JPS5866333A - 洗浄槽 - Google Patents

洗浄槽

Info

Publication number
JPS5866333A
JPS5866333A JP56164803A JP16480381A JPS5866333A JP S5866333 A JPS5866333 A JP S5866333A JP 56164803 A JP56164803 A JP 56164803A JP 16480381 A JP16480381 A JP 16480381A JP S5866333 A JPS5866333 A JP S5866333A
Authority
JP
Japan
Prior art keywords
cleaning
cleaning liquid
water
cleaning tank
bottom plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56164803A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6242374B2 (enExample
Inventor
Itaru Yamanaka
山仲　格
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP56164803A priority Critical patent/JPS5866333A/ja
Publication of JPS5866333A publication Critical patent/JPS5866333A/ja
Publication of JPS6242374B2 publication Critical patent/JPS6242374B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04—Apparatus for manufacture or treatment
    • H10P72/0402—Apparatus for fluid treatment
    • H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H10P72/0416—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP56164803A 1981-10-14 1981-10-14 洗浄槽 Granted JPS5866333A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56164803A JPS5866333A (ja) 1981-10-14 1981-10-14 洗浄槽

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56164803A JPS5866333A (ja) 1981-10-14 1981-10-14 洗浄槽

Publications (2)

Publication Number Publication Date
JPS5866333A true JPS5866333A (ja) 1983-04-20
JPS6242374B2 JPS6242374B2 (enExample) 1987-09-08

Family

ID=15800215

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56164803A Granted JPS5866333A (ja) 1981-10-14 1981-10-14 洗浄槽

Country Status (1)

Country Link
JP (1) JPS5866333A (enExample)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5503171A (en) * 1992-12-26 1996-04-02 Tokyo Electron Limited Substrates-washing apparatus
US5590672A (en) * 1992-09-25 1997-01-07 Mitsubishi Denki Kabushiki Kaisha Semiconductor cleaning apparatus and wafer cassette
US6059891A (en) * 1997-07-23 2000-05-09 Tokyo Electron Limited Apparatus and method for washing substrate
US6115867A (en) * 1997-08-18 2000-09-12 Tokyo Electron Limited Apparatus for cleaning both sides of substrate
US6431184B1 (en) 1997-08-05 2002-08-13 Tokyo Electron Limited Apparatus and method for washing substrate
US6539963B1 (en) * 1999-07-14 2003-04-01 Micron Technology, Inc. Pressurized liquid diffuser

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5590672A (en) * 1992-09-25 1997-01-07 Mitsubishi Denki Kabushiki Kaisha Semiconductor cleaning apparatus and wafer cassette
US5503171A (en) * 1992-12-26 1996-04-02 Tokyo Electron Limited Substrates-washing apparatus
US6059891A (en) * 1997-07-23 2000-05-09 Tokyo Electron Limited Apparatus and method for washing substrate
US6431184B1 (en) 1997-08-05 2002-08-13 Tokyo Electron Limited Apparatus and method for washing substrate
US6115867A (en) * 1997-08-18 2000-09-12 Tokyo Electron Limited Apparatus for cleaning both sides of substrate
US6276378B1 (en) 1997-08-18 2001-08-21 Tokyo Electron Limited Apparatus for cleaning both sides of substrate
US6539963B1 (en) * 1999-07-14 2003-04-01 Micron Technology, Inc. Pressurized liquid diffuser
US6647996B2 (en) 1999-07-14 2003-11-18 Micron Technology, Inc. Method of diffusing pressurized liquid
US6672319B2 (en) 1999-07-14 2004-01-06 Micron Technology, Inc. Pressurized liquid diffuser
US6860279B2 (en) 1999-07-14 2005-03-01 Micron Technology, Inc. Pressurized liquid diffuser

Also Published As

Publication number Publication date
JPS6242374B2 (enExample) 1987-09-08

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