JPS6322056B2 - - Google Patents
Info
- Publication number
- JPS6322056B2 JPS6322056B2 JP54156789A JP15678979A JPS6322056B2 JP S6322056 B2 JPS6322056 B2 JP S6322056B2 JP 54156789 A JP54156789 A JP 54156789A JP 15678979 A JP15678979 A JP 15678979A JP S6322056 B2 JPS6322056 B2 JP S6322056B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- semiconductor film
- single crystal
- amorphous
- grain boundaries
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H10P14/3802—
-
- H10P14/3808—
-
- H10P14/2905—
-
- H10P14/2921—
-
- H10P14/3238—
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- H10P14/3411—
-
- H10P14/3458—
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- H10P14/3466—
Landscapes
- Recrystallisation Techniques (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15678979A JPS5680126A (en) | 1979-12-05 | 1979-12-05 | Formation of monocrystalline semiconductor |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15678979A JPS5680126A (en) | 1979-12-05 | 1979-12-05 | Formation of monocrystalline semiconductor |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5680126A JPS5680126A (en) | 1981-07-01 |
| JPS6322056B2 true JPS6322056B2 (enExample) | 1988-05-10 |
Family
ID=15635334
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15678979A Granted JPS5680126A (en) | 1979-12-05 | 1979-12-05 | Formation of monocrystalline semiconductor |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5680126A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0423046U (enExample) * | 1990-06-15 | 1992-02-25 |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5837913A (ja) * | 1981-08-28 | 1983-03-05 | Matsushita Electric Ind Co Ltd | 半導体装置の製造方法 |
| JPS58175827A (ja) * | 1982-04-07 | 1983-10-15 | Matsushita Electric Ind Co Ltd | 半導体装置の製造方法 |
| JPH0824103B2 (ja) * | 1984-11-26 | 1996-03-06 | ソニー株式会社 | 薄膜トランジスタの製造方法 |
| JPH0817157B2 (ja) * | 1984-11-30 | 1996-02-21 | ソニー株式会社 | 薄膜トランジスタの製造方法 |
| JPH0397224A (ja) * | 1989-09-11 | 1991-04-23 | Toshiba Corp | 半導体装置の製造方法 |
| KR0124626B1 (ko) * | 1994-02-01 | 1997-12-11 | 문정환 | 박막 트랜지스터 제조방법 |
-
1979
- 1979-12-05 JP JP15678979A patent/JPS5680126A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0423046U (enExample) * | 1990-06-15 | 1992-02-25 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5680126A (en) | 1981-07-01 |
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