JPS6235807B2 - - Google Patents
Info
- Publication number
- JPS6235807B2 JPS6235807B2 JP10732878A JP10732878A JPS6235807B2 JP S6235807 B2 JPS6235807 B2 JP S6235807B2 JP 10732878 A JP10732878 A JP 10732878A JP 10732878 A JP10732878 A JP 10732878A JP S6235807 B2 JPS6235807 B2 JP S6235807B2
- Authority
- JP
- Japan
- Prior art keywords
- pump
- reduced pressure
- gas
- reactor
- pumps
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000007788 liquid Substances 0.000 claims description 11
- 238000006243 chemical reaction Methods 0.000 claims description 10
- 239000000126 substance Substances 0.000 claims description 8
- 230000001473 noxious effect Effects 0.000 claims 1
- 239000007789 gas Substances 0.000 description 27
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 15
- 229910004298 SiO 2 Inorganic materials 0.000 description 8
- 239000010408 film Substances 0.000 description 7
- 239000002360 explosive Substances 0.000 description 6
- 239000012495 reaction gas Substances 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 238000012423 maintenance Methods 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 235000012431 wafers Nutrition 0.000 description 4
- 239000007795 chemical reaction product Substances 0.000 description 3
- 238000004880 explosion Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 3
- 229920005591 polysilicon Polymers 0.000 description 3
- 238000005086 pumping Methods 0.000 description 3
- 239000000376 reactant Substances 0.000 description 3
- 239000002341 toxic gas Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- 208000027418 Wounds and injury Diseases 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 239000008346 aqueous phase Substances 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 238000001444 catalytic combustion detection Methods 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 230000006378 damage Effects 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000006837 decompression Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 208000014674 injury Diseases 0.000 description 1
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 238000001947 vapour-phase growth Methods 0.000 description 1
- 239000002912 waste gas Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
- B01J3/002—Component parts of these vessels not mentioned in B01J3/004, B01J3/006, B01J3/02 - B01J3/08; Measures taken in conjunction with the process to be carried out, e.g. safety measures
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10732878A JPS5534158A (en) | 1978-09-01 | 1978-09-01 | Vacuum reaction apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10732878A JPS5534158A (en) | 1978-09-01 | 1978-09-01 | Vacuum reaction apparatus |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59047651A Division JPS59197141A (ja) | 1984-03-13 | 1984-03-13 | 減圧反応装置に於ける排気処理方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5534158A JPS5534158A (en) | 1980-03-10 |
| JPS6235807B2 true JPS6235807B2 (de) | 1987-08-04 |
Family
ID=14456259
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10732878A Granted JPS5534158A (en) | 1978-09-01 | 1978-09-01 | Vacuum reaction apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5534158A (de) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57162326A (en) * | 1981-03-30 | 1982-10-06 | Fujitsu Ltd | Vapor phase growing device |
| JPS58209113A (ja) * | 1982-05-31 | 1983-12-06 | Semiconductor Energy Lab Co Ltd | 半導体用反応性気体精製方法 |
| JPS5943519A (ja) * | 1982-09-03 | 1984-03-10 | Ulvac Corp | プラズマｃｖｄ装置における排気系装置 |
| JPS59197141A (ja) * | 1984-03-13 | 1984-11-08 | Sony Corp | 減圧反応装置に於ける排気処理方法 |
| JPH0722124B2 (ja) * | 1984-10-17 | 1995-03-08 | 東芝セラミツクス株式会社 | Ｃｖｄ炉用排ガス装置 |
| JPH0715131Y2 (ja) * | 1989-01-20 | 1995-04-10 | 古河電気工業株式会社 | 有機金属気相成長装置 |
| JP2952795B2 (ja) * | 1991-12-24 | 1999-09-27 | 三菱電機株式会社 | 半導体装置の製造方法及び半導体製造装置のパージ方法 |
| JP3801286B2 (ja) * | 1997-02-03 | 2006-07-26 | 三菱重工業株式会社 | 安全装置 |
| GB0505852D0 (en) * | 2005-03-22 | 2005-04-27 | Boc Group Plc | Method of treating a gas stream |
| GB0513867D0 (en) * | 2005-07-06 | 2005-08-10 | Boc Group Plc | Method of treating an exhaust gas |
-
1978
- 1978-09-01 JP JP10732878A patent/JPS5534158A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5534158A (en) | 1980-03-10 |
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