JPH11255332A - Substrate storing case - Google Patents
Substrate storing caseInfo
- Publication number
- JPH11255332A JPH11255332A JP7663898A JP7663898A JPH11255332A JP H11255332 A JPH11255332 A JP H11255332A JP 7663898 A JP7663898 A JP 7663898A JP 7663898 A JP7663898 A JP 7663898A JP H11255332 A JPH11255332 A JP H11255332A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- lower cover
- photomask
- upper cover
- storage case
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、半導体用ホトマスク、
半導体ウエハ等枚葉式の基板の収納ケースにに関する。BACKGROUND OF THE INVENTION The present invention relates to a semiconductor photomask,
The present invention relates to a storage case for a single-wafer substrate such as a semiconductor wafer.
【0002】[0002]
【従来の技術】半導体用ホトマスクを例にとり説明す
る。半導体用ホトマスクは152mm正方で厚み6.3
mmの石英板に約0.1μmのクロム膜をスパッタし、
その上にレジストを塗布した基板にパターンの描画、現
像、エッチング、レジスト剥離などの処理を行って完成
する。2. Description of the Related Art A semiconductor photomask will be described as an example. The semiconductor photomask is 152mm square and 6.3mm thick.
Chromium film of about 0.1μm is sputtered on a quartz plate of
The substrate on which a resist is applied thereon is subjected to processing such as pattern drawing, development, etching, and resist stripping, thereby completing the process.
【0003】ホトマスクの製造工程において、従来は、
多段式のカセットにホトマスク5〜10枚を収納し、装
置にセットして処理を行っていたが、自動搬送車を用い
て搬送した時、ホトマスクが移動するなど安定性がなく
自動化には適さないという欠陥がある。In the photomask manufacturing process, conventionally,
5 to 10 photomasks are stored in a multi-stage cassette and set in the apparatus for processing. However, when transported using an automatic transport vehicle, the photomask moves and is not stable and is not suitable for automation. There is a defect that.
【0004】また、枚葉式の基板収納ケースもあるが、
蓋がヒンジになっているため処理装置に使用した時、そ
の開閉に複雑な機構が必要になるという欠陥があった。There is also a single-wafer type substrate storage case,
Since the lid is a hinge, when used in a processing apparatus, there is a defect that a complicated mechanism is required for opening and closing the lid.
【0005】さらに、従来の枚葉式基板収納ケースは、
ホトマスクの安定を確保するためホトマスクの上面を押
さえるので、ホトマスクに傷をつけたりゴミが発生する
という欠陥があった。[0005] Furthermore, the conventional single-wafer-type substrate storage case is
Since the upper surface of the photomask is pressed to ensure the stability of the photomask, there is a defect that the photomask is damaged or dust is generated.
【0006】[0006]
【発明が解決しようとする課題】本発明の目的は、自動
搬送機で安定に搬送することのできる基板収納ケースを
提供することである。SUMMARY OF THE INVENTION It is an object of the present invention to provide a substrate storage case that can be stably transferred by an automatic transfer machine.
【0007】また、処理装置において、上カバーを容易
に開閉することのできる基板収納ケースを提供すること
である。Another object of the present invention is to provide a substrate storage case in which the upper cover can be easily opened and closed in the processing apparatus.
【0008】さらに、ホトマスクの上面および下面に傷
をつけたり、ゴミを発生しない基板収納ケースを提供す
ることである。Another object of the present invention is to provide a substrate storage case which does not damage the upper and lower surfaces of the photomask and does not generate dust.
【0009】[0009]
【問題を解決するための手段】本発明は、下カバーの外
周にケース固定手段と内部の左右に3個以上の段付基板
支持具と内部の前後に2個以上の基板抑止具を具備し、
上カバーの外周にケース開閉手段を具備したことを特徴
とする。The present invention comprises a case fixing means on the outer periphery of a lower cover, three or more stepped substrate supports on the left and right inside, and two or more board restrainers on the front and rear inside. ,
A case opening / closing means is provided on the outer periphery of the upper cover.
【0010】また、上カバーに、基板端面を斜めに押え
る基板押え具を具備したことを特徴とする。[0010] Further, the invention is characterized in that the upper cover is provided with a substrate presser for obliquely pressing the substrate end surface.
【0011】[0011]
【実施例】以下本発明を図面に基づいて説明する。図1
は、本発明の基板収納ケースの斜視図、図2は、本発明
の基板収納ケースを閉じた時の詳細縦断面図である。DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below with reference to the drawings. FIG.
Is a perspective view of the substrate storage case of the present invention, and FIG. 2 is a detailed longitudinal sectional view when the substrate storage case of the present invention is closed.
【0012】ホトマスク1は、下カバー2の円柱状の段
付基板支持具3a〜3dの斜面4aで支持され、左方向
への動きは円柱面5aで抑止される。図2は、本基板収
納ケースの部分断面図である。円柱の接合面を、斜面4
aの如く傾斜させることによりホトマスク1との接触面
積が最小になるのでゴミの発生が少なくなる。The photomask 1 is supported by the inclined surfaces 4a of the cylindrical stepped substrate supports 3a to 3d of the lower cover 2, and the leftward movement is suppressed by the cylindrical surface 5a. FIG. 2 is a partial cross-sectional view of the present board storage case. The joint surface of the cylinder is slope 4
Since the contact area with the photomask 1 is minimized by inclining as shown in a, the generation of dust is reduced.
【0013】また、基板抑止具6a〜6dによってホト
マスク1は前後方向の動きが抑止される。Further, the photomask 1 is prevented from moving in the front-rear direction by the board restrainers 6a to 6d.
【0014】上記説明では、段付基板支持具3が4個、
基板抑止具6が4個の場合について述べたが、段付基板
支持具が3個であってもホトマスク1は支持できるし、
基板抑止具が2個であっても前後方向の移動を抑止でき
るので、同様に本発明を実現できる。In the above description, there are four stepped substrate supports 3,
Although the description has been given of the case where the number of the substrate restrainers 6 is four, the photomask 1 can be supported even if the number of the stepped substrate supports is three,
Even if there are two board stoppers, the movement in the front-rear direction can be suppressed, so that the present invention can be realized similarly.
【0015】上カバー7の円錐状の基板押え具8a、8
bに弾力性のあるシリコンゴム30をかぶせ、その斜面
9bでホトマスク1の端面1bを押え、上下方向の揺れ
を抑止する。The conical substrate holders 8a, 8 of the upper cover 7
b is covered with an elastic silicone rubber 30, and the slope 9 b presses the end face 1 b of the photomask 1, thereby suppressing vertical swing.
【0016】基板押え具8a、8bは、本説明のように
2個だけでなく左右にそれぞれ2個、計4個でも、また
は前後に各1個を加えて計4個にしても本発明を実現で
きる。The present invention is not limited to two substrate holding members 8a and 8b as described in the present invention, but may be two in each case on the left and right, or a total of four by adding one in each of the front and rear. realizable.
【0017】弾力性のあるシリコンゴム30をかぶせる
ことによりホトマスク1の押えが、より確実になり、ま
た、ホトマスク1との擦れがなくなりゴミの発生が抑止
されるという特徴もある。上下方向の動きが少ない時
は、シリコンゴム30を省いても本発明を実現できる。[0017] Covering the photomask 1 with the elastic silicon rubber 30 makes the pressing of the photomask 1 more reliable, and the photomask 1 is not rubbed so that the generation of dust is suppressed. When the vertical movement is small, the present invention can be realized even if the silicone rubber 30 is omitted.
【0018】上記説明では、弾力性あるカバーとしてシ
リコンゴムを使用した例を述べたが、その他の弾性体、
例えば弗素ゴムなどでも本発明を実現できる。In the above description, an example in which silicon rubber is used as the elastic cover has been described.
For example, the present invention can be realized by using a fluorine rubber or the like.
【0019】上記説明における段付基板支持具3a〜3
d、基板抑止具6a〜6d、基板押え具8a、8bの材
質はホトマスク1に傷をつけないようにするため、3弗
化樹脂または、ポリエチレンなどの樹脂を使用する。The stepped substrate supports 3a to 3 in the above description
d, The material of the substrate restrainers 6a to 6d and the substrate holders 8a and 8b is a resin such as trifluoride resin or polyethylene in order to prevent the photomask 1 from being damaged.
【0020】また、基板収納ケースを常に水平にして移
動する場合は、基板押え具8a、8bがなくても本発明
を実施することができる。When the substrate storage case is always moved horizontally, the present invention can be carried out without the substrate holders 8a and 8b.
【0021】ホトマスク1の端面は、約1mmの45度
面取りが行われているので角度10を30度〜60度に
して押えると効果的である。Since the end face of the photomask 1 is chamfered at 45 degrees of about 1 mm, it is effective to hold the photomask 1 at an angle 10 of 30 to 60 degrees.
【0022】図3は基板支持具の第2の実施例を示す斜
視図である。下カバー2の板状の段付支持具32の斜面
33でホトマスク1の端面を支持して垂直面34で横方
向の移動を抑止する。FIG. 3 is a perspective view showing a second embodiment of the substrate support. The end surface of the photomask 1 is supported by the inclined surface 33 of the plate-shaped stepped support 32 of the lower cover 2, and the vertical surface 34 suppresses lateral movement.
【0023】図4は、基板押え具の第2の実施例を示す
斜視図である。上カバー7の板状の基板押え具35の斜
面36でホトマスク1の端面1bを押えて、ホトマスク
1の上下方向への揺れを抑止する。FIG. 4 is a perspective view showing a second embodiment of the substrate presser. The end surface 1b of the photomask 1 is pressed by the inclined surface 36 of the plate-shaped substrate holder 35 of the upper cover 7, and the vertical movement of the photomask 1 is suppressed.
【0024】次に、上カバーの開閉について説明する。
下カバー2の案内ピン11a、11bは、上カバー7の
案内孔12a、12bにかん合し、開閉される。13a
〜13dは下カバー2の固定つば、14a、14bは上
カバー7の開閉つばである。Next, the opening and closing of the upper cover will be described.
The guide pins 11a and 11b of the lower cover 2 are engaged with the guide holes 12a and 12b of the upper cover 7 and are opened and closed. 13a
Reference numerals 13d to 13d denote fixing flanges of the lower cover 2, and 14a and 14b denote opening and closing flanges of the upper cover 7.
【0025】図5は、処理装置に基板収納ケースを置い
た時の正面図、図6は、上カバーを開いた時の正面図で
ある。FIG. 5 is a front view when the substrate storage case is placed on the processing apparatus, and FIG. 6 is a front view when the upper cover is opened.
【0026】先ず、エアシリンダ16a〜16bを駆動
して、連結したレバー17a〜17dを下方に下げ、固
定つば13a〜13dを押えてケースの下カバー2を固
定する。First, the air cylinders 16a to 16b are driven to lower the connected levers 17a to 17d downward, and press the fixing flanges 13a to 13d to fix the lower cover 2 of the case.
【0027】次に、エアシリンダ18a、18bを駆動
して、連結したプッシャ19a、19bを上方に上げ、
開閉つば14a、14bを突き上げて上カバー7を開
く。Next, the air cylinders 18a, 18b are driven to raise the connected pushers 19a, 19b upward.
The upper cover 7 is opened by pushing up the opening / closing collars 14a and 14b.
【0028】上カバーを閉じる時は、開く時の逆の順序
で動作を行う。ホトマスク1は図示されないロボット
で、ホトマスク1を下からすくい上げて取り出す。When closing the upper cover, the operation is performed in the reverse order of opening. The photomask 1 is a robot (not shown), which picks up and removes the photomask 1 from below.
【0029】また、自動搬送車は、固定つば13a〜1
3dを把持して基板収納ケースを搬送する。Further, the automatic carrier has fixed flanges 13a to 13a-1.
3d is gripped and the substrate storage case is transported.
【0030】4個のレバー17a〜17dを連結して、
1個のシリンダで動作させてもよい。また、レバー17
a〜17dを左右に動作させて、下カバー2を挟むよう
に固定することによっても本発明を実現できる。By connecting the four levers 17a to 17d,
It may be operated by one cylinder. Also, lever 17
The present invention can also be realized by moving a to 17d right and left and fixing the lower cover 2 so as to sandwich it.
【0031】以上説明したように、段付基板支持具3a
〜3d、基板抑止具6a〜6dがホトマスク1の端面に
しか接触しないので、ホトマスク1の表面および裏面に
傷をつけたりゴミを付着させる危険がない。As described above, the stepped substrate support 3a
3d, the substrate restrainers 6a to 6d only come into contact with the end face of the photomask 1, so there is no danger of scratching or adhering dust on the front and back surfaces of the photomask 1.
【0032】また、上カバー7の基板押え具8a、8b
でホトマスク1を押え、下カバー2の固定つば13a〜
13dを自動搬送車で把持して移動することによって安
定に搬送することができる。Further, the board holding members 8a, 8b of the upper cover 7 are provided.
And press down the photomask 1 to fix the lower cover 2 to the fixing flange 13a.
13d can be stably conveyed by gripping and moving 13d with an automatic conveyance vehicle.
【0033】さらに、処理装置においては、下カバー2
の固定つば13a〜13dを押え、上カバー7の開閉つ
ば14a、14bを突き上げることによって単純な機構
で基板収納ケースを開閉することができる。Further, in the processing apparatus, the lower cover 2
By pressing the fixing flanges 13a to 13d of the upper cover 7 and pushing up the opening / closing flanges 14a, 14b of the upper cover 7, the substrate storage case can be opened / closed by a simple mechanism.
【0034】上記説明では、基板がホトマスクの場合に
ついて述べたが、本発明はこれに限定されるものではな
く、一枚づつクリーンな処理を行う収納ケースにも全く
同様に実現できる。In the above description, the case where the substrate is a photomask has been described. However, the present invention is not limited to this, and the present invention can be realized in exactly the same manner in a storage case that performs clean processing one by one.
【0035】[0035]
【発明の効果】以上説明したように、本発明は次のよう
な効果を奏するものである。半導体などクリーンな基板
に傷をつけたり、ゴミを付着させることなく、安定に搬
送し、容易に開閉を行うことのできる基板収納ケースを
実現することを可能とする。As described above, the present invention has the following effects. It is possible to realize a substrate storage case that can be stably transported and easily opened and closed without damaging or attaching dust to a clean substrate such as a semiconductor.
【図1】本発明の基板収納ケースの斜視図である。FIG. 1 is a perspective view of a substrate storage case of the present invention.
【図2】本発明の基板収納ケースを閉じた時の詳細縦断
面図である。FIG. 2 is a detailed vertical sectional view when the substrate storage case of the present invention is closed.
【図3】本発明の基板支持具の第2の実施例を示す斜視
図である。FIG. 3 is a perspective view showing a second embodiment of the substrate support of the present invention.
【図4】本発明の基板押え具の第2の実施例を示す斜視
図である。FIG. 4 is a perspective view showing a second embodiment of the substrate presser of the present invention.
【図5】本発明の処理装置に基板収納ケースを置いた時
の正面図である。FIG. 5 is a front view when a substrate storage case is placed on the processing apparatus of the present invention.
【図6】本発明の上カバーを開いた時の正面図である。FIG. 6 is a front view when the upper cover of the present invention is opened.
1…ホトマスク、1b…端面、2…下カバー、3a〜3
d…段付基板支持具、4a…斜面、5a…円柱面、6a
〜6d…基板抑止具、7…上カバー、8a、8b…基板
押え具、9b…斜面、10…角度、11a、11b…案
内ピン、12a、12b…案内孔、13a〜13d…固
定つば、14a、14b…開閉つば、16a〜16b…
エアシリンダ、17a〜17d…レバー、18a、18
b…エアシリンダ、19a、19b…プッシャ、30…
シリコンゴム、31…案内ピン、32…段付支持具、3
3…斜面、34…垂直面、35…基板押え具、36…斜
面。DESCRIPTION OF SYMBOLS 1 ... Photomask, 1b ... End face, 2 ... Lower cover, 3a-3
d: stepped substrate support, 4a: slope, 5a: cylindrical surface, 6a
... 6d ... board restrainer, 7 ... upper cover, 8a, 8b ... board holder, 9b ... slope, 10 ... angle, 11a, 11b ... guide pin, 12a, 12b ... guide hole, 13a-13d ... fixed collar, 14a , 14b ... opening and closing brim, 16a-16b ...
Air cylinders, 17a to 17d ... Lever, 18a, 18
b ... air cylinder, 19a, 19b ... pusher, 30 ...
Silicon rubber, 31 ... guide pin, 32 ... stepped support, 3
Reference numeral 3 denotes a slope, 34 denotes a vertical surface, 35 denotes a substrate holder, and 36 denotes a slope.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 FI H05K 5/00 H01L 21/30 503E ──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 6 Identification code FI H05K 5/00 H01L 21/30 503E
Claims (5)
基板収納ケースにおいて、前記下カバーの外周にケース
固定手段と内部の左右に3個以上の段付基板支持具と内
部の前後に2個以上の基板抑止具を具備し、前記上カバ
ーの外周にケース開閉手段を具備したことを特徴とする
基板収納ケース。1. A single-wafer type substrate storage case comprising an upper cover and a lower cover, a case fixing means on an outer periphery of the lower cover, three or more stepped substrate supports on the left and right inside, and a front and rear inside of the substrate storage case. A board storage case, comprising: two or more board stoppers; and a case opening / closing means on an outer periphery of the upper cover.
る基板押え具を具備したことを特徴とする請求項1記載
の基板収納ケース。2. The substrate storage case according to claim 1, wherein the upper cover is provided with a substrate presser for obliquely pressing an end surface of the substrate.
ることを特徴とする請求項1記載の基板収納ケース。3. The substrate storage case according to claim 1, wherein a step portion of the stepped substrate support is inclined.
であることを特徴とする。請求項2記載の基板収納ケー
ス。4. The method according to claim 1, wherein the inclination of the substrate holder is 30 degrees to 60 degrees. The substrate storage case according to claim 2.
を特徴とする請求項2記載の基板収納ケース。5. The substrate storage case according to claim 2, wherein said substrate holder is covered with an elastic body.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7663898A JPH11255332A (en) | 1998-03-10 | 1998-03-10 | Substrate storing case |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7663898A JPH11255332A (en) | 1998-03-10 | 1998-03-10 | Substrate storing case |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH11255332A true JPH11255332A (en) | 1999-09-21 |
Family
ID=13610930
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP7663898A Pending JPH11255332A (en) | 1998-03-10 | 1998-03-10 | Substrate storing case |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH11255332A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006146079A (en) * | 2004-11-24 | 2006-06-08 | Miraial Kk | Reticle transport container |
JP2006332278A (en) * | 2005-05-25 | 2006-12-07 | Miraial Kk | Single-wafer storing container and shock absorption supporting member used for the same |
US7733666B2 (en) | 2005-06-22 | 2010-06-08 | Fujitsu Limited | Circuit board storage bag and storage rack |
JP2016500844A (en) * | 2012-10-19 | 2016-01-14 | インテグリス・インコーポレーテッド | Reticle pod with a mechanism to align the cover with the base plate |
KR20210142259A (en) * | 2020-05-18 | 2021-11-25 | 아메스산업(주) | Transfer Apparatus for Substrate with Cover Member |
-
1998
- 1998-03-10 JP JP7663898A patent/JPH11255332A/en active Pending
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006146079A (en) * | 2004-11-24 | 2006-06-08 | Miraial Kk | Reticle transport container |
JP4667018B2 (en) * | 2004-11-24 | 2011-04-06 | ミライアル株式会社 | Reticle transfer container |
JP2006332278A (en) * | 2005-05-25 | 2006-12-07 | Miraial Kk | Single-wafer storing container and shock absorption supporting member used for the same |
JP4644035B2 (en) * | 2005-05-25 | 2011-03-02 | ミライアル株式会社 | Single wafer storage container |
US7733666B2 (en) | 2005-06-22 | 2010-06-08 | Fujitsu Limited | Circuit board storage bag and storage rack |
JP2016500844A (en) * | 2012-10-19 | 2016-01-14 | インテグリス・インコーポレーテッド | Reticle pod with a mechanism to align the cover with the base plate |
US9919863B2 (en) | 2012-10-19 | 2018-03-20 | Entegris, Inc. | Reticle pod with cover to baseplate alignment system |
KR20210142259A (en) * | 2020-05-18 | 2021-11-25 | 아메스산업(주) | Transfer Apparatus for Substrate with Cover Member |
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