JPS6319859B2 - - Google Patents
Info
- Publication number
- JPS6319859B2 JPS6319859B2 JP14019784A JP14019784A JPS6319859B2 JP S6319859 B2 JPS6319859 B2 JP S6319859B2 JP 14019784 A JP14019784 A JP 14019784A JP 14019784 A JP14019784 A JP 14019784A JP S6319859 B2 JPS6319859 B2 JP S6319859B2
- Authority
- JP
- Japan
- Prior art keywords
- lid
- lower lid
- cassette
- mask
- upper lid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000004696 Poly ether ether ketone Substances 0.000 claims description 4
- 229920002530 polyetherether ketone Polymers 0.000 claims description 4
- 230000000295 complement effect Effects 0.000 claims description 2
- 238000006073 displacement reaction Methods 0.000 claims description 2
- JUPQTSLXMOCDHR-UHFFFAOYSA-N benzene-1,4-diol;bis(4-fluorophenyl)methanone Chemical compound OC1=CC=C(O)C=C1.C1=CC(F)=CC=C1C(=O)C1=CC=C(F)C=C1 JUPQTSLXMOCDHR-UHFFFAOYSA-N 0.000 claims 1
- 239000000428 dust Substances 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 239000000969 carrier Substances 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000012805 post-processing Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Library & Information Science (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Warehouses Or Storage Devices (AREA)
- Sheets, Magazines, And Separation Thereof (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59140197A JPS6118959A (ja) | 1984-07-06 | 1984-07-06 | 防塵カセツト |
| US06/750,282 US4611967A (en) | 1984-07-06 | 1985-07-01 | Cassette-type container for a sheet-like member |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59140197A JPS6118959A (ja) | 1984-07-06 | 1984-07-06 | 防塵カセツト |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6118959A JPS6118959A (ja) | 1986-01-27 |
| JPS6319859B2 true JPS6319859B2 (enExample) | 1988-04-25 |
Family
ID=15263167
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59140197A Granted JPS6118959A (ja) | 1984-07-06 | 1984-07-06 | 防塵カセツト |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6118959A (enExample) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2796131B2 (ja) * | 1989-06-29 | 1998-09-10 | 沖電気工業株式会社 | ホトマスクケース及びホトマスクの保管方法 |
| TWI685711B (zh) * | 2018-08-27 | 2020-02-21 | 家登精密工業股份有限公司 | 光罩盒及其作動方法 |
-
1984
- 1984-07-06 JP JP59140197A patent/JPS6118959A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6118959A (ja) | 1986-01-27 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |