JPS6242373B2 - - Google Patents

Info

Publication number
JPS6242373B2
JPS6242373B2 JP56160583A JP16058381A JPS6242373B2 JP S6242373 B2 JPS6242373 B2 JP S6242373B2 JP 56160583 A JP56160583 A JP 56160583A JP 16058381 A JP16058381 A JP 16058381A JP S6242373 B2 JPS6242373 B2 JP S6242373B2
Authority
JP
Japan
Prior art keywords
water supply
water
supply port
flow
cleaning tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56160583A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5861632A (ja
Inventor
Itaru Yamanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP16058381A priority Critical patent/JPS5861632A/ja
Publication of JPS5861632A publication Critical patent/JPS5861632A/ja
Publication of JPS6242373B2 publication Critical patent/JPS6242373B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP16058381A 1981-10-07 1981-10-07 洗浄槽 Granted JPS5861632A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16058381A JPS5861632A (ja) 1981-10-07 1981-10-07 洗浄槽

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16058381A JPS5861632A (ja) 1981-10-07 1981-10-07 洗浄槽

Publications (2)

Publication Number Publication Date
JPS5861632A JPS5861632A (ja) 1983-04-12
JPS6242373B2 true JPS6242373B2 (ko) 1987-09-08

Family

ID=15718091

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16058381A Granted JPS5861632A (ja) 1981-10-07 1981-10-07 洗浄槽

Country Status (1)

Country Link
JP (1) JPS5861632A (ko)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5503171A (en) * 1992-12-26 1996-04-02 Tokyo Electron Limited Substrates-washing apparatus
KR100196998B1 (ko) * 1996-03-13 1999-06-15 구본준 반도체 웨이퍼 습식 처리 장치
DE19655219C2 (de) * 1996-04-24 2003-11-06 Steag Micro Tech Gmbh Vorrichtung zum Behandeln von Substraten in einem Fluid-Behälter
JP3320640B2 (ja) * 1997-07-23 2002-09-03 東京エレクトロン株式会社 洗浄装置
EP0898301B1 (en) 1997-08-18 2006-09-27 Tokyo Electron Limited Apparatus for cleaning both sides of a substrate
US6273107B1 (en) * 1997-12-05 2001-08-14 Texas Instruments Incorporated Positive flow, positive displacement rinse tank
KR100828279B1 (ko) 2006-11-09 2008-05-07 동부일렉트로닉스 주식회사 판형 순수공급판을 갖춘 린스 베스

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS562245B2 (ko) * 1976-06-23 1981-01-19

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5744685Y2 (ko) * 1979-06-20 1982-10-02

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS562245B2 (ko) * 1976-06-23 1981-01-19

Also Published As

Publication number Publication date
JPS5861632A (ja) 1983-04-12

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