JPS61263178A - 超電導集積回路の製造方法 - Google Patents
超電導集積回路の製造方法Info
- Publication number
- JPS61263178A JPS61263178A JP60102697A JP10269785A JPS61263178A JP S61263178 A JPS61263178 A JP S61263178A JP 60102697 A JP60102697 A JP 60102697A JP 10269785 A JP10269785 A JP 10269785A JP S61263178 A JPS61263178 A JP S61263178A
- Authority
- JP
- Japan
- Prior art keywords
- film
- superconducting
- deposited
- silica
- inductance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- 238000000034 method Methods 0.000 claims abstract description 20
- 229910052751 metal Inorganic materials 0.000 claims abstract description 18
- 239000002184 metal Substances 0.000 claims abstract description 18
- 239000012212 insulator Substances 0.000 claims abstract description 5
- 150000001875 compounds Chemical class 0.000 claims abstract description 4
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 3
- 238000000151 deposition Methods 0.000 claims 2
- 230000001590 oxidative effect Effects 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 64
- 239000000377 silicon dioxide Substances 0.000 abstract description 32
- 239000010410 layer Substances 0.000 abstract description 18
- 230000003647 oxidation Effects 0.000 abstract description 11
- 238000007254 oxidation reaction Methods 0.000 abstract description 11
- 239000011229 interlayer Substances 0.000 abstract description 9
- 238000004544 sputter deposition Methods 0.000 abstract description 7
- 238000010438 heat treatment Methods 0.000 abstract description 5
- 238000001704 evaporation Methods 0.000 abstract 2
- 238000007493 shaping process Methods 0.000 abstract 1
- 230000000694 effects Effects 0.000 description 5
- 239000007788 liquid Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000009413 insulation Methods 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60102697A JPS61263178A (ja) | 1985-05-16 | 1985-05-16 | 超電導集積回路の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60102697A JPS61263178A (ja) | 1985-05-16 | 1985-05-16 | 超電導集積回路の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61263178A true JPS61263178A (ja) | 1986-11-21 |
| JPH0513396B2 JPH0513396B2 (enrdf_load_stackoverflow) | 1993-02-22 |
Family
ID=14334448
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60102697A Granted JPS61263178A (ja) | 1985-05-16 | 1985-05-16 | 超電導集積回路の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61263178A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1635960A2 (en) | 2003-06-06 | 2006-03-22 | P.C.T. Systems, Inc. | Method and apparatus to process substrates with megasonic energy |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5710752U (enrdf_load_stackoverflow) * | 1980-06-20 | 1982-01-20 | ||
| JPS59105339A (ja) * | 1982-12-08 | 1984-06-18 | Nec Corp | 半導体装置の製造方法 |
-
1985
- 1985-05-16 JP JP60102697A patent/JPS61263178A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5710752U (enrdf_load_stackoverflow) * | 1980-06-20 | 1982-01-20 | ||
| JPS59105339A (ja) * | 1982-12-08 | 1984-06-18 | Nec Corp | 半導体装置の製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0513396B2 (enrdf_load_stackoverflow) | 1993-02-22 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |