JPS6283339A - 光フアイバ被膜形成方法 - Google Patents
光フアイバ被膜形成方法Info
- Publication number
- JPS6283339A JPS6283339A JP60224343A JP22434385A JPS6283339A JP S6283339 A JPS6283339 A JP S6283339A JP 60224343 A JP60224343 A JP 60224343A JP 22434385 A JP22434385 A JP 22434385A JP S6283339 A JPS6283339 A JP S6283339A
- Authority
- JP
- Japan
- Prior art keywords
- fiber
- gas
- coating
- chamber
- reaction chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 65
- 239000011248 coating agent Substances 0.000 title claims abstract description 46
- 239000013307 optical fiber Substances 0.000 title claims abstract description 34
- 230000015572 biosynthetic process Effects 0.000 title 1
- 239000000835 fiber Substances 0.000 claims abstract description 150
- 238000005229 chemical vapour deposition Methods 0.000 claims abstract description 6
- 238000000034 method Methods 0.000 claims description 25
- 239000007789 gas Substances 0.000 abstract description 97
- 238000002955 isolation Methods 0.000 abstract description 74
- 238000006243 chemical reaction Methods 0.000 abstract description 71
- 239000007788 liquid Substances 0.000 abstract description 25
- 239000011261 inert gas Substances 0.000 abstract description 11
- 239000002245 particle Substances 0.000 abstract description 9
- 230000003247 decreasing effect Effects 0.000 abstract description 5
- 238000011282 treatment Methods 0.000 abstract description 5
- 230000007547 defect Effects 0.000 abstract description 4
- 238000001704 evaporation Methods 0.000 abstract 1
- 230000008020 evaporation Effects 0.000 abstract 1
- 239000011802 pulverized particle Substances 0.000 abstract 1
- 238000010828 elution Methods 0.000 description 21
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 17
- 229910052799 carbon Inorganic materials 0.000 description 17
- 238000000151 deposition Methods 0.000 description 17
- 239000000376 reactant Substances 0.000 description 17
- 239000003570 air Substances 0.000 description 12
- 230000008021 deposition Effects 0.000 description 11
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 10
- 238000007789 sealing Methods 0.000 description 9
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 8
- 239000001301 oxygen Substances 0.000 description 8
- 229910052760 oxygen Inorganic materials 0.000 description 8
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 7
- MWWATHDPGQKSAR-UHFFFAOYSA-N propyne Chemical group CC#C MWWATHDPGQKSAR-UHFFFAOYSA-N 0.000 description 7
- 229910000077 silane Inorganic materials 0.000 description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- 238000001089 thermophoresis Methods 0.000 description 5
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 4
- 239000007795 chemical reaction product Substances 0.000 description 4
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 4
- 229920001296 polysiloxane Polymers 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 238000001816 cooling Methods 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 239000003085 diluting agent Substances 0.000 description 3
- 229920006240 drawn fiber Polymers 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 239000012495 reaction gas Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 239000012080 ambient air Substances 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000004093 laser heating Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 230000001464 adherent effect Effects 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
- 238000012681 fiber drawing Methods 0.000 description 1
- 238000007380 fibre production Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical group [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000007665 sagging Methods 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 239000004447 silicone coating Substances 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 238000004901 spalling Methods 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
- Surface Treatment Of Glass Fibres Or Filaments (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60224343A JPS6283339A (ja) | 1985-10-08 | 1985-10-08 | 光フアイバ被膜形成方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60224343A JPS6283339A (ja) | 1985-10-08 | 1985-10-08 | 光フアイバ被膜形成方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6283339A true JPS6283339A (ja) | 1987-04-16 |
JPH0549614B2 JPH0549614B2 (enrdf_load_stackoverflow) | 1993-07-26 |
Family
ID=16812270
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60224343A Granted JPS6283339A (ja) | 1985-10-08 | 1985-10-08 | 光フアイバ被膜形成方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6283339A (enrdf_load_stackoverflow) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0227308A (ja) * | 1988-07-18 | 1990-01-30 | Sumitomo Electric Ind Ltd | 光ファイバ及びその製造方法 |
JPH0274542A (ja) * | 1988-04-07 | 1990-03-14 | Sumitomo Electric Ind Ltd | 光ファイバの被覆装置 |
JPH02160644A (ja) * | 1988-12-13 | 1990-06-20 | Fujikura Ltd | 光ファイバの製造方法 |
JPH02199041A (ja) * | 1989-12-20 | 1990-08-07 | Sumitomo Electric Ind Ltd | 光ファイバ素線の製造方法 |
JPH02283640A (ja) * | 1989-04-21 | 1990-11-21 | Furukawa Electric Co Ltd:The | 気相成長法による線条体被覆装置 |
JPH03285848A (ja) * | 1990-04-02 | 1991-12-17 | Hitachi Cable Ltd | カーボンコーティングファイバの製造方法 |
US5152817A (en) * | 1991-01-15 | 1992-10-06 | Corning Incorporated | Reactor for coating optical fibers |
US5408308A (en) * | 1993-01-29 | 1995-04-18 | Corning Incorporated | Method for monitoring hermetically-coated fibers |
-
1985
- 1985-10-08 JP JP60224343A patent/JPS6283339A/ja active Granted
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0274542A (ja) * | 1988-04-07 | 1990-03-14 | Sumitomo Electric Ind Ltd | 光ファイバの被覆装置 |
JPH0227308A (ja) * | 1988-07-18 | 1990-01-30 | Sumitomo Electric Ind Ltd | 光ファイバ及びその製造方法 |
JPH02160644A (ja) * | 1988-12-13 | 1990-06-20 | Fujikura Ltd | 光ファイバの製造方法 |
JPH02283640A (ja) * | 1989-04-21 | 1990-11-21 | Furukawa Electric Co Ltd:The | 気相成長法による線条体被覆装置 |
JPH02199041A (ja) * | 1989-12-20 | 1990-08-07 | Sumitomo Electric Ind Ltd | 光ファイバ素線の製造方法 |
JPH03285848A (ja) * | 1990-04-02 | 1991-12-17 | Hitachi Cable Ltd | カーボンコーティングファイバの製造方法 |
US5152817A (en) * | 1991-01-15 | 1992-10-06 | Corning Incorporated | Reactor for coating optical fibers |
US5408308A (en) * | 1993-01-29 | 1995-04-18 | Corning Incorporated | Method for monitoring hermetically-coated fibers |
Also Published As
Publication number | Publication date |
---|---|
JPH0549614B2 (enrdf_load_stackoverflow) | 1993-07-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4863760A (en) | High speed chemical vapor deposition process utilizing a reactor having a fiber coating liquid seal and a gas sea; | |
EP0409603B1 (en) | Process and apparatus for chemical vapour deposition | |
US4468283A (en) | Method for etching and controlled chemical vapor deposition | |
US5965216A (en) | Method of producing diamond-like-carbon coatings | |
US7687114B2 (en) | Method for metallic coating of fibres by liquid technique | |
KR20020008395A (ko) | 화학 증착 시스템 및 방법 | |
JPH01501933A (ja) | 光ファイバ用密封被覆物 | |
EP0498939B1 (en) | Reactor for coating optical fibers | |
US7381445B2 (en) | Method of coating a ceramic matrix composite fiber | |
JP4757862B2 (ja) | 板ガラスに蒸着酸化ガリウム被膜を形成する方法 | |
JPS6283339A (ja) | 光フアイバ被膜形成方法 | |
CN113684468B (zh) | 一种石英件保护层及其制备方法 | |
JPS60264347A (ja) | 光フアイバ製造方法,製造装置及び非接触シール | |
JPH04210476A (ja) | 炭化ケイ素膜の成膜方法 | |
US5256177A (en) | Method for coating optical fibers | |
JPS6144180A (ja) | 硼燐珪酸ガラスの蒸着法 | |
JPH0549615B2 (enrdf_load_stackoverflow) | ||
JPS6025381B2 (ja) | 光ファイバ被膜用炉 | |
EP0226651B1 (en) | Apparatus for chemical vapor deposition of a coating on an optical fiber | |
JPH0640750A (ja) | ハーメチックコート光ファイバの製造装置 | |
JPH10242060A (ja) | Cvd装置及びcvd法 | |
JP2583392B2 (ja) | ハーメチックコート光ファイバの製造方法 | |
JPS62238365A (ja) | Cvd薄膜形成装置 | |
JPH03236221A (ja) | 気相成長装置 | |
JP3059227B2 (ja) | ハーメチックコートファイバの製造方法 |