JPS6321888B2 - - Google Patents

Info

Publication number
JPS6321888B2
JPS6321888B2 JP12964780A JP12964780A JPS6321888B2 JP S6321888 B2 JPS6321888 B2 JP S6321888B2 JP 12964780 A JP12964780 A JP 12964780A JP 12964780 A JP12964780 A JP 12964780A JP S6321888 B2 JPS6321888 B2 JP S6321888B2
Authority
JP
Japan
Prior art keywords
pattern
direction wiring
active matrix
mask
row
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP12964780A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5754318A (en
Inventor
Yasuo Katsuyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP12964780A priority Critical patent/JPS5754318A/ja
Publication of JPS5754318A publication Critical patent/JPS5754318A/ja
Publication of JPS6321888B2 publication Critical patent/JPS6321888B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP12964780A 1980-09-18 1980-09-18 Active matrix mask Granted JPS5754318A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12964780A JPS5754318A (en) 1980-09-18 1980-09-18 Active matrix mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12964780A JPS5754318A (en) 1980-09-18 1980-09-18 Active matrix mask

Publications (2)

Publication Number Publication Date
JPS5754318A JPS5754318A (en) 1982-03-31
JPS6321888B2 true JPS6321888B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1988-05-10

Family

ID=15014682

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12964780A Granted JPS5754318A (en) 1980-09-18 1980-09-18 Active matrix mask

Country Status (1)

Country Link
JP (1) JPS5754318A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01222980A (ja) * 1988-03-02 1989-09-06 Fujitsu Ltd サーマルプリンタ及びそれに用いる２ｐｌｙ感熱紙
JP5102989B2 (ja) * 2006-08-08 2012-12-19 ルネサスエレクトロニクス株式会社 半導体装置の製造方法
CN107329365B (zh) * 2017-05-31 2018-10-12 泰州市西陵纺机工具厂 一种掩模板图案的测量方法

Also Published As

Publication number Publication date
JPS5754318A (en) 1982-03-31

Similar Documents

Publication Publication Date Title
JP2824351B2 (ja) プリント回路基板に形成されたパターンの位置ずれを分析する装置とその方法
KR20020010585A (ko) 반도체 장치의 제조 방법 및 그것을 사용하여 제조된반도체 장치
CN102623368A (zh) 一种晶圆缺陷检测方法
DE112004000395T5 (de) Halbleiterwafer mit nichtrechteckig geformten Chips
JPS6083328A (ja) フオトマスクの検査方法
JPS6233739B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
US20170146340A1 (en) Rotation angle measurement marks and methods of measuring rotation angle and tracing coordinates using the same
JPS6321888B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CN118967798B (zh) 一种显示屏子像素亮团的定位方法、装置和存储介质
JP2009264865A (ja) フラットパネルディスプレイの欠陥検査装置およびその方法
CN204102865U (zh) 一种对准测量结构
JP2829211B2 (ja) 合せずれ測定方法
CN114720483A (zh) 一种无需标准样片的光学检测方法及其应用
JP2633228B2 (ja) 半導体装置のエッチング精度検査方法
CN106325004A (zh) Ldi曝光机能量均匀性检测方法
JP2913747B2 (ja) ウェーハ検査装置
US4765743A (en) Method of inspecting a master member
JPH04587B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JPH10339943A (ja) 半導体装置の製造方法
JP2002043197A (ja) 薄膜積層素子及びその製造方法
JPH05136034A (ja) 電子ビーム露光におけるドリフト量測定方法
US5317338A (en) Visual measurement technique and test pattern for aperture offsets in photoplotters
CN112108776A (zh) 一种用于led灯珠不良品标记的高精度激光打标方法
CN119381296A (zh) 一种晶圆定位map定位标记方法
JPS6132550A (ja) 半導体集積回路素子