JPS63273319A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法

Info

Publication number
JPS63273319A
JPS63273319A JP62108304A JP10830487A JPS63273319A JP S63273319 A JPS63273319 A JP S63273319A JP 62108304 A JP62108304 A JP 62108304A JP 10830487 A JP10830487 A JP 10830487A JP S63273319 A JPS63273319 A JP S63273319A
Authority
JP
Japan
Prior art keywords
wafer
pattern
patterns
outer periphery
alignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62108304A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0546087B2 (enrdf_load_html_response
Inventor
Akira Mochizuki
晃 望月
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP62108304A priority Critical patent/JPS63273319A/ja
Publication of JPS63273319A publication Critical patent/JPS63273319A/ja
Publication of JPH0546087B2 publication Critical patent/JPH0546087B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP62108304A 1987-04-30 1987-04-30 半導体装置の製造方法 Granted JPS63273319A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62108304A JPS63273319A (ja) 1987-04-30 1987-04-30 半導体装置の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62108304A JPS63273319A (ja) 1987-04-30 1987-04-30 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS63273319A true JPS63273319A (ja) 1988-11-10
JPH0546087B2 JPH0546087B2 (enrdf_load_html_response) 1993-07-13

Family

ID=14481304

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62108304A Granted JPS63273319A (ja) 1987-04-30 1987-04-30 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS63273319A (enrdf_load_html_response)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6242423A (ja) * 1985-08-19 1987-02-24 Nec Corp ホトレジスト法
JPS6243142A (ja) * 1985-08-20 1987-02-25 Toshiba Corp 半導体装置及びその使用方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6242423A (ja) * 1985-08-19 1987-02-24 Nec Corp ホトレジスト法
JPS6243142A (ja) * 1985-08-20 1987-02-25 Toshiba Corp 半導体装置及びその使用方法

Also Published As

Publication number Publication date
JPH0546087B2 (enrdf_load_html_response) 1993-07-13

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