JPS6262054B2 - - Google Patents

Info

Publication number
JPS6262054B2
JPS6262054B2 JP57155809A JP15580982A JPS6262054B2 JP S6262054 B2 JPS6262054 B2 JP S6262054B2 JP 57155809 A JP57155809 A JP 57155809A JP 15580982 A JP15580982 A JP 15580982A JP S6262054 B2 JPS6262054 B2 JP S6262054B2
Authority
JP
Japan
Prior art keywords
wafer
axis direction
positioning
moving
outer periphery
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57155809A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5946029A (ja
Inventor
Akira Inagaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP57155809A priority Critical patent/JPS5946029A/ja
Publication of JPS5946029A publication Critical patent/JPS5946029A/ja
Publication of JPS6262054B2 publication Critical patent/JPS6262054B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Control Of Position Or Direction (AREA)
JP57155809A 1982-09-09 1982-09-09 ウエハのプリアライメント装置 Granted JPS5946029A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57155809A JPS5946029A (ja) 1982-09-09 1982-09-09 ウエハのプリアライメント装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57155809A JPS5946029A (ja) 1982-09-09 1982-09-09 ウエハのプリアライメント装置

Publications (2)

Publication Number Publication Date
JPS5946029A JPS5946029A (ja) 1984-03-15
JPS6262054B2 true JPS6262054B2 (enrdf_load_stackoverflow) 1987-12-24

Family

ID=15613928

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57155809A Granted JPS5946029A (ja) 1982-09-09 1982-09-09 ウエハのプリアライメント装置

Country Status (1)

Country Link
JP (1) JPS5946029A (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6245039A (ja) * 1985-08-23 1987-02-27 Canon Inc 円形板状物体の角度位置決め装置
JPH0727957B2 (ja) * 1989-10-09 1995-03-29 株式会社東芝 半導体製造装置
JPH04166845A (ja) * 1990-10-31 1992-06-12 Hitachi Ltd 基板の位置決め装置及びプロキシミティ露光装置
JP6242119B2 (ja) * 2013-08-29 2017-12-06 株式会社ピーエムティー 広角回転機構を有する露光装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5811740B2 (ja) * 1974-12-28 1983-03-04 ソニー株式会社 ウエハイチアワセソウチ
JPS5864043A (ja) * 1981-10-13 1983-04-16 Nippon Telegr & Teleph Corp <Ntt> 円板形状体の位置決め装置

Also Published As

Publication number Publication date
JPS5946029A (ja) 1984-03-15

Similar Documents

Publication Publication Date Title
US20090016857A1 (en) Substrate-replacing apparatus, substrate-processing apparatus, and substrate-inspecting apparatus
JP2003506879A (ja) 長方形ウエーハの整合システム
CN101216686A (zh) 一种晶片预对准平台及使用该平台的晶片预对准方法
JP2000340639A (ja) ディスク状素子のアライメント装置及びアライメント方法
CN103376673B (zh) 一种预对准装置及预对准方法
CN104111595B (zh) 用于光刻设备的预对准装置的预对准方法
JP5793457B2 (ja) 転写方法および転写装置
JP2005101455A (ja) 位置決め装置
JPS6262054B2 (enrdf_load_stackoverflow)
JPH05343294A (ja) 縮小投影露光装置
JP2009184069A (ja) ウエハ搬送装置及びその調整方法
JPS62101045A (ja) ウエ−ハの中心合せ装置
CN105319857B (zh) 多载台光刻系统及曝光方法
CN209993581U (zh) 基板传送设备及半导体制程机台
JP3662357B2 (ja) 円板形状体の位置決め装置
JPH0917710A (ja) 露光フィルムの整合方法及び整合装置
US6139251A (en) Stepper alignment method and apparatus
KR100411617B1 (ko) 씨씨디카메라에 의한 문자열 인식기능을 갖춘 반도체웨이퍼정렬장치
JPH05232714A (ja) 露光工程における基板と原版との位置合わせ方法
JPS63266850A (ja) 円形基板の位置決め装置
KR20090078597A (ko) 기판 가장자리의 식각 정도를 검사하는 비젼시스템 및 이를이용한 검사방법
JP2013205184A (ja) 転写方法および転写装置
JPS6245041A (ja) 円形板状物体の位置決め装置
TWM663774U (zh) 晶圓自動傳遞裝置
TWI267903B (en) Alignment system and method thereof