JPH0513396B2 - - Google Patents

Info

Publication number
JPH0513396B2
JPH0513396B2 JP60102697A JP10269785A JPH0513396B2 JP H0513396 B2 JPH0513396 B2 JP H0513396B2 JP 60102697 A JP60102697 A JP 60102697A JP 10269785 A JP10269785 A JP 10269785A JP H0513396 B2 JPH0513396 B2 JP H0513396B2
Authority
JP
Japan
Prior art keywords
film
superconducting
silica
insulating film
metal layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60102697A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61263178A (ja
Inventor
Shuichi Tawara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP60102697A priority Critical patent/JPS61263178A/ja
Publication of JPS61263178A publication Critical patent/JPS61263178A/ja
Publication of JPH0513396B2 publication Critical patent/JPH0513396B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
JP60102697A 1985-05-16 1985-05-16 超電導集積回路の製造方法 Granted JPS61263178A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60102697A JPS61263178A (ja) 1985-05-16 1985-05-16 超電導集積回路の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60102697A JPS61263178A (ja) 1985-05-16 1985-05-16 超電導集積回路の製造方法

Publications (2)

Publication Number Publication Date
JPS61263178A JPS61263178A (ja) 1986-11-21
JPH0513396B2 true JPH0513396B2 (enrdf_load_stackoverflow) 1993-02-22

Family

ID=14334448

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60102697A Granted JPS61263178A (ja) 1985-05-16 1985-05-16 超電導集積回路の製造方法

Country Status (1)

Country Link
JP (1) JPS61263178A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7238085B2 (en) 2003-06-06 2007-07-03 P.C.T. Systems, Inc. Method and apparatus to process substrates with megasonic energy

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5710752U (enrdf_load_stackoverflow) * 1980-06-20 1982-01-20
JPS59105339A (ja) * 1982-12-08 1984-06-18 Nec Corp 半導体装置の製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7238085B2 (en) 2003-06-06 2007-07-03 P.C.T. Systems, Inc. Method and apparatus to process substrates with megasonic energy

Also Published As

Publication number Publication date
JPS61263178A (ja) 1986-11-21

Similar Documents

Publication Publication Date Title
US5976970A (en) Method of making and laterally filling key hole structure for ultra fine pitch conductor lines
JPS583381B2 (ja) 支持基板の片側で大地平面の上下に配線を作る方法
JPH07114236B2 (ja) 配線構造の製造方法
CA1190648A (en) Method of making planarized josephson junction devices
JPS6146081A (ja) ジヨセフソン接合素子の製造方法
JPS61180458A (ja) 半導体装置の製造方法
JPH0513396B2 (enrdf_load_stackoverflow)
JPS6257263A (ja) ジヨセフソン集積回路の製造方法
US5554884A (en) Multilevel metallization process for use in fabricating microelectronic devices
JPH0513397B2 (enrdf_load_stackoverflow)
JPH0334675B2 (enrdf_load_stackoverflow)
JP2874216B2 (ja) 半導体装置およびその製造方法
JP2976904B2 (ja) 超電導電界効果型素子およびその作製方法
JP2535539B2 (ja) ジョセフソン回路の製造方法
JPS6261334A (ja) パタ−ンの形成方法
JPS639660B2 (enrdf_load_stackoverflow)
JPS62118539A (ja) 多層配線の形成方法
JPS60115234A (ja) 半導体装置の製造方法
JPH0319222A (ja) 半導体装置の製造方法
JPS6146051A (ja) 配線方法
JPH0342705B2 (enrdf_load_stackoverflow)
JPH04348548A (ja) 半導体装置及びその製造方法
JPS63224273A (ja) ジヨセフソン接合素子とその作製方法
JPS5841775B2 (ja) ハンドウタイソウチノセイゾウホウホウ
JPH0226054A (ja) 半導体装置の製造方法

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term