JPS6257273B2 - - Google Patents

Info

Publication number
JPS6257273B2
JPS6257273B2 JP56121577A JP12157781A JPS6257273B2 JP S6257273 B2 JPS6257273 B2 JP S6257273B2 JP 56121577 A JP56121577 A JP 56121577A JP 12157781 A JP12157781 A JP 12157781A JP S6257273 B2 JPS6257273 B2 JP S6257273B2
Authority
JP
Japan
Prior art keywords
gas
thin film
tunnel
barrier layer
torr
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56121577A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5821881A (ja
Inventor
Osamu Michigami
Jujiro Kato
Keiichi Tanabe
Hisataka Takenaka
Shizuka Yoshii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP56121577A priority Critical patent/JPS5821881A/ja
Priority to CA000405292A priority patent/CA1168762A/en
Priority to US06/390,116 priority patent/US4412902A/en
Priority to FR8211126A priority patent/FR2508237B1/fr
Priority to NL8202511A priority patent/NL190858C/xx
Publication of JPS5821881A publication Critical patent/JPS5821881A/ja
Publication of JPS6257273B2 publication Critical patent/JPS6257273B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00Superconducting devices
    • H10N60/01Manufacture or treatment
    • H10N60/0912Manufacture or treatment of Josephson-effect devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
JP56121577A 1981-06-22 1981-08-03 トンネル形ジヨセフソン接合素子の製造方法 Granted JPS5821881A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP56121577A JPS5821881A (ja) 1981-08-03 1981-08-03 トンネル形ジヨセフソン接合素子の製造方法
CA000405292A CA1168762A (en) 1981-06-22 1982-06-16 Method of fabrication for josephson tunnel junction
US06/390,116 US4412902A (en) 1981-06-22 1982-06-18 Method of fabrication of Josephson tunnel junction
FR8211126A FR2508237B1 (fr) 1981-06-22 1982-06-22 Procede pour la fabrication d'une jonction de josephson, notamment d'une jonction tunnel de josephson
NL8202511A NL190858C (nl) 1981-06-22 1982-06-22 Werkwijze voor het vervaardigen van een Josephson-tunnelovergang.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56121577A JPS5821881A (ja) 1981-08-03 1981-08-03 トンネル形ジヨセフソン接合素子の製造方法

Publications (2)

Publication Number Publication Date
JPS5821881A JPS5821881A (ja) 1983-02-08
JPS6257273B2 true JPS6257273B2 (enrdf_load_stackoverflow) 1987-11-30

Family

ID=14814677

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56121577A Granted JPS5821881A (ja) 1981-06-22 1981-08-03 トンネル形ジヨセフソン接合素子の製造方法

Country Status (1)

Country Link
JP (1) JPS5821881A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5839081A (ja) * 1981-08-14 1983-03-07 ウエスターン・エレクトリツク・カムパニー・インコーポレーテツド 超伝導デバイスを製造する方法

Also Published As

Publication number Publication date
JPS5821881A (ja) 1983-02-08

Similar Documents

Publication Publication Date Title
JPS6257273B2 (enrdf_load_stackoverflow)
JPS6259915B2 (enrdf_load_stackoverflow)
JPS6257274B2 (enrdf_load_stackoverflow)
JP2682136B2 (ja) ジョセフソン素子の製造方法
JPS6347153B2 (enrdf_load_stackoverflow)
JPS6258677B2 (enrdf_load_stackoverflow)
JPS6258676B2 (enrdf_load_stackoverflow)
JPS60208873A (ja) ジヨセフソン接合素子の製造方法
JPH054828B2 (enrdf_load_stackoverflow)
JPH0523073B2 (enrdf_load_stackoverflow)
JPS6260835B2 (enrdf_load_stackoverflow)
JPS6256676B2 (enrdf_load_stackoverflow)
JPS61111589A (ja) トンネル型ジヨセフソン素子の製造方法
JPH0511432B2 (enrdf_load_stackoverflow)
JPS60105285A (ja) ジヨセフソン集積回路作製用基板
JPS6147679A (ja) ジヨセフソン接合素子の作製方法
JPS6258555B2 (enrdf_load_stackoverflow)
JPS6234084A (ja) dcSQUID磁束計用抵抗体とその製造方法
JPS6262077B2 (enrdf_load_stackoverflow)
JPH0513396B2 (enrdf_load_stackoverflow)
JPH0513393B2 (enrdf_load_stackoverflow)
JPH0376792B2 (enrdf_load_stackoverflow)
JPH0149025B2 (enrdf_load_stackoverflow)
JPS60198874A (ja) ジヨセフソン接合素子
JPS6360555B2 (enrdf_load_stackoverflow)