KR100852092B1 - Reticle Transfer Device - Google Patents

Reticle Transfer Device Download PDF

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Publication number
KR100852092B1
KR100852092B1 KR1020030101669A KR20030101669A KR100852092B1 KR 100852092 B1 KR100852092 B1 KR 100852092B1 KR 1020030101669 A KR1020030101669 A KR 1020030101669A KR 20030101669 A KR20030101669 A KR 20030101669A KR 100852092 B1 KR100852092 B1 KR 100852092B1
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KR
South Korea
Prior art keywords
reticle
alignment
arm
conveying
fork
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KR1020030101669A
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Korean (ko)
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KR20050069527A (en
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반재옥
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동부일렉트로닉스 주식회사
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Priority to KR1020030101669A priority Critical patent/KR100852092B1/en
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Library & Information Science (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

본 발명은 레티클 반송장치에 관한 것으로, 반송암에 레티클의 위치를 고정하는 지지대와 푸셔를 설치함으로써, 레크클을 보다 안전하게 이송하면서, 동시에 정렬이 이루어져 상기 레티클의 로딩 및 언로딩 시간이 단축되도록 한 것이다.The present invention relates to a reticle conveying apparatus, and by installing a support and a pusher to fix the position of the reticle to the conveying arm, while transporting the recicle more securely, at the same time the alignment is made to shorten the loading and unloading time of the reticle will be.

본 발명은, 반송암의 포크부에는 레티클의 위치를 고정시키기 위한 지지대가 서로 이격된 상태로 각각 설치되어 있고, 상기 반송암의 포크와 목부의 내측면에는 놓여진 레티클의 얼라이먼트를 위하여 하나 이상의 푸셔가 설치된 레티클 반송장치가 제공된다.
In the present invention, a support for fixing the position of the reticle is installed on the fork portion of the transfer arm, respectively, spaced apart from each other, one or more pushers for alignment of the reticle placed on the inner surface of the fork and the neck of the transfer arm An installed reticle conveying device is provided.

레티클, 반송, 얼라이먼트, 암, 지지, 포크, 노광, 소자, 제조Reticle, Bounce, Alignment, Arm, Support, Fork, Exposure, Device, Manufacturing

Description

레티클 반송장치{Reticle Transfer Device} Reticle Transfer Device             

도 1는 본 발명의 레트클 반송장치를 도시한 분리사시도1 is an exploded perspective view showing a reticle conveying apparatus of the present invention

도 2은 레티클이 놓여진 상태를 도시한 본 발명의 평면도
2 is a plan view of the present invention showing a state in which the reticle is placed

* 도면의 주요부분에 대한 부호의 설명 *Explanation of symbols on the main parts of the drawings

10 : 반송장치 12 : 반송 암10: conveying device 12: conveying arm

14 : 포크부 16 : 지지대14: fork 16: support

18 : 목부 20 : 레티클18: neck 20: reticle

22 : 푸셔
22: pusher

본 발명은 레티클 반송장치에 관한 것으로, 보다 상세하게는 반송암에 레티클의 위치를 고정하는 지지대와 얼라이먼트를 위한 푸셔가 설치되어, 레크클을 보다 안전하게 이송하면서 동시에 정렬이 이루어도록 하고, 이에 따라 레크클의 로딩 및 언로딩 시간이 단축되도록 한 것이다.
The present invention relates to a reticle conveying apparatus, and more particularly, a support for fixing the position of the reticle and a pusher for alignment are installed on the conveying arm, so that the recicle can be transported more safely and aligned at the same time. The loading and unloading time of the cleats is shortened.

일반적으로, 반도체 소자 제조공정 중 노광 공정에서 반도체 기판 상에 패턴을 형성하기 위하여 쓰이는 레티클을 스텝퍼(노광장비)에 장착하게 되는데, 이때 비 메모리는 메모리와 달리 패턴 레이어(Layer)의 종류에 따라 레티클을 자주 바꾸어 가면서 진행을 하게 된다. 따라서 레티클을 교체하고자, 레티클 스테이지에 있던 레티클은 언로딩되고 새로운 레티클이 로딩된다. In general, a reticle used to form a pattern on a semiconductor substrate in an exposure process during a semiconductor device manufacturing process is mounted on a stepper (exposure equipment). In this case, unlike a memory, a non-memory is a reticle according to the type of a pattern layer. Change frequently to progress. Therefore, to replace the reticle, the reticle that was in the reticle stage is unloaded and a new reticle is loaded.

이와 같이 레티클의 로딩 및 언로딩 과정에서 레티클 얼라이먼트 유닛을 통과하면서 반송암에 놓여진 레티클을 얼라인시킨 다음, 로딩 및 언로딩된다.As such, the reticle placed on the carrier arm is aligned while passing through the reticle alignment unit during the loading and unloading of the reticle, and then loaded and unloaded.

그런데, 상기와 같이 레티클의 얼라이먼트를 위하여 별도의 얼라인 과정을 거치게 됨으로써, 로딩 및 언로딩 시간이 길어지게 되고, 이에 따라 공정수행이 지연되는 문제점이 있다.However, since the separate alignment process is performed for the alignment of the reticle as described above, the loading and unloading time becomes long, and thus there is a problem in that the process execution is delayed.

또한, 반송 암에 놓여진 레티클은, 진공흡착을 통하여 고정되는데, 이때 상기 진공상에 에러가 발생되면, 레티클을 흡착고정시키지 못하게 되고, 이에 따라 레티클이 반송암으로부터 떨어져 파손되는 문제점이 있다.
In addition, the reticle placed on the conveying arm is fixed through vacuum adsorption. If an error occurs in the vacuum phase, the reticle cannot be fixed by the adsorption, and thus there is a problem that the reticle is broken off from the conveying arm.

본 발명은 상기와 같은 문제점을 해소하기 위해 발명된 것으로, 반송암에 레티클의 위치를 고정하는 지지대와 얼라이먼트의 기능을 갖는 푸셔를 설치하여 레티클을 보다 안전하게 이송하면서 동시에 정렬이 이루어져, 레티클의 로딩 및 언로딩 시간이 단축되도록 하는 점에 목적이 있다.
The present invention has been invented to solve the above problems, by installing a support and a pusher having the function of the alignment to fix the position of the reticle to the carrier arm to transport the reticle more securely and at the same time made alignment, loading and reticle The purpose is to reduce the unloading time.

본 발명의 문제점을 해결하기 위한 본 발명은, 반송암의 포크부에는 레티클의 위치를 고정시키기 위한 지지대가 서로 이격된 상태로 각각 설치되어 있고, 상기 반송암의 포크와 목부의 내측면에는 놓여진 레티클의 얼라이먼트를 위하여 하나 이상의 푸셔가 설치된 레티클 반송장치에 기술적 특징이 있다.
The present invention for solving the problems of the present invention, the support for fixing the position of the reticle to the fork portion of the carrier arm are respectively installed in a state separated from each other, the reticle placed on the inner surface of the fork and the neck of the carrier arm There is a technical feature of the reticle conveyer which is equipped with one or more pushers for the alignment of the.

이하 본 발명의 바람직한 일 실시예를 첨부된 예시도면에 의거하여 설명하기로 한다. 도 1은 본 발명의 레트클 반송장치를 도시한 사시도 이고, 도 2은 레티클이 놓여진 상태를 도시한 본 발명의 평면도 이다.Hereinafter, a preferred embodiment of the present invention will be described with reference to the accompanying drawings. 1 is a perspective view showing a reticle conveying apparatus of the present invention, Figure 2 is a plan view of the present invention showing a state in which the reticle is placed.

첨부된 도면을 참조하면, 반송장치(10) 반송암(12)의 포크부(14)분에는 지지대(16)가 서로 이격된 상태로 각각 설치되어 있고, 상기 반송암(12)의 포크부(14) 및 목부(18)의 내측면에는 놓여지는 레티클(20)이 얼라이먼트를 되도록 푸셔(22)가 서로 이격되는 상태로 각각 설치되어 있다. 여기서 푸셔(22)는 레티클(20)의 손상을 방지하기 위해 세라믹재가 사용된다. Referring to the accompanying drawings, the fork portion 14 of the transfer arm 12 of the transfer device 10 is provided with the support 16 spaced apart from each other, and the fork portion of the transfer arm 12 ( 14) and the pusher 22 are spaced apart from each other so that the reticle 20 placed on the inner surface of the neck 18 may be aligned. Here, the pusher 22 is made of a ceramic material to prevent damage to the reticle 20.

따라서, 레크클(20)의 교체를 위하여 상기 반송암(12)에 레티클(20)이 놓여지게 되면, 이 레티클(20)은 반송암(12)의 지지대(16)에 의하여 위치가 고정된다. 이에 따라 반송암(12)으로부터 레티클(20)이 이탈되지 않아 종래와 같은 파손을 방지하게 된다. Therefore, when the reticle 20 is placed on the transfer arm 12 for the replacement of the reckle 20, the reticle 20 is fixed by the support 16 of the transfer arm 12. As a result, the reticle 20 is not separated from the carrier arm 12, thereby preventing damage as in the related art.                     

동시에, 푸셔(22)가 레티클(20)을 얼라이먼트시키게 되어 종래와 같이 얼라인먼트를 수행하기 위한 별도의 얼라인먼트 과정이 삭제됨으로써, 레티클의 교체에 따른 로딩 및 언로딩시간을 단축하게 된다.
At the same time, the pusher 22 aligns the reticle 20 so that a separate alignment process for performing alignment as in the prior art is eliminated, thereby reducing loading and unloading time due to replacement of the reticle.

본 발명은 반송암에 지지대와 푸셔를 설치하여 레크클을 보다 안전하게 이송하면서 동시에 레티클에 대한 얼라이먼트가 이루어져, 레티클의 교체시에 로딩 및 언로딩 시간이 단축되는 효과가 있다.According to the present invention, the support arm and the pusher are installed on the carrier arm to transport the reticle more safely and at the same time, the alignment of the reticle is made, thereby reducing the loading and unloading time when the reticle is replaced.

Claims (1)

레티클을 반송시키는 반송암이 포함되는 레티클 반송장치에 있어서,A reticle conveying apparatus including a conveying arm for conveying a reticle, 상기 반송암은 목부와, 상기 목부에서 제1 방향으로 연장되고 두 부분으로 분리되어 이격된 포크부가 포함되고,The carrier arm includes a neck and a fork portion extending in a first direction from the neck and separated into two parts, 상기 반송암의 포크부에는 레티클의 위치를 고정시키기 위한 지지대가 서로 이격된 상태로 각각 설치되어 있고, 상기 반송암의 포크부와 목부의 내측면에는 놓여진 레티클의 얼라이먼트를 위하여 하나 이상의 푸셔가 설치된 것을 특징으로 하는 레티클 반송장치.Supports for fixing the position of the reticle are respectively installed in the fork of the carrier arm spaced apart from each other, one or more pushers are installed on the inner surface of the fork and neck of the carrier arm for alignment of the reticle placed Reticle conveying device characterized in that.
KR1020030101669A 2003-12-31 2003-12-31 Reticle Transfer Device KR100852092B1 (en)

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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010041031A (en) * 1998-04-02 2001-05-15 오노 시게오 Method and apparatus for wafer processing, and method and apparatus for exposure
KR20040016067A (en) * 2002-08-14 2004-02-21 삼성전자주식회사 Method for exposing photo resist film and exposure equipment using the same
KR20060008446A (en) * 2004-07-20 2006-01-27 삼성전자주식회사 Reticle loading equipment of the exposure apparatus

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20010041031A (en) * 1998-04-02 2001-05-15 오노 시게오 Method and apparatus for wafer processing, and method and apparatus for exposure
KR20040016067A (en) * 2002-08-14 2004-02-21 삼성전자주식회사 Method for exposing photo resist film and exposure equipment using the same
KR20060008446A (en) * 2004-07-20 2006-01-27 삼성전자주식회사 Reticle loading equipment of the exposure apparatus

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