JPS6242374B2 - - Google Patents

Info

Publication number
JPS6242374B2
JPS6242374B2 JP56164803A JP16480381A JPS6242374B2 JP S6242374 B2 JPS6242374 B2 JP S6242374B2 JP 56164803 A JP56164803 A JP 56164803A JP 16480381 A JP16480381 A JP 16480381A JP S6242374 B2 JPS6242374 B2 JP S6242374B2
Authority
JP
Japan
Prior art keywords
cleaning liquid
cleaning
liquid introduction
opening area
water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56164803A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5866333A (ja
Inventor
Itaru Yamanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP56164803A priority Critical patent/JPS5866333A/ja
Publication of JPS5866333A publication Critical patent/JPS5866333A/ja
Publication of JPS6242374B2 publication Critical patent/JPS6242374B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0416—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP56164803A 1981-10-14 1981-10-14 洗浄槽 Granted JPS5866333A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56164803A JPS5866333A (ja) 1981-10-14 1981-10-14 洗浄槽

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56164803A JPS5866333A (ja) 1981-10-14 1981-10-14 洗浄槽

Publications (2)

Publication Number Publication Date
JPS5866333A JPS5866333A (ja) 1983-04-20
JPS6242374B2 true JPS6242374B2 (enExample) 1987-09-08

Family

ID=15800215

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56164803A Granted JPS5866333A (ja) 1981-10-14 1981-10-14 洗浄槽

Country Status (1)

Country Link
JP (1) JPS5866333A (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3110218B2 (ja) * 1992-09-25 2000-11-20 三菱電機株式会社 半導体洗浄装置及び方法、ウエハカセット、専用グローブ並びにウエハ受け治具
US5503171A (en) * 1992-12-26 1996-04-02 Tokyo Electron Limited Substrates-washing apparatus
JP3320640B2 (ja) * 1997-07-23 2002-09-03 東京エレクトロン株式会社 洗浄装置
JPH1154471A (ja) 1997-08-05 1999-02-26 Tokyo Electron Ltd 処理装置及び処理方法
US6115867A (en) * 1997-08-18 2000-09-12 Tokyo Electron Limited Apparatus for cleaning both sides of substrate
US6539963B1 (en) 1999-07-14 2003-04-01 Micron Technology, Inc. Pressurized liquid diffuser

Also Published As

Publication number Publication date
JPS5866333A (ja) 1983-04-20

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