JPS6319859B2 - - Google Patents

Info

Publication number
JPS6319859B2
JPS6319859B2 JP14019784A JP14019784A JPS6319859B2 JP S6319859 B2 JPS6319859 B2 JP S6319859B2 JP 14019784 A JP14019784 A JP 14019784A JP 14019784 A JP14019784 A JP 14019784A JP S6319859 B2 JPS6319859 B2 JP S6319859B2
Authority
JP
Japan
Prior art keywords
lid
lower lid
cassette
mask
upper lid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP14019784A
Other languages
Japanese (ja)
Other versions
JPS6118959A (en
Inventor
Shinji Tsutsui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59140197A priority Critical patent/JPS6118959A/en
Priority to US06/750,282 priority patent/US4611967A/en
Publication of JPS6118959A publication Critical patent/JPS6118959A/en
Publication of JPS6319859B2 publication Critical patent/JPS6319859B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70733Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741Handling masks outside exposure position, e.g. reticle libraries
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Library & Information Science (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Warehouses Or Storage Devices (AREA)
  • Sheets, Magazines, And Separation Thereof (AREA)

Description

【発明の詳細な説明】 本発明は、防塵カセツトに関し、特に半導体製
造装置に都合良く使用されるフオトマスク又はレ
チクルの防塵カセツトに関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a dustproof cassette, and more particularly to a dustproof cassette for a photomask or reticle conveniently used in semiconductor manufacturing equipment.

IC、LSI超LSI等の半導体の製造上解決しなけ
ればならない事項の一つとして、マスク又はレチ
クルへの塵埃付着の問題がある。マスクに形成さ
れた超微細な回路パターンをウエハに転写すると
き、マスクに塵埃が付着しているとウエハに転写
された回路パターンの損害につながり、後工程を
経て製品化されたLSI等の半導体装置の性能を低
下させるばかりでなく、最悪の場合半導体装置の
機能全体損わせてしまう。
One of the issues that must be solved in the manufacture of semiconductors such as ICs and LSI VLSIs is the problem of dust adhesion to masks or reticles. When transferring ultra-fine circuit patterns formed on a mask onto a wafer, if there is dust attached to the mask, the circuit pattern transferred onto the wafer may be damaged, resulting in damage to semiconductors such as LSIs that are manufactured into products through post-processing. This not only reduces the performance of the device, but in the worst case, the entire function of the semiconductor device is impaired.

しかしながら従来の半導体製造装置に於いては
作業員が直接手によつてマスク又はレチクルをマ
スクホルダーに装填しなければならないため、人
体からの塵埃がマスク又はレチクルに付着する可
能性が大きい。更に近年マスク直径が大きくなつ
てきたことに伴ない手で扱いにくくなつてきてお
り、作業員の取扱い上の不注意により、マスクに
傷をつけたり破損のおそれもある。
However, in conventional semiconductor manufacturing equipment, a worker must manually load a mask or reticle into a mask holder, so there is a high possibility that dust from the human body will adhere to the mask or reticle. Furthermore, as masks have become larger in diameter in recent years, they have become difficult to handle by hand, and there is a risk of scratches or damage to the masks due to careless handling by workers.

上述した問題点を解消するために半導体製造装
置にマスクを装填する際作業員の介在を極力避
け、マスク又はレチクルを自動的に搬送、装填で
きる自動化機器の開発が望まれていた。
In order to solve the above-mentioned problems, it has been desired to develop automated equipment that can automatically transport and load masks or reticles while avoiding operator intervention as much as possible when loading masks into semiconductor manufacturing equipment.

本発明の目的は、保存時塵埃の付着防止に効果
的な密閉構造のマスク(又はレチクル)防塵カセ
ツトを提供することにある。
An object of the present invention is to provide a mask (or reticle) dustproof cassette with a sealed structure that is effective in preventing dust from adhering during storage.

本発明の他の目的は、マスク(又はレチクル)
を自動的に搬送するのに適した構造を有するマス
ク防塵カセツトを提供することにある。
Another object of the invention is to provide a mask (or reticle)
An object of the present invention is to provide a dustproof mask cassette having a structure suitable for automatically conveying masks.

本発明に依ればマスク又はレチクルをカセツト
に収容し持ち運ぶことにより、取扱いを容易にす
るとともに防塵の効果も得られる。又カセツト形
状を工夫してあるためマスクの搬送の自動化が可
能であり、作業員の介在が余地がなくなるため、
この点からもマスクへの塵埃の付着は防止され
る。
According to the present invention, by storing the mask or reticle in a cassette and carrying it, handling becomes easy and dustproof effects can also be obtained. In addition, the cassette shape has been devised, making it possible to automate the transportation of masks, eliminating the need for worker intervention.
This also prevents dust from adhering to the mask.

以下添付した図面を参照して本発明の好ましい
実施例について説明する。第1図は本発明の防塵
カセツトの上蓋構造を示した図である。上蓋1の
前壁2の中央部2aは両端部2bに比べて突き出
ており、一方引込んだ両端部2bにはそれぞれ逆
L字形の係止部材3が一体的に取り付けられてい
る。この逆L字形の係止部材3は、後述する下蓋
10の前壁11の両端部11bの対応する位置に
形成された係止用突起12と端部がはまり合うよ
うに十分な長さおよび可撓性を有していなければ
ならない。
Preferred embodiments of the present invention will be described below with reference to the accompanying drawings. FIG. 1 is a diagram showing the upper lid structure of the dustproof cassette of the present invention. A central portion 2a of the front wall 2 of the upper lid 1 protrudes compared to both ends 2b, and an inverted L-shaped locking member 3 is integrally attached to each of the retracted ends 2b. This inverted L-shaped locking member 3 has a sufficient length and length so that its ends fit into locking protrusions 12 formed at corresponding positions on both ends 11b of the front wall 11 of the lower lid 10, which will be described later. It must be flexible.

次に上蓋1の両側壁4について説明すれば、側
壁4はそれぞれ、前壁2の垂直方向長さと同一の
長さを有する第1の側壁部4aと、上蓋1と下蓋
10を重ね合わせた状態で下蓋10の底部とほぼ
同じ位置まで延びるような長さを有する第2の側
壁部4bとから構成されている。
Next, to explain the side walls 4 of the upper lid 1, each side wall 4 has a first side wall portion 4a having the same length as the vertical length of the front wall 2, and the upper lid 1 and the lower lid 10 are overlapped. and a second side wall portion 4b having a length that extends to approximately the same position as the bottom of the lower lid 10 in the state.

第2の側壁部4bには斜辺部4cから水平方向
へ延びた案内溝5が形成されている。この案内溝
5は、下蓋10の案内ピン22を部分的に収容す
るのに十分な深さを有していれば図示の如く第2
の側壁部4bの厚さ方向途中まで延びる構造とし
ても良いし、或いは第2の側壁部4bを貫通する
ような構造としても良い。更に第2の側壁部4b
の下端にはそれぞれ、マスクカセツトを複数段に
重ねて収納するためのキヤリヤを嵌合し、キヤリ
ヤ間での上蓋の位置決めを行なうのに役立つ突出
片6が一体的に形成されている。
A guide groove 5 extending horizontally from the oblique side portion 4c is formed in the second side wall portion 4b. If this guide groove 5 has a depth sufficient to partially accommodate the guide pin 22 of the lower lid 10, the second
It may have a structure in which it extends halfway in the thickness direction of the side wall portion 4b, or it may have a structure in which it penetrates through the second side wall portion 4b. Furthermore, the second side wall portion 4b
A protruding piece 6 is integrally formed at the lower end of each of the mask cassettes, into which carriers for stacking and storing mask cassettes in a plurality of stages are fitted, and which is useful for positioning the top cover between the carriers.

上蓋1の後壁7の内側下端部には段部8が形成
されており、段部8は上蓋1の両側壁4,4の間
に亘つて延びている。上蓋1と下蓋10とが重ね
合わされた状態で、後述する下蓋の後壁段部16
は下面16aが上蓋1の後壁段部8の上面8aと
接触し、支承される。
A step 8 is formed at the inner lower end of the rear wall 7 of the top lid 1, and the step 8 extends between the both side walls 4, 4 of the top lid 1. In a state where the upper lid 1 and the lower lid 10 are overlapped, a rear wall step portion 16 of the lower lid, which will be described later,
The lower surface 16a contacts and is supported by the upper surface 8a of the rear wall stepped portion 8 of the upper lid 1.

第2図は本発明の防塵カセツトの下蓋構造を示
した図である。上蓋1の前壁部2と同様に下蓋1
0の前壁11の中央部は両端部11bに比べて突
き出ており、一方引込んだ両端部11bにはそれ
ぞれ上蓋1の前壁両端部2bに取付けられた逆L
字形の係止部材3と係合する係止用突起12が形
成されている。次に下蓋10の両側壁13につい
て説明すれば、上蓋1と下蓋10を重ね合せたと
き上蓋1の第1の側壁部4aの下面4aを載置さ
せるための突出片14が側壁13の上端部から延
びている。この突出片14は、上蓋1と下蓋10
とを重ね合わせたときカセツト内部を密封状態と
するために上蓋1の第1の側壁部4aの長さと実
質的に等しい長さを有するのが好ましい。又突出
片14は、上蓋1の突出片6と同様キヤリヤと嵌
合しキヤリヤ内での下蓋10の位置決めを行なう
のに役立つように十分な幅を有していなければな
らない。更に下蓋10の両側壁13,13には、
上蓋1の第2の側壁部4bに形成された案内溝5
に収容される案内ピン22が突出片14に隣接し
て配置されている。
FIG. 2 is a diagram showing the lower lid structure of the dustproof cassette of the present invention. Similarly to the front wall 2 of the upper lid 1, the lower lid 1
The central part of the front wall 11 of the cover 1 protrudes from both ends 11b, and the retracted ends 11b each have an inverted L that is attached to both ends 2b of the front wall of the top cover 1.
A locking protrusion 12 that engages with the letter-shaped locking member 3 is formed. Next, the side walls 13 of the lower lid 10 will be described. When the upper lid 1 and the lower lid 10 are overlapped, the protruding pieces 14 on which the lower surface 4a of the first side wall portion 4a of the upper lid 1 is placed are located on the side walls 13. Extending from the top end. This protruding piece 14 is connected to the upper lid 1 and the lower lid 10.
In order to seal the inside of the cassette when these are overlapped, it is preferable that the length is substantially equal to the length of the first side wall portion 4a of the upper lid 1. Also, the protrusion 14, like the protrusion 6 of the top cover 1, must be wide enough to fit into the carrier and assist in positioning the bottom cover 10 within the carrier. Furthermore, on both side walls 13, 13 of the lower lid 10,
A guide groove 5 formed in the second side wall portion 4b of the upper lid 1
A guide pin 22 housed in the guide pin 22 is arranged adjacent to the protruding piece 14 .

下蓋10の後壁15下端部には上蓋の後壁7の
内側下端部に形成された段部8と対応した形状を
有する段部16が形成されている。この段部16
は、下面16aが上蓋1の後壁段部8の上面8a
と接触し支承される構造であるために、上蓋の場
合と異なり両側壁13,13を貫いて延びてい
る。
A step 16 is formed at the lower end of the rear wall 15 of the lower lid 10 and has a shape corresponding to the step 8 formed at the inner lower end of the rear wall 7 of the upper lid. This step 16
In this case, the lower surface 16a is the upper surface 8a of the rear wall stepped portion 8 of the upper lid 1.
Unlike the case of the top cover, it extends through both side walls 13, 13 because it is in contact with and is supported by the top cover.

更に下蓋10の内部中央付近にはマスク又はレ
チクルを載置させるための底部17から直立する
環状部18が配置されている。
Further, an annular portion 18 is arranged near the center of the interior of the lower lid 10 and stands upright from the bottom portion 17 on which a mask or reticle is placed.

環状部18と下蓋10の4つの壁11a,1
3,13,15のほぼ中央部とは直交するリブ1
9によつて連結されている。マスク20は通常パ
ターンを形成された面を下に向けて環状部18に
載置されるため、環状部18の内側のリブ19a
は高さを低くし、マスク20のパターン面と接触
しないようにするのが好ましい。又第2図に示す
ように環状部18の上端面に突起25を等間隔に
配置し、この突起25によつてマスク20を支持
するようにしても良い。
The annular portion 18 and the four walls 11a, 1 of the lower lid 10
Rib 1 that is perpendicular to the approximately central portions of 3, 13, and 15.
connected by 9. Since the mask 20 is normally placed on the annular portion 18 with the patterned surface facing downward, the ribs 19a inside the annular portion 18
It is preferable that the height is low so that it does not come into contact with the patterned surface of the mask 20. Further, as shown in FIG. 2, projections 25 may be arranged at equal intervals on the upper end surface of the annular portion 18, and the mask 20 may be supported by the projections 25.

これに加えてマスク20のパターンを形成され
た面には塵埃が付着することを防止するためにペ
リクル膜を取り付けることが多く、この状態でパ
ターン面を下に向けてマスクを環状部18上に載
置する。この場合環状部18の内径はペリクル膜
の外径よりも大きくし、内側のリブ19aはペリ
クル膜の厚さを考慮して十分低くする必要があ
る。
In addition, a pellicle film is often attached to the patterned surface of the mask 20 to prevent dust from adhering to it. Place it. In this case, the inner diameter of the annular portion 18 must be larger than the outer diameter of the pellicle membrane, and the inner rib 19a must be made sufficiently low in consideration of the thickness of the pellicle membrane.

環状部18の周囲にはリブ19の直交部19b
を中心として同心円状に位置決めピン21が直立
している。この位置決めピン21はマスク20を
環状部18に載置するときマスク20の位置を下
蓋10内のほぼ中央部に定めるのに役立つ。この
ためピン21の高さは、環状部18に置かれたマ
スク20の上面位置と等しいか或いは高く設立さ
れるのが都合良い。
Around the annular portion 18, there is a perpendicular portion 19b of the rib 19.
Positioning pins 21 stand upright in a concentric circle with the center as the center. This positioning pin 21 serves to position the mask 20 approximately at the center within the lower lid 10 when the mask 20 is placed on the annular portion 18 . For this reason, it is convenient that the height of the pin 21 is set equal to or higher than the upper surface position of the mask 20 placed on the annular portion 18.

次に本発明の防塵カセツトの上蓋1と下蓋10
の組み合わせ方および取りはずし方を第4図〜第
7図を参照して説明する。
Next, the upper lid 1 and the lower lid 10 of the dustproof cassette of the present invention
How to assemble and remove them will be explained with reference to FIGS. 4 to 7.

位置決めピン21を参考にして下蓋10の環状
部18にマスク20を載置させた状態(第7図)
で、まず下蓋の両側壁13から延びた案内ピン2
2,22を上蓋1の第2の側壁部4b,4bに形
成された案内溝5,5に向けて挿し込むべく、下
蓋の後壁15を上蓋の後壁7に接近させる(第6
図)。案内ピン22,22が案内溝5,5内に収
容され、下蓋10の段部16の下面16aが上蓋
1の後壁段部8の上面8aに接触し支承されたら
(第5図)、案内ピン22,22を軸として上蓋1
又は下蓋10を回動させる。その結果上蓋の逆L
字形係止部材3の端部と下蓋の係止用突起12と
が係合し、カセツトは第3図および第4図に示さ
れるような組み合わせ状態となる。上蓋と下蓋の
取りはずし方については第4図から第7図の順
に、前述した操作を逆におこなえば良い。
A state in which the mask 20 is placed on the annular portion 18 of the lower lid 10 with reference to the positioning pins 21 (Fig. 7)
First, remove the guide pins 2 extending from both side walls 13 of the lower cover.
2, 22 toward the guide grooves 5, 5 formed in the second side walls 4b, 4b of the upper lid 1, the rear wall 15 of the lower lid is brought closer to the rear wall 7 of the upper lid (6th
figure). When the guide pins 22, 22 are accommodated in the guide grooves 5, 5, and the lower surface 16a of the stepped portion 16 of the lower lid 10 contacts and is supported by the upper surface 8a of the rear wall stepped portion 8 of the upper lid 1 (FIG. 5), The upper cover 1 is rotated around the guide pins 22, 22.
Or rotate the lower lid 10. As a result, the upper lid is inverted L.
The ends of the letter-shaped locking members 3 engage with the locking protrusions 12 on the lower lid, and the cassette is in the assembled state as shown in FIGS. 3 and 4. To remove the upper cover and lower cover, the above-described operations may be performed in reverse order in the order shown in FIGS. 4 to 7.

ここで第1図および第2図において、上蓋1の
前壁2および下蓋10の前蓋11の当接面は平担
な面として表わされている。
In FIGS. 1 and 2, the contact surfaces of the front wall 2 of the upper lid 1 and the front lid 11 of the lower lid 10 are shown as flat surfaces.

本発明に依れば防塵カセツトの密閉力を高める
ために前壁2および11の当接部を第4図〜第7
図に示す如き相補的な形状とすることもできる。
更に上蓋と下蓋を重ね合わせてマスクをカセツト
内に収容したとき、マスクの位置がカセツト内で
不用意にずれマスク面が損傷するのを防止するた
めにマスク位置ずれ防止用パツド24(第7図)
を備えても良い。
According to the present invention, in order to increase the sealing force of the dust-proof cassette, the abutting portions of the front walls 2 and 11 are arranged as shown in FIGS.
Complementary shapes as shown can also be used.
Furthermore, when the mask is stored in the cassette with the upper and lower covers overlapped, a mask displacement prevention pad 24 (No. 7 figure)
may be provided.

なお本発明のカセツトは密閉構造のため内部に
収容したマスクの塵埃の付着を防ぐものではある
が、カセツトの上蓋と下蓋のすり合わせ等による
カセツト自体からの塵埃を効果的に防止するため
PEEK(Poly Ether Ether Ketone)等の樹脂で
構成するのが好ましい。PEEKは万一カセツトに
ゴミ、油等が付着した場合カセツトを洗浄するた
めの種々の洗浄液によつておかされにくく、又機
械的強度もすぐれている。
Although the cassette of the present invention has a sealed structure that prevents dust from adhering to the mask housed inside, it also effectively prevents dust from coming from the cassette itself due to rubbing of the upper and lower lids of the cassette, etc.
It is preferable to use resin such as PEEK (Poly Ether Ether Ketone). PEEK is resistant to being damaged by various types of cleaning fluids that are used to clean the cassette in the event that dirt, oil, etc. adhere to it, and it also has excellent mechanical strength.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の防塵カセツトの上蓋構造の斜
視図、第2図は本発明の防塵カセツトの下蓋構造
の斜視図、第3図は本発明の防塵カセツトを組み
合わせた状態で示した図、第4図乃至第7図はそ
れぞれ本発明の防塵カセツトの上蓋と下蓋の組み
合わせおよび取り外し方を説明するための図であ
る。 1……上蓋、2……前壁、3……係止部材、4
……側壁、5……案内溝、8……段部、10……
下蓋、14……突出片、22……案内片。
FIG. 1 is a perspective view of the upper lid structure of the dust-proof cassette of the present invention, FIG. 2 is a perspective view of the lower lid structure of the dust-proof cassette of the present invention, and FIG. 3 is a diagram showing the dust-proof cassette of the present invention in a combined state. , 4 to 7 are views for explaining the combination and removal of the upper and lower lids of the dustproof cassette of the present invention, respectively. 1... Top lid, 2... Front wall, 3... Locking member, 4
... Side wall, 5 ... Guide groove, 8 ... Step section, 10 ...
Lower lid, 14... protruding piece, 22... guide piece.

Claims (1)

【特許請求の範囲】 1 上蓋と下蓋とから構成され、前記上蓋は対向
する側壁に形成された案内溝と、下蓋の前壁と上
蓋とを係止させるための係止手段を備えた前壁
と、下蓋の後壁の一部を支承する部分を備えた後
壁とを有し、 前記下蓋は、案内溝に嵌合する案内ピンを対向
する側壁に備えていることを特徴とする防塵カセ
ツト。 2 前記上蓋は対向する側壁に突出片を有するこ
とを特徴とする、特許請求の範囲第1項記載の防
塵カセツト。 3 前記下蓋は対向する側壁に突出片を有するこ
とを特徴とする、特許請求の範囲第1項記載の防
塵カセツト。 4 前記下蓋は内部に収納すべき物体を載置させ
るための部材を備えることを特徴とする、特許請
求の範囲第1項記載の防塵カセツト。 5 前記防塵カセツトは、内部に収納された物体
の位置ずれを防止するための部材を備えることを
特徴とする、特許請求の範囲第1項記載の防塵カ
セツト。 6 前記防塵カセツトはPEEK( )から製造さ
れることを特徴とする、特許請求の範囲第1項記
載の防塵カセツト。 7 前記上蓋および下蓋の前壁の当接部は相補的
形状を有することを特徴とする、特許請求の範囲
第1項記載の防塵カセツト。
[Claims] 1. Consisting of an upper lid and a lower lid, the upper lid includes a guide groove formed in opposing side walls, and a locking means for locking the front wall of the lower lid and the upper lid. It has a front wall and a rear wall that includes a portion that supports a portion of the rear wall of the lower lid, and the lower lid includes a guide pin that fits in the guide groove on the opposing side wall. A dustproof cassette. 2. The dustproof cassette according to claim 1, wherein the upper lid has protruding pieces on opposing side walls. 3. The dust-proof cassette according to claim 1, wherein the lower lid has protruding pieces on opposing side walls. 4. The dustproof cassette according to claim 1, wherein the lower lid includes a member for placing an object to be stored inside. 5. The dust-proof cassette according to claim 1, wherein the dust-proof cassette includes a member for preventing displacement of an object stored therein. 6. The dustproof cassette according to claim 1, characterized in that the dustproof cassette is manufactured from PEEK ( ). 7. The dust-proof cassette according to claim 1, wherein the contact portions of the front walls of the upper lid and the lower lid have complementary shapes.
JP59140197A 1984-07-06 1984-07-06 Dustproof cassette Granted JPS6118959A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP59140197A JPS6118959A (en) 1984-07-06 1984-07-06 Dustproof cassette
US06/750,282 US4611967A (en) 1984-07-06 1985-07-01 Cassette-type container for a sheet-like member

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59140197A JPS6118959A (en) 1984-07-06 1984-07-06 Dustproof cassette

Publications (2)

Publication Number Publication Date
JPS6118959A JPS6118959A (en) 1986-01-27
JPS6319859B2 true JPS6319859B2 (en) 1988-04-25

Family

ID=15263167

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59140197A Granted JPS6118959A (en) 1984-07-06 1984-07-06 Dustproof cassette

Country Status (1)

Country Link
JP (1) JPS6118959A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2796131B2 (en) * 1989-06-29 1998-09-10 沖電気工業株式会社 Photomask case and photomask storage method
TWI685711B (en) * 2018-08-27 2020-02-21 家登精密工業股份有限公司 Reticle pod and operating method thereof

Also Published As

Publication number Publication date
JPS6118959A (en) 1986-01-27

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