JPH0444421B2 - - Google Patents

Info

Publication number
JPH0444421B2
JPH0444421B2 JP58112929A JP11292983A JPH0444421B2 JP H0444421 B2 JPH0444421 B2 JP H0444421B2 JP 58112929 A JP58112929 A JP 58112929A JP 11292983 A JP11292983 A JP 11292983A JP H0444421 B2 JPH0444421 B2 JP H0444421B2
Authority
JP
Japan
Prior art keywords
cassette
reticle
carrier
original
dust
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58112929A
Other languages
Japanese (ja)
Other versions
JPS605521A (en
Inventor
Shunzo Imai
Kazuo Iizuka
Hiroshi Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP58112929A priority Critical patent/JPS605521A/en
Publication of JPS605521A publication Critical patent/JPS605521A/en
Priority to US06/892,734 priority patent/US4758127A/en
Publication of JPH0444421B2 publication Critical patent/JPH0444421B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03BAPPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B23/00Devices for changing pictures in viewing apparatus or projectors
    • G03B23/02Devices for changing pictures in viewing apparatus or projectors in which a picture is removed from a stock and returned to the same stock or another one; Magazines therefor
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691Handling of masks or workpieces
    • G03F7/70733Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741Handling masks outside exposure position, e.g. reticle libraries
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67769Storage means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67775Docking arrangements
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67778Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers

Landscapes

  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Library & Information Science (AREA)
  • Warehouses Or Storage Devices (AREA)
  • Sheets, Magazines, And Separation Thereof (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、半導体焼付装置で用いられるフオト
マスク又はレチクルの如き原版を防塵状態で搬
出、搬送する装置に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a device for carrying out and transporting an original such as a photomask or reticle used in a semiconductor printing apparatus in a dust-proof condition.

〔従来の技術〕[Conventional technology]

IC、LSI、超LSI等の半導体装置の製造時、解
決されねばならない事項の1つにマスク又はレチ
クルへの塵埃付着の問題がある。
When manufacturing semiconductor devices such as ICs, LSIs, and VLSIs, one of the issues that must be solved is the problem of dust adhesion to masks or reticles.

超微細なこれらの半導体集積回路パターンをウ
エハーの上に焼き付ける為、マスク又はレチクル
上に塵埃があると転写された半導体回路パターン
の損傷につながり、製品化されたLSI等の半導体
の性能を低下させるばかりでなく、最悪の場合そ
の半導体の機能全体を麻痺させる。
Since these ultra-fine semiconductor integrated circuit patterns are printed onto wafers, dust on the mask or reticle can damage the transferred semiconductor circuit patterns and reduce the performance of commercialized semiconductors such as LSIs. Not only that, but in the worst case, it paralyzes the entire function of the semiconductor.

特に近年主流となりつつあるステツプ・アン
ド・リピート方式(繰り返し露光方式)の投影露
光装置では、1つのマスク又はレチクルを用いて
その半導体集積回路パターンが1つのウエハーに
何シヨツトも焼付けられる為、もし塵埃がある
と、そのウエハーの全てのチツプが不良になつて
しまうという問題がある。これらの問題からマス
ク又はレチクルに、発塵原因である人間が可能な
限り接近しない方がよい。
In particular, with step-and-repeat projection exposure equipment, which has become mainstream in recent years, many shots of semiconductor integrated circuit patterns are printed onto a single wafer using a single mask or reticle. If there is, there is a problem that all the chips on that wafer will become defective. Because of these problems, it is better for people who are the cause of dust generation to not come close to the mask or reticle as much as possible.

ところで、マスクやレチクル等の原版を収納し
ている防塵カセツトから内部の原版を自動的に取
り出して所定位置に搬送する搬送装置は、例えば
特開昭57−64928号公報で提案されたものが知ら
れている。
By the way, a conveying device that automatically takes out originals from a dust-proof cassette containing originals such as masks and reticles and transports them to a predetermined position is known, for example, as proposed in Japanese Patent Application Laid-Open No. 57-64928. It is being

〔発明が解決しようとしている課題〕[Problem that the invention is trying to solve]

しかしながら、この装置では、カセツトの内部
から収納原版を取り出して搬送する際には、カセ
ツトの側壁に設けられている扉を開けて、カセツ
ト内部に原版取り出し用のフオークを侵入させる
ことが必要となる。また、この従来の装置では、
原版はカセツトから取り出された直後から所定の
搬送完了位置まで常に原版のみで搬送されること
になるため、搬送途中で原版に塵やゴミ等が付着
する可能性が高いものであつた。
However, with this device, in order to take out and transport the stored originals from inside the cassette, it is necessary to open a door provided on the side wall of the cassette and insert a fork for removing the originals into the cassette. . Also, with this conventional device,
Since the original is always transported by itself from immediately after being taken out of the cassette to a predetermined transport completion position, there is a high possibility that dust, dirt, etc. may adhere to the original during transport.

本発明は、このような事情に鑑みなされたもの
で、その目的は、マスクやレチクル等の原版を収
納する防塵カセツトの内部から、速やかに且つ清
浄な状態のままで原版を取り出して搬送する原版
の搬送装置を提供することにある。
The present invention was made in view of the above circumstances, and its purpose is to provide an original plate that can quickly and in a clean state take out and transport an original plate from the inside of a dust-proof cassette that stores an original plate such as a mask or reticle. The object of the present invention is to provide a conveying device for the following.

〔課題を解決するための手段〕[Means to solve the problem]

この目的を達成するために、本発明は、マスク
またはレチクル等の原版が載置される下側部材
と、この下側部材に対して着脱自在に形成される
上側部材を有し、これらにより原版を収納する収
納室を形成する防塵カセツトが複数装填されるカ
セツトキヤリアと、カセツトキヤリアに対して進
退自在に移動するフオークを有し、防塵カセツト
の下側部材を前記フオークで支持しながら防塵カ
セツトの下側部材をカセツトキヤリアから引出す
ことにより、防塵カセツトの上側部材をカセツト
キヤリアに残した状態で、原版を防塵カセツトの
下側部材と一緒にカセツトキヤリアから取出す第
1取出し機構と、原版が防塵カセツトの下側部材
と一緒にカセツトキヤリアから取出された後、防
塵カセツトの下側部材内の原版を保持することに
より、防塵カセツトの下側部材から原版を取出す
第2取出し機構を有している。
In order to achieve this object, the present invention has a lower member on which an original such as a mask or a reticle is placed, and an upper member that is formed to be detachably attached to the lower member. It has a cassette carrier into which a plurality of dust-proof cassettes are loaded forming a storage chamber for storing the dust-proof cassettes, and a fork that moves forward and backward with respect to the cassette carrier, and supports the lower part of the dust-proof cassette with the fork. A first ejecting mechanism that removes the original from the cassette carrier together with the lower member of the dust-proof cassette while leaving the upper member of the dust-proof cassette in the cassette carrier by pulling out the lower member from the cassette carrier; A second ejecting mechanism is provided for removing the original from the lower member of the dust-proof cassette by holding the original in the lower member of the dust-proof cassette after the original is taken out from the cassette carrier together with the lower member of the dust-proof cassette.

更に、好ましくは、第2取出し機構は真空吸着
により防塵カセツトの下側部材内の基板を保持す
るようになされている。
Furthermore, preferably, the second ejecting mechanism is adapted to hold the substrate in the lower member of the dust-proof cassette by vacuum suction.

〔実施例〕〔Example〕

以下、本発明の原版の搬送装置を図に示した実
施例に基づいて詳細に説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the original plate conveying device of the present invention will be described in detail based on the embodiment shown in the drawings.

第1図乃至第9図はマスク又はレチクルの搬送
装置の一実施例のカセツトの部分である。
1 to 9 show a cassette portion of an embodiment of a mask or reticle transport device.

第1図は蓋部材の破砕斜視図を、第2図は箱部
材の斜視図を、第3図は第1図のA視図の部分
図、第4図は第2図のB視図の部分図を、第5図
は蓋部材と箱部材を組合せたカセツトの斜視図、
第6図は第5図のc−c′線の断面図を、第7図
は、爪部材の詳細な説明図を、第8図は、キヤリ
ア内にカセツトを収容した斜視図を、第9図は第
8図のE視図を夫々示している。
Figure 1 is a fragmented perspective view of the lid member, Figure 2 is a perspective view of the box member, Figure 3 is a partial view of the A view in Figure 1, and Figure 4 is the B view of Figure 2. FIG. 5 is a perspective view of a cassette in which a lid member and a box member are combined;
6 is a sectional view taken along line c-c' in FIG. 5, FIG. 7 is a detailed explanatory view of the claw member, FIG. Each figure shows a view from E in FIG. 8.

図に於て、1は蓋部材、2は蓋部材1を取扱い
易くする為の把手3は箱部材4と蓋部材1とを組
合わせた時お互いが容易に分離しないようにする
為の爪部材で引掛り部である4bと係合する。1
aは蓋部材1の突出した保持部で箱部材4は、そ
れの突出部4aが保持部1aの上に載る事によつ
て、蓋部材1に保持される。
In the figure, 1 is a lid member, 2 is a handle 3 that makes it easier to handle the lid member 1, and a claw member that prevents the box member 4 and the lid member 1 from being easily separated when they are combined. It engages with the hook portion 4b. 1
A is a protruding holding portion of the lid member 1, and the box member 4 is held by the lid member 1 by placing the protruding portion 4a on the holding portion 1a.

1bは蓋部材1の入口端部、4cは蓋部材1と
箱部材4とを組合わせた時止部材となるものであ
る。4dはマスク又はレチクルを載せて支持する
ための支持部に相当する底面と段差のついた段差
面である。1cは蓋部材1の底部で箱部材4とを
第5図の如く組合わせた時ここが最底部になる。
5は蓋部材1と箱部材4の結合を手で容易に解く
為の箱部材4の止部材4cのある側の端部に設け
られた把手である。6はレチクルで、箱部材4の
段差面4d上に載置した時の断面図が第6図に示
されているが、これと共に塵埃の付着防止目的の
ペリクル膜7及びその支持枠であるペリクル枠7
aも描いてある。4a′は蓋部材1の保持部1aと
箱部材4の突出部4aとを重ね合せた時の重なつ
ていない部分であり、後述のフオーク11の係合
部10がこの端部に接触する。
1b is an entrance end of the lid member 1, and 4c is a stop member that is a combination of the lid member 1 and the box member 4. Reference numeral 4d denotes a step surface having a step and a bottom surface corresponding to a support portion on which a mask or reticle is placed and supported. 1c is the bottom of the lid member 1, and when it is combined with the box member 4 as shown in FIG. 5, this becomes the bottommost part.
Reference numeral 5 denotes a handle provided at the end of the box member 4 on the side where the stopper member 4c is located for easily uncoupling the lid member 1 and the box member 4 by hand. Reference numeral 6 denotes a reticle, whose cross-sectional view when placed on the stepped surface 4d of the box member 4 is shown in FIG. Frame 7
A is also drawn. 4a' is a portion where the holding portion 1a of the lid member 1 and the protruding portion 4a of the box member 4 do not overlap when they are overlapped, and the engaging portion 10 of the fork 11, which will be described later, comes into contact with this end.

第7図は第1図に示した爪部材3と第2図に示
した引掛り部4bとの関係を簡略的に示した部分
断面図で、1dは蓋部材1の側壁、3aは爪部材
3の押込み端、3bは爪部材3の他端に設けられ
た円柱状の係止部、3eは爪部材3の回転軸で、
軸の両端は側壁1dに回転自在に軸支されてい
る。また3fはトーシヨンバネで、一端は爪部材
3に係合し、他端は側壁1dに係合するものと
し、その結果、爪部材3に反時計回りの回転力が
付与される。本図や第6図に示したように箱部材
4が蓋部材1に挿入された時は、係止端3bが引
掛り部4bに落込んでこれを係止するが、後述の
第8図や第9図のようにカセツトとして箱部材1
が後述のキヤリヤ9に挿着された時にはキヤリヤ
9の内壁9dが押込み端3aを箱部材4側に押込
み、係止部3bは引掛り部4bから引込んで引掛
り部4bは解除される。なお、トーシヨンバネ3
fの反時計回り方向の付勢により爪部材3がキヤ
リヤ9の内壁9dを押圧するので蓋部材1はキヤ
リヤ9に摩擦係止される。
FIG. 7 is a partial cross-sectional view schematically showing the relationship between the claw member 3 shown in FIG. 1 and the hook portion 4b shown in FIG. 2, where 1d is a side wall of the lid member 1, and 3a is a claw member. 3 is a pushing end, 3b is a cylindrical locking portion provided at the other end of the claw member 3, 3e is a rotation axis of the claw member 3,
Both ends of the shaft are rotatably supported by the side wall 1d. Further, 3f is a torsion spring, one end of which engages with the claw member 3 and the other end of which engages with the side wall 1d, and as a result, a counterclockwise rotational force is applied to the claw member 3. When the box member 4 is inserted into the lid member 1 as shown in this figure and FIG. 6, the locking end 3b falls into the hook portion 4b and locks it, but as shown in FIG. Box member 1 is used as a cassette as shown in Figure 9.
When the carrier 9 is inserted into the carrier 9, which will be described later, the inner wall 9d of the carrier 9 pushes the pushing end 3a toward the box member 4, the locking portion 3b is retracted from the hook portion 4b, and the hook portion 4b is released. In addition, torsion spring 3
The claw member 3 presses the inner wall 9d of the carrier 9 due to the counterclockwise bias of f, so that the lid member 1 is frictionally engaged with the carrier 9.

9はキヤリアで、第6図のように蓋部材1と箱
部材4とを組合せた時のカセツトを第8図や第9
図に示したように多数収容するためのものであ
る。9bはキヤリア9の上下を多数の区域に仕切
る仕切板もしくは底板の片方の両側に夫々設けら
れた突出状のキヤリヤ9に結合されたストツパで
ある。
9 is a carrier, and the cassette when the lid member 1 and box member 4 are combined as shown in Fig. 6 is shown in Figs. 8 and 9.
This is for accommodating a large number of containers as shown in the figure. Reference numeral 9b denotes a stopper connected to the carrier 9 in a protruding shape, which is provided on both sides of one side of a partition plate or a bottom plate that partitions the upper and lower parts of the carrier 9 into a number of areas.

第9図には自動キヤリヤ9からカセツトが分離
され箱部材4(勿論、第6図に示したようにレチ
クル6を含んでいる。)のみが取り出される時の
状態を示している。11はフオークで、カセツト
とキヤリヤ9との〓間穴8に差し込まれる。図で
は機構は不図示であるが矢印方向即ちレチクル6
の面に平行方向と垂直方向に移動可能である。な
おフオーク11の長手方向と直角方向の幅Lは、
突出部4aの長手方向と直角方向の幅から保持部
1aの長手方向と直角方向の幅を差し引いた幅よ
り小さく設定してある。従つて、フオーク11を
カセツト内に挿入した時、フオークの腕(幅L)
は、保持部1aと突出部4aとが重なりあつてい
ない部分4a′の突出部4aを支えることができ
る。9aは蓋部材1の入口端部1bのストツパで
あり、キヤリヤ9の上下を多数の区域に仕切る仕
切板と底辺のもう片方の両側に夫々設けられた突
出部で、自動でフオーク11により箱部材4がキ
ヤリア9から取り出される時で、箱部材4と蓋部
材1とが分離される時、蓋部材1をキヤリヤ9内
に押し止める役目を果す。10はフオーク11の
係合部で箱部材4の部分4a′の端にある不図示の
凹部に係合する。
FIG. 9 shows the state in which the cassette is separated from the automatic carrier 9 and only the box member 4 (which, of course, includes the reticle 6 as shown in FIG. 6) is taken out. A fork 11 is inserted into a hole 8 between the cassette and the carrier 9. Although the mechanism is not shown in the figure, the direction of the arrow, that is, the reticle 6
It is possible to move in parallel and perpendicular directions to the plane. The width L of the fork 11 in the longitudinal direction and the perpendicular direction is
The width is set smaller than the width obtained by subtracting the width of the holding portion 1a in the longitudinal direction and the perpendicular direction from the width of the protruding portion 4a in the longitudinal direction and the perpendicular direction. Therefore, when the fork 11 is inserted into the cassette, the fork arm (width L)
can support the protruding part 4a of the portion 4a' where the holding part 1a and the protruding part 4a do not overlap each other. Reference numeral 9a designates a stopper at the entrance end 1b of the lid member 1, which is a partition plate that partitions the upper and lower parts of the carrier 9 into a number of areas, and protrusions provided on the other two sides of the bottom. When the box member 4 and the lid member 1 are separated when the box member 4 is taken out from the carrier 9, the lid member 1 is held in the carrier 9. Reference numeral 10 denotes an engaging portion of the fork 11, which engages with a recess (not shown) at the end of the portion 4a' of the box member 4.

第10図及び第11図は、本発明に係るマスク
又はレチクルの搬送装置の一実施例の全体を示す
説明図である。第10図は箱部材4をフオーク1
1の上に載せてキヤリヤ9より搬出した図で箱部
材4に収容されたレチクルは不図示である。12
a,12bはフオーク11のガイド棒、13はネ
ジでモータ15によりモータ15の軸に設けられ
たギヤ14bとこれに噛合しているギヤ14aを
介し回転する。このネジ13は支持部材17に軸
受けで支持されており、フオーク11に設けたネ
ジ穴に螺入している。このネジ13の回転により
フオーク11は前進したり、後退したりして前述
の如く第9図の〓間穴8を通して、キヤリヤ9内
に進入又は脱出する。16,17はガイド棒12
a,12bを支持する支持部材、18は支持部材
16,17を支持する事によつてキヤリヤ9内に
フオーク11を進入、脱出する機構部の基板であ
る。この基板18はと伴にその上に載つているも
の等全て、即ちフオーク11、支持部材16,1
7、ガイド棒12a,12b、ネジ13、モータ
15、ギヤ14a,14bが上下する。23は最
下部にある下板、24は最上部にある上板、19
a,19bはこの下板23と上板24を連結し相
互に固定する固定棒であり同時に基板18を貫ぬ
いており基板18のガイド棒になつている。20
はネジで、モータ22の回転力をモータ22の軸
に設けられているギヤ21bとこれに噛合しかつ
ネジ22の端部に固定されているギヤ21aを介
して受けて回転する。ネジ20は基板18に設け
られたネジ穴に螺入している為ネジ20が1回転
するとそのピツチ分だけ基板18は上下する。な
お、このネジ20は、上板24に軸受けで軸支さ
れている。第11図はレチクル又はマスクを箱部
材4から取り出す機構部の説明図である。
FIGS. 10 and 11 are explanatory diagrams showing the entire embodiment of a mask or reticle conveying apparatus according to the present invention. Figure 10 shows box member 4 and fork 1.
The reticle housed in the box member 4 is not shown in the figure in which the reticle is placed on the box member 1 and carried out from the carrier 9. 12
12a and 12b are guide rods of the fork 11, and 13 is a screw which is rotated by a motor 15 via a gear 14b provided on the shaft of the motor 15 and a gear 14a meshing with the gear 14b. This screw 13 is supported by a support member 17 with a bearing, and is screwed into a screw hole provided in the fork 11. As the screw 13 rotates, the fork 11 moves forward or backward, and enters or exits the carrier 9 through the hole 8 shown in FIG. 9 as described above. 16 and 17 are guide rods 12
The support member 18 that supports the support members a and 12b is a base plate of a mechanism that allows the fork 11 to enter and exit the carrier 9 by supporting the support members 16 and 17. This board 18 includes everything placed on it, ie, the fork 11, the support members 16, 1, etc.
7. The guide rods 12a and 12b, the screw 13, the motor 15, and the gears 14a and 14b move up and down. 23 is the lower plate at the bottom, 24 is the upper plate at the top, 19
Numerals a and 19b are fixing rods for connecting and fixing the lower plate 23 and the upper plate 24 to each other, and at the same time, they penetrate through the substrate 18 and serve as guide rods for the substrate 18. 20
is a screw, and rotates by receiving the rotational force of the motor 22 via a gear 21b provided on the shaft of the motor 22 and a gear 21a that meshes with the gear 21b and is fixed to the end of the screw 22. Since the screw 20 is screwed into a screw hole provided in the board 18, when the screw 20 rotates once, the board 18 moves up and down by the pitch. Note that this screw 20 is supported by a bearing on the upper plate 24. FIG. 11 is an explanatory diagram of a mechanism section for taking out a reticle or mask from the box member 4.

6はレチクル、7はペリクル膜、26a,26
bは吸着盤、25a,25b,25cは吸着盤2
6a,26b等を支持する吸着盤支持棒で上板2
4を貫通して不図示の手段により支持されてい
る。この吸着板支持棒25a,25b,25cは
機構部が不図示であるが若干上下して位置調整す
る事が出来る。なお、第10図に於て、カセツト
を収容したキヤリヤ9は収容しているカセツトの
箱部材4がフオーク11側に対向する位置に図の
如く配置されている。
6 is a reticle, 7 is a pellicle membrane, 26a, 26
b is a suction cup, 25a, 25b, 25c are suction cups 2
Upper plate 2 with a suction cup support rod that supports 6a, 26b, etc.
4 and is supported by means not shown. Although the mechanical parts of the suction plate support rods 25a, 25b, and 25c are not shown, they can be moved up and down slightly to adjust their positions. In FIG. 10, the carrier 9 containing the cassettes is arranged at a position where the box member 4 of the cassettes therein faces the fork 11 as shown.

次に前記構成に於て第1図乃至第11図を参照
してマスクもしくはレチクルの搬送装置の動作を
説明する。
Next, the operation of the mask or reticle conveying device in the above configuration will be explained with reference to FIGS. 1 to 11.

第2図に示した箱部材4の段差面4dの上にマ
スク又はレチクル(本実施例の場合はレチクル
6)は人手によつて第6図に示した如く置かれ、
第1図に示した蓋部材1の入口端部1bの所から
保持部1aの上に突出部4aが載る様にして箱部
材1に差し込まれる。蓋部材1の入口端部1bで
箱部材4の止部材4cとがピツタリ合つた位置で
前述したように爪部材3は箱部材4の引掛り部4
bに係合し、蓋部材1と箱部材4とが分離しない
様に係止する。
A mask or reticle (reticle 6 in this embodiment) is manually placed on the step surface 4d of the box member 4 shown in FIG. 2 as shown in FIG.
The lid member 1 is inserted into the box member 1 from the entrance end 1b shown in FIG. 1 so that the protruding portion 4a rests on the holding portion 1a. At the position where the entrance end 1b of the lid member 1 and the stopper member 4c of the box member 4 are tightly fitted together, the claw member 3 engages the catch portion 4 of the box member 4 as described above.
b, and locks the lid member 1 and the box member 4 so that they do not separate.

この時の結合した図が第5図及び第7図であ
り、それを断面して示したのが第6図である。第
5図に示したカセツトの状態でカセツトは第8図
に示すD方向からキヤリヤ9に人手によつて挿入
される。なお、カセツトはストツパ9bを乗り越
える様にキヤリヤ9には空間9cが設けられてい
る。キヤリヤ9に挿入されたカセツトは反対側に
行きすぎない様ストツパ9aによつて位置決めさ
れる。
The combined view at this time is FIG. 5 and FIG. 7, and FIG. 6 is a cross-sectional view of the two. The cassette in the state shown in FIG. 5 is manually inserted into the carrier 9 from direction D shown in FIG. A space 9c is provided in the carrier 9 so that the cassette can pass over the stopper 9b. The cassette inserted into the carrier 9 is positioned by a stopper 9a so that it does not go too far to the opposite side.

次に第10図に於てキヤリヤ9から箱部材4が
自動で搬出される動作について説明する。モータ
22の回転位置決めによりギヤ21b,21aを
介しネジ20が回転し、ガイド棒19a,19b
に案内されて基板18及びフオーク11は所望の
カセツトの前で移動停止する。この位置の検出は
モータの回転数を検出するエンコーダ等によつて
自在になされ、不図示であるが安全の為の光9も
入つている。故にモータ15の回転によりギヤ1
4b,14aを介しネジ13が回転し、第9図に
示した状態にあるフオーク11が〓間穴8を通し
てキヤリヤ9内に箱部材4等に接触しないで進入
する。その進入は不図示のリミツトスイツチ等の
作用により所定の位置で終了する。
Next, referring to FIG. 10, the operation of automatically unloading the box member 4 from the carrier 9 will be explained. Due to the rotational positioning of the motor 22, the screw 20 rotates via the gears 21b, 21a, and the guide rods 19a, 19b
The substrate 18 and fork 11 move and stop in front of a desired cassette. This position is freely detected by an encoder or the like that detects the number of rotations of the motor, and a light 9 is also provided for safety, although not shown. Therefore, due to the rotation of motor 15, gear 1
4b and 14a, the screw 13 rotates, and the fork 11 in the state shown in FIG. 9 enters the carrier 9 through the clearance hole 8 without contacting the box member 4, etc. The approach is terminated at a predetermined position by the action of a limit switch (not shown) or the like.

フオーク11のキヤリヤ9内への進入が終る
と、モータ22が若干回転し、ギヤ21b,21
aとネジ20を介して基板18を若干押し上げる
ことによつてフオーク11は第2図に示した箱部
材4の部分4a′に接する位置迄若干上昇し箱部材
4の部分4a′にある不図示の凹部に第9図に示し
たフオーク11の係合部10が係合する。次にモ
ータ15が回転し、ギヤ14b,14aとネジ1
3を介してフオーク11がモータ15側に戻るフ
オーク11がキヤリヤ9外に第10図に示した如
く箱部材4やレチクル6と共に搬出することがで
きる。この時蓋部材1はキヤリヤ9のストツパ9
aに引掛つていたり、前述のようにキヤリヤ9の
内壁9dに爪部材3が摩擦係合している為、フオ
ーク11は箱部材4のみを搬出する。
When the fork 11 has entered the carrier 9, the motor 22 rotates slightly and the gears 21b, 21
By slightly pushing up the board 18 through the screws 20 and 20, the fork 11 rises slightly to a position where it touches the part 4a' of the box member 4 shown in FIG. The engaging portion 10 of the fork 11 shown in FIG. 9 engages with the recessed portion. Next, the motor 15 rotates, and the gears 14b, 14a and the screw 1
3, the fork 11 returns to the motor 15 side, and the fork 11 can be carried out of the carrier 9 together with the box member 4 and the reticle 6 as shown in FIG. At this time, the cover member 1 is moved to the stopper 9 of the carrier 9.
The fork 11 carries out only the box member 4 because it is hooked on the box member 4 and the claw member 3 is frictionally engaged with the inner wall 9d of the carrier 9 as described above.

箱部材4の搬出は不図示のリミツトスイツチ等
の作用により所定の位置で終了する。今度は上下
移動の為のモータ22の回転によつて、ギヤ21
b,21aとネジ20を介して、基板18及びフ
オーク11、箱部材4が最上部のレチクル又はマ
スク取出し位置に搬送され所定位置で止まる。
The unloading of the box member 4 is completed at a predetermined position by the action of a limit switch (not shown) or the like. This time, the gear 21 is rotated by the rotation of the motor 22 for vertical movement.
The substrate 18, the fork 11, and the box member 4 are transported to the uppermost reticle or mask removal position via the screws 20 and 21a, and are stopped at a predetermined position.

次に第11図に於てマスク又はレチクルは箱部
材4からその支持面に対して略垂直方向から取出
され第2の搬送手段に受渡される。この部分につ
いて説明する。最上部のマスクはレチクル取出し
位置は同時に吸着盤26a,26bがレチクル6
に接触する位置であり、ここでレチクル6は吸着
盤26a,26bに吸着される。レチクル6の吸
着が終了するとモータ22の回転によりギヤ21
a,21bとネジ20を介して基板18、フオー
ク11、箱部材4等は下方向へ大きく移動する。
これによつて、レチクル6は、箱部材4から取出
されたわけである。
Next, in FIG. 11, the mask or reticle is taken out from the box member 4 in a direction substantially perpendicular to its supporting surface and delivered to the second conveyance means. This part will be explained. For the uppermost mask, the reticle extraction position is at the same time that the suction cups 26a and 26b are at the reticle 6.
At this position, the reticle 6 is attracted to the suction cups 26a and 26b. When the adsorption of the reticle 6 is completed, the gear 21 is rotated by the rotation of the motor 22.
The board 18, fork 11, box member 4, etc. move significantly downward via a, 21b and the screw 20.
As a result, the reticle 6 is taken out from the box member 4.

次に不図示であるが第2の搬送手段がレチクル
又はマスクに接触しない位置に矢印Fの方向から
進入すると吸着盤支持棒25a,25b,25c
がレチクル6と共に不図示の手段により駆動され
て下降運動を初めこの第2の搬送手段の上にレチ
クル6を受渡す。その位置で吸着盤26a,26
bによる吸着が切れレチクル6は又フリーの状態
になる。なお、吸着は真空吸着のようなものであ
つてもよい。不図示であるが上板24の上にはレ
チクル又はマスクの位置決め機構があつて、第2
の搬送手段の所定位置にレチクル又はマスクの位
置決めを行う。
Next, although not shown, when the second conveying means enters from the direction of arrow F to a position where it does not contact the reticle or mask, suction cup support rods 25a, 25b, 25c
is driven together with the reticle 6 by means not shown to begin its downward movement and transfer the reticle 6 onto this second conveying means. At that position, suction cups 26a, 26
The suction by b is broken and the reticle 6 becomes free again. Note that the adsorption may be a type of vacuum adsorption. Although not shown, there is a reticle or mask positioning mechanism on the upper plate 24, and a second
The reticle or mask is positioned at a predetermined position on the transport means.

以上の動作が終了すると第2の搬送手段はレチ
クル又はマスクを露光位置に搬送する。露光済の
レチクル又はマスクは今迄と略逆動作によつてキ
ヤリヤ9内に収容される。
When the above operations are completed, the second transport means transports the reticle or mask to the exposure position. The exposed reticle or mask is accommodated in the carrier 9 by a substantially reverse operation.

なお、上記実施例では、カセツトを引き出した
フオークを上下動させているが、フオーク自体は
上下動しないで別に上下動する第2の搬送手段を
設け、それにカセツトを移し、第2の搬送手段に
よつて最上部に運びそこでカセツトよりレチクル
又はマスクを取出すことも可能である。次に第3
の搬送手段にはマスク又はレチクルを受渡し露光
位置へ転送する手段も考えられる。
In the above embodiment, the fork that pulled out the cassette is moved up and down, but the fork itself does not move up and down, but a second conveyance means that moves up and down is separately provided, and the cassette is transferred to the second conveyance means. It is then possible to carry it to the top and remove the reticle or mask from the cassette there. Then the third
The conveying means may also include means for transferring the mask or reticle to the exposure position.

近年ゴミの結像を避ける目的で、第6図に示す
如くマスク又はレチクルの有効膜面部をペリクル
枠で囲みペリクル膜で被覆する方法が提供されて
いる。本実施例はこのペリクル膜で被覆したマス
ク又はレチクルについて特に効果を発揮する。
In recent years, for the purpose of avoiding dust imaging, a method has been proposed in which the effective film surface of a mask or reticle is surrounded by a pellicle frame and covered with a pellicle film, as shown in FIG. This embodiment is particularly effective for masks or reticles coated with this pellicle film.

この方法はマスク又はレチクルにペリクル枠、
ペリクル膜を取付ける際にこの3部材で構成され
た空間を無塵の完全な密閉状態にする事によつ
て、マスク又はレチクル膜面への外部からのゴム
付着を防止している。
This method uses a pellicle frame on the mask or reticle,
When attaching the pellicle membrane, the space made up of these three members is kept in a dust-free and completely sealed state, thereby preventing rubber from adhering to the mask or reticle membrane surface from the outside.

ペリクル膜面に付着したゴミは、ペリクル枠の
の厚さ相当量だけマスク又はレチクル膜面から離
れる為にウエハー上で結像しない。このペリクル
膜は薄くて、非常に弱く高価である。
Dust attached to the pellicle film surface is not imaged on the wafer because it is separated from the mask or reticle film surface by an amount equivalent to the thickness of the pellicle frame. This pellicle membrane is thin, very weak and expensive.

従つて破壊、汚損を考えると、この近くを搬送
手段が移動しない方が良い。箱部材からのマスク
又はレチクル取出しを、箱部材のマスク又はレチ
クル支持面に対し平行方向から取出す構造にする
と、ペリクル枠とフオーク、あるいはペリクル膜
とフオークが接触する可能性が生じる。接触する
とペリクル膜は弱いのでその衝撃でペリクル膜が
破壊する危険性がある。
Therefore, in consideration of destruction and contamination, it is better not to move the conveying means near this area. If the mask or reticle is taken out from the box member in a direction parallel to the mask or reticle support surface of the box member, there is a possibility that the pellicle frame and the fork or the pellicle membrane and the fork come into contact. Since the pellicle membrane is weak when it comes into contact, there is a risk that the pellicle membrane will be destroyed by the impact.

所が本実施例のように箱部材からのマスク又は
レチクル取出しを、箱部材のマスク又はレチクル
支持面に対し垂直方向から取出す構造にするとフ
オーク等の移動部材で取出すわけでないので、ペ
リクル膜の破壊、汚損の危険性がない。
However, if the mask or reticle is taken out from the box member in a direction perpendicular to the mask or reticle support surface of the box member as in this embodiment, the pellicle film may be destroyed because it is not taken out using a moving member such as a fork. , no risk of contamination.

〔発明の効果〕〔Effect of the invention〕

以上説明したように、本発明によれば、マスク
やレチクル等の基板をカセツトキヤリアから取出
す際、基板は、上側部材をカセツトキヤリア内に
残したまま下側部材と一緒に取出される。このた
め、本発明によれば、カセツトキヤリア内に進入
するフオークで基板を傷付けるおそれや、露光位
置への搬送途中で基板に塵埃が付着してしまうお
それを低減できる。
As described above, according to the present invention, when a substrate such as a mask or a reticle is taken out from a cassette carrier, the substrate is taken out together with the lower part while leaving the upper part in the cassette carrier. Therefore, according to the present invention, it is possible to reduce the risk that the substrate will be damaged by a fork entering the cassette carrier, and the risk that dust will adhere to the substrate during transportation to the exposure position.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明に係る搬送装置に用いるカセツ
トの蓋部材の一部破砕斜視図、第2図はカセツト
の箱部材の斜視図、第3図は第1図をA方向から
見た一部省略斜視図、第4図は第2図をB方向か
ら見た一部省略斜視図、第5図はカセツトの斜視
図、第6図は第5図のC−C′線のカセツトの状態
の断面図、第7図は、爪部材の状態を示す断面部
分図、第8図はカセツトをキヤリヤに挿入した斜
視図、第9図は第8図のキヤリヤ等をE方向から
見た図でフオークとの関係を示す斜視図、第10
図は、本発明に係る搬送装置の全体斜視図、第1
1図は搬送装置の吸着機構を示す説明図である。 1……蓋部材、1a……保持部、1b……蓋入
口端部、1c……底部、2……把手、3……爪部
材、4……箱部材、4a……突出部、4b……引
掛り部、4c……止部材、4d……段差面、4
a′……部分、5……把手、6……レチクル、7…
…ペリクル枠、8……〓間穴、9a,9b……ス
トツパー、9c……空間、10……係合部、11
……フオーク、12a,12b……ガイド棒、1
3……ネジ、14a,14b……ギヤ、15……
モータ、16,17……支持部材、18……基
板、19a,19b……固定棒、20……ネジ、
21a,21b……ギヤ、22……モータ、23
……下板、24……上板、25a,25b,25
c……吸着盤支持棒、26a,26b……吸着
盤。
Fig. 1 is a partially fragmented perspective view of a lid member of a cassette used in the conveying device according to the present invention, Fig. 2 is a perspective view of a box member of the cassette, and Fig. 3 is a part of Fig. 1 viewed from direction A. FIG. 4 is a partially omitted perspective view of FIG. 2 seen from direction B, FIG. 5 is a perspective view of the cassette, and FIG. 7 is a partial sectional view showing the state of the claw member, FIG. 8 is a perspective view of the cassette inserted into the carrier, and FIG. 9 is a view of the carrier etc. in FIG. 10th perspective view showing the relationship between
The figure is an overall perspective view of the conveyance device according to the present invention, and the first
FIG. 1 is an explanatory diagram showing the suction mechanism of the conveying device. DESCRIPTION OF SYMBOLS 1... Lid member, 1a... Holding part, 1b... Lid entrance end, 1c... Bottom, 2... Handle, 3... Claw member, 4... Box member, 4a... Protrusion part, 4b... ...Hatch portion, 4c... Stop member, 4d... Step surface, 4
a'...part, 5...handle, 6...reticle, 7...
... Pellicle frame, 8 ... Hole, 9a, 9b ... Stopper, 9c ... Space, 10 ... Engagement part, 11
...Fork, 12a, 12b...Guide rod, 1
3...screw, 14a, 14b...gear, 15...
Motor, 16, 17... Supporting member, 18... Board, 19a, 19b... Fixing rod, 20... Screw,
21a, 21b...gear, 22...motor, 23
...Lower plate, 24...Upper plate, 25a, 25b, 25
c... Suction cup support rod, 26a, 26b... Suction cup.

Claims (1)

【特許請求の範囲】 1 マスクまたはレチクル等の原版が載置される
下側部材と、この下側部材に対して着脱自在に形
成される上側部材を有し、これらにより前記原版
を収納する収納室を形成する防塵カセツトが複数
装填されるカセツトキヤリアと、前記カセツトキ
ヤリアに対して進退自在に移動するフオークを有
し、前記防塵カセツトの下側部材を前記フオーク
で支持しながら前記防塵カセツトの下側部材を前
記カセツトキヤリアから引出すことにより、前記
防塵カセツトの上側部材を前記カセツトキヤリア
に残した状態で、前記原版を前記防塵カセツトの
下側部材と一緒に前記カセツトキヤリアから取出
す第1取出し機構と、前記原版が前記防塵カセツ
トの下側部材と一緒に前記カセツトキヤリアから
取出された後、前記防塵カセツトの下側部材内の
前記原版を保持することにより、前記防塵カセツ
トの下側部材から前記原版を取出す第2取出し機
構を有することを特徴とする原版の搬送装置。 2 前記第2取出し機構は真空吸着により前記防
塵カセツトの下側部材内の前記基板を保持するこ
とを特徴とする特許請求の範囲の範囲第1項記載
の原版の搬送装置。
[Scope of Claims] 1. A storage device having a lower member on which an original such as a mask or a reticle is placed, and an upper member detachably formed with respect to the lower member, in which the original is stored. The cassette carrier has a cassette carrier into which a plurality of dustproof cassettes forming a chamber are loaded, and a fork that moves forward and backward with respect to the cassette carrier, and supports the lower member of the dustproof cassette with the fork. a first take-out mechanism for taking out the original from the cassette carrier together with the lower member of the dust-proof cassette with the upper member of the dust-proof cassette remaining in the cassette carrier by pulling out the side member from the cassette carrier; , after the original is taken out from the cassette carrier together with the lower member of the dust-proof cassette, the original is removed from the lower member of the dust-proof cassette by holding the original in the lower member of the dust-proof cassette. An original transport device characterized by having a second take-out mechanism for taking out the original. 2. The original transport device according to claim 1, wherein the second take-out mechanism holds the substrate in the lower member of the dust-proof cassette by vacuum suction.
JP58112929A 1983-06-24 1983-06-24 Device for conveyance of negative plate Granted JPS605521A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP58112929A JPS605521A (en) 1983-06-24 1983-06-24 Device for conveyance of negative plate
US06/892,734 US4758127A (en) 1983-06-24 1986-07-28 Original feeding apparatus and a cassette for containing the original

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58112929A JPS605521A (en) 1983-06-24 1983-06-24 Device for conveyance of negative plate

Publications (2)

Publication Number Publication Date
JPS605521A JPS605521A (en) 1985-01-12
JPH0444421B2 true JPH0444421B2 (en) 1992-07-21

Family

ID=14599017

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58112929A Granted JPS605521A (en) 1983-06-24 1983-06-24 Device for conveyance of negative plate

Country Status (1)

Country Link
JP (1) JPS605521A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3716549A1 (en) * 1987-05-17 1988-12-08 Leitz Ernst Gmbh HANDLING MACHINE FOR PLATE-SHAPED OBJECTS
JPH02284441A (en) * 1989-04-26 1990-11-21 Hitachi Ltd Cassette transfer apparatus
US5804830A (en) * 1995-08-30 1998-09-08 Shafir Production System Ltd. Three-dimensional non-contact scanning apparatus and method using at least one circular, planar array of a plurality of radiant energy sensors, and a rotating energy source

Also Published As

Publication number Publication date
JPS605521A (en) 1985-01-12

Similar Documents

Publication Publication Date Title
US4758127A (en) Original feeding apparatus and a cassette for containing the original
JP4741180B2 (en) Apparatus and method for protecting and transporting a reticle
US4859137A (en) Apparatus for transporting a holder between a port opening of a standardized mechanical interface system and a loading and unloading station
JPH0722112B2 (en) Mask holder and mask transfer method using the same
EP2144119A1 (en) Reticle transport apparatus and reticle transporting method
JPH0444421B2 (en)
JP2020013823A (en) Substrate processing apparatus and substrate processing method
JPH1187459A (en) Substrate conveyance apparatus, semiconductor manufacturing system and manufacture of device
US6811369B2 (en) Semiconductor fabrication apparatus, pod carry apparatus, pod carry method, and semiconductor device production method
JPH10144765A (en) Substrate processing system
JP2000188316A (en) Method and device for conveyance and manufacture of semiconductor device using the same
WO1999003139A1 (en) Accommodation case and aligner
JPS62195143A (en) High-speed exchange device for substrate
JPH0444422B2 (en)
JP2001077173A (en) Semiconductor manufacturing apparatus and manufacture of device
JP2000012670A (en) Substrate cassette
JP2006245375A (en) Reticle-storing container, storing chamber, reticle-conveying facility and exposure device
JP2005123292A (en) Storage device and exposure method using it
JPH09260461A (en) Semiconductor manufacture device
JP2962236B2 (en) Pellicle storage container, transfer device and transfer method for pellicle storage container
JP3167089B2 (en) Exposure apparatus and method
JP3894513B2 (en) Semiconductor manufacturing equipment
JPH11255332A (en) Substrate storing case
JPH09266166A (en) Aligner
JPH0197961A (en) Automatic pellicle sticking device