshikazu Nishiwaki
Kuniomi Eto
Shinichi Tanaka
Toshiaki Fujimura
Mitsuo Iguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyobo Co Ltd
Original Assignee
Toyobo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyobo Co Ltd filed Critical Toyobo Co Ltd
Priority to JP8444480A priority Critical patent/JPS5710145A/en
Publication of JPS5710145A publication Critical patent/JPS5710145A/en
Publication of JPS6158033B2 publication Critical patent/JPS6158033B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography

Abstract

PURPOSE:To obtain a lithographic plate not requiring dampening water, by forming an ink-repelling silicone compound layer on a nonimage-line part. CONSTITUTION:A photosensitive resin layer is formed on a support made of a metal or plastic film having an adhesive subbing layer made of a synthetic resin or not, and this photosensitive layer is coated with a trivalent chromium complex salt of a carboxylic acid having a polyorganosiloxane residue as a nonphotosensitive silicone compound. An organic carboxylic acid trivalent chromium complex salt is strongly combined with the surface of a base material having generally OH, carboxy, acidamide, sulfo, or the like groups in its molecular chain, such as paper, filber, glass fiber, plastic film, and being ready to be negatively charged on its surface upon contact with a solvent. as an organic residue of this chromium complex salt, a mono- or divalent polyvalent carboxylic acid made of polyorganosiloxane having such a structure as represented by the formula shown is used.
JP8444480A 1980-06-20 1980-06-20 Lithographic photosensitive resin plate Granted JPS5710145A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8444480A JPS5710145A (en) 1980-06-20 1980-06-20 Lithographic photosensitive resin plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8444480A JPS5710145A (en) 1980-06-20 1980-06-20 Lithographic photosensitive resin plate

Publications (2)

Publication Number Publication Date
JPS5710145A true JPS5710145A (en) 1982-01-19
JPS6158033B2 JPS6158033B2 (en) 1986-12-09

Family

ID=13830763

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8444480A Granted JPS5710145A (en) 1980-06-20 1980-06-20 Lithographic photosensitive resin plate

Country Status (1)

Country Link
JP (1) JPS5710145A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0186507A2 (en) * 1984-12-22 1986-07-02 Chisso Corporation Carboxyl group-containing siloxane compounds
JPH0347492B1 (en) * 1981-12-18 1991-07-19 Toyo Boseki
CN1038875C (en) * 1993-01-12 1998-06-24 中国科学院长春光学精密机械研究所 Method for mfg. optical plastics chrome plated code disc
WO1999059826A1 (en) * 1998-05-21 1999-11-25 New England Science And Specialty Products, Inc. Waterless lithographic printing plates
US6558458B1 (en) 1999-09-17 2003-05-06 American Ink Jet Corporation Systems and methods for lithography

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01114232U (en) * 1988-01-28 1989-08-01

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0347492B1 (en) * 1981-12-18 1991-07-19 Toyo Boseki
EP0186507A2 (en) * 1984-12-22 1986-07-02 Chisso Corporation Carboxyl group-containing siloxane compounds
CN1038875C (en) * 1993-01-12 1998-06-24 中国科学院长春光学精密机械研究所 Method for mfg. optical plastics chrome plated code disc
WO1999059826A1 (en) * 1998-05-21 1999-11-25 New England Science And Specialty Products, Inc. Waterless lithographic printing plates
US6051365A (en) * 1998-05-21 2000-04-18 New England Science & Specialty Products, Inc. Waterless lithographic printing plates
US6558458B1 (en) 1999-09-17 2003-05-06 American Ink Jet Corporation Systems and methods for lithography

Also Published As

Publication number Publication date
JPS6158033B2 (en) 1986-12-09

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