JPS6323666B2 - - Google Patents
Info
- Publication number
- JPS6323666B2 JPS6323666B2 JP58038166A JP3816683A JPS6323666B2 JP S6323666 B2 JPS6323666 B2 JP S6323666B2 JP 58038166 A JP58038166 A JP 58038166A JP 3816683 A JP3816683 A JP 3816683A JP S6323666 B2 JPS6323666 B2 JP S6323666B2
- Authority
- JP
- Japan
- Prior art keywords
- insulating film
- compound semiconductor
- active region
- mask
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/80—FETs having rectifying junction gate electrodes
- H10D30/87—FETs having Schottky gate electrodes, e.g. metal-semiconductor FETs [MESFET]
Landscapes
- Junction Field-Effect Transistors (AREA)
- Recrystallisation Techniques (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58038166A JPS59165461A (ja) | 1983-03-10 | 1983-03-10 | ショットキ接合形化合物半導体電界効果トランジスタの製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP58038166A JPS59165461A (ja) | 1983-03-10 | 1983-03-10 | ショットキ接合形化合物半導体電界効果トランジスタの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59165461A JPS59165461A (ja) | 1984-09-18 |
JPS6323666B2 true JPS6323666B2 (enrdf_load_stackoverflow) | 1988-05-17 |
Family
ID=12517812
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP58038166A Granted JPS59165461A (ja) | 1983-03-10 | 1983-03-10 | ショットキ接合形化合物半導体電界効果トランジスタの製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59165461A (enrdf_load_stackoverflow) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3509963A1 (de) * | 1985-03-20 | 1986-09-25 | Standard Elektrik Lorenz Ag, 7000 Stuttgart | Junction-feldeffekttransistor mit selbstjustierendem gate |
JPH0758715B2 (ja) * | 1985-08-14 | 1995-06-21 | 日本電気株式会社 | 電界効果トランジスタの製造方法 |
JPH0758716B2 (ja) * | 1985-09-10 | 1995-06-21 | 松下電器産業株式会社 | 電界効果トランジスタの製造方法 |
KR100434698B1 (ko) | 2001-09-05 | 2004-06-07 | 주식회사 하이닉스반도체 | 반도체소자의 선택적 에피성장법 |
KR100455724B1 (ko) | 2001-10-08 | 2004-11-12 | 주식회사 하이닉스반도체 | 반도체소자의 플러그 형성방법 |
KR100455725B1 (ko) | 2001-10-08 | 2004-11-12 | 주식회사 하이닉스반도체 | 반도체소자의 플러그 형성방법 |
KR100431295B1 (ko) | 2001-10-12 | 2004-05-12 | 주식회사 하이닉스반도체 | 반도체소자의 플러그 형성방법 |
US9837499B2 (en) * | 2014-08-13 | 2017-12-05 | Intel Corporation | Self-aligned gate last III-N transistors |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5644582B2 (enrdf_load_stackoverflow) * | 1973-08-13 | 1981-10-20 | ||
FR2496982A1 (fr) * | 1980-12-24 | 1982-06-25 | Labo Electronique Physique | Procede de fabrication de transistors a effet de champ, a grille auto-alignee, et transistors ainsi obtenus |
-
1983
- 1983-03-10 JP JP58038166A patent/JPS59165461A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS59165461A (ja) | 1984-09-18 |
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