JPS6315739B2 - - Google Patents
Info
- Publication number
- JPS6315739B2 JPS6315739B2 JP53000241A JP24178A JPS6315739B2 JP S6315739 B2 JPS6315739 B2 JP S6315739B2 JP 53000241 A JP53000241 A JP 53000241A JP 24178 A JP24178 A JP 24178A JP S6315739 B2 JPS6315739 B2 JP S6315739B2
- Authority
- JP
- Japan
- Prior art keywords
- mask
- alignment pattern
- wafer
- alignment
- reflecting mirror
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24178A JPS5493974A (en) | 1978-01-06 | 1978-01-06 | Projection-system mask alignment unit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24178A JPS5493974A (en) | 1978-01-06 | 1978-01-06 | Projection-system mask alignment unit |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5493974A JPS5493974A (en) | 1979-07-25 |
JPS6315739B2 true JPS6315739B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1988-04-06 |
Family
ID=11468462
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP24178A Granted JPS5493974A (en) | 1978-01-06 | 1978-01-06 | Projection-system mask alignment unit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5493974A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4310743A (en) * | 1979-09-24 | 1982-01-12 | Hughes Aircraft Company | Ion beam lithography process and apparatus using step-and-repeat exposure |
JPS56102823A (en) * | 1980-01-19 | 1981-08-17 | Nippon Kogaku Kk <Nikon> | Positioning device |
DD158824A1 (de) * | 1980-11-03 | 1983-02-02 | Adelbrecht Schorcht | Anordnung zur automatischen justierung mindestens eines gegenstandes |
JPS57138134A (en) * | 1981-02-20 | 1982-08-26 | Nippon Kogaku Kk <Nikon> | Positioning device |
JPS5825638A (ja) * | 1981-08-08 | 1983-02-15 | Canon Inc | 露光装置 |
JPS59119411U (ja) * | 1983-01-28 | 1984-08-11 | 日本電気ホームエレクトロニクス株式会社 | 投影露光装置 |
JPS603620A (ja) * | 1983-06-21 | 1985-01-10 | Mitsubishi Electric Corp | 微細パタ−ンの形成方法 |
US4652134A (en) * | 1984-08-28 | 1987-03-24 | Lsi Logic Corporation | Mask alignment system |
JPS63153821A (ja) * | 1987-10-27 | 1988-06-27 | Nikon Corp | 位置合わせ装置 |
JP2924635B2 (ja) * | 1994-03-16 | 1999-07-26 | 日本電気株式会社 | 半導体素子製造用レチクルおよび露光装置の製造誤差の補正方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS4915243U (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1972-05-18 | 1974-02-08 | ||
JPS4928362A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1972-07-05 | 1974-03-13 | ||
JPS52109875A (en) * | 1976-02-25 | 1977-09-14 | Hitachi Ltd | Position matching system for mask and wafer and its unit |
-
1978
- 1978-01-06 JP JP24178A patent/JPS5493974A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5493974A (en) | 1979-07-25 |