JPS6317558A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法

Info

Publication number
JPS6317558A
JPS6317558A JP61161618A JP16161886A JPS6317558A JP S6317558 A JPS6317558 A JP S6317558A JP 61161618 A JP61161618 A JP 61161618A JP 16161886 A JP16161886 A JP 16161886A JP S6317558 A JPS6317558 A JP S6317558A
Authority
JP
Japan
Prior art keywords
film
crystal silicon
single crystal
insulating film
region
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61161618A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0516662B2 (enrdf_load_stackoverflow
Inventor
Yasuhiro Katsumata
勝又　康弘
Takao Ito
隆夫 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP61161618A priority Critical patent/JPS6317558A/ja
Priority to US07/070,830 priority patent/US4782030A/en
Priority to KR1019870007368A priority patent/KR950003932B1/ko
Publication of JPS6317558A publication Critical patent/JPS6317558A/ja
Publication of JPH0516662B2 publication Critical patent/JPH0516662B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Bipolar Transistors (AREA)
JP61161618A 1986-07-09 1986-07-09 半導体装置の製造方法 Granted JPS6317558A (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP61161618A JPS6317558A (ja) 1986-07-09 1986-07-09 半導体装置の製造方法
US07/070,830 US4782030A (en) 1986-07-09 1987-07-07 Method of manufacturing bipolar semiconductor device
KR1019870007368A KR950003932B1 (ko) 1986-07-09 1987-07-09 바이폴라형 반도체장치의 제조방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61161618A JPS6317558A (ja) 1986-07-09 1986-07-09 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JPS6317558A true JPS6317558A (ja) 1988-01-25
JPH0516662B2 JPH0516662B2 (enrdf_load_stackoverflow) 1993-03-05

Family

ID=15738598

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61161618A Granted JPS6317558A (ja) 1986-07-09 1986-07-09 半導体装置の製造方法

Country Status (1)

Country Link
JP (1) JPS6317558A (enrdf_load_stackoverflow)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5889863A (ja) * 1981-11-24 1983-05-28 Hitachi Ltd 半導体装置の製造方法
JPS62141768A (ja) * 1985-12-16 1987-06-25 Matsushita Electric Ind Co Ltd 半導体装置およびその製造方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5889863A (ja) * 1981-11-24 1983-05-28 Hitachi Ltd 半導体装置の製造方法
JPS62141768A (ja) * 1985-12-16 1987-06-25 Matsushita Electric Ind Co Ltd 半導体装置およびその製造方法

Also Published As

Publication number Publication date
JPH0516662B2 (enrdf_load_stackoverflow) 1993-03-05

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