GB0513867D0 - Method of treating an exhaust gas - Google Patents

Method of treating an exhaust gas

Info

Publication number
GB0513867D0
GB0513867D0 GBGB0513867.2A GB0513867A GB0513867D0 GB 0513867 D0 GB0513867 D0 GB 0513867D0 GB 0513867 A GB0513867 A GB 0513867A GB 0513867 D0 GB0513867 D0 GB 0513867D0
Authority
GB
United Kingdom
Prior art keywords
treating
exhaust gas
exhaust
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
GBGB0513867.2A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BOC Group Ltd
Original Assignee
BOC Group Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BOC Group Ltd filed Critical BOC Group Ltd
Priority to GBGB0513867.2A priority Critical patent/GB0513867D0/en
Publication of GB0513867D0 publication Critical patent/GB0513867D0/en
Priority to PCT/GB2006/002314 priority patent/WO2007003882A1/en
Priority to JP2008518949A priority patent/JP2008545262A/en
Priority to KR1020087000302A priority patent/KR20080025724A/en
Ceased legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4408—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber by purging residual gases from the reaction chamber or gas lines
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/56—After-treatment
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Treating Waste Gases (AREA)
GBGB0513867.2A 2005-07-06 2005-07-06 Method of treating an exhaust gas Ceased GB0513867D0 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
GBGB0513867.2A GB0513867D0 (en) 2005-07-06 2005-07-06 Method of treating an exhaust gas
PCT/GB2006/002314 WO2007003882A1 (en) 2005-07-06 2006-06-23 Method of treating an exhaust gas
JP2008518949A JP2008545262A (en) 2005-07-06 2006-06-23 Exhaust gas treatment method
KR1020087000302A KR20080025724A (en) 2005-07-06 2006-06-23 Method of treating an exhaust gas

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GBGB0513867.2A GB0513867D0 (en) 2005-07-06 2005-07-06 Method of treating an exhaust gas

Publications (1)

Publication Number Publication Date
GB0513867D0 true GB0513867D0 (en) 2005-08-10

Family

ID=34856769

Family Applications (1)

Application Number Title Priority Date Filing Date
GBGB0513867.2A Ceased GB0513867D0 (en) 2005-07-06 2005-07-06 Method of treating an exhaust gas

Country Status (4)

Country Link
JP (1) JP2008545262A (en)
KR (1) KR20080025724A (en)
GB (1) GB0513867D0 (en)
WO (1) WO2007003882A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB0605048D0 (en) * 2006-03-14 2006-04-26 Boc Group Plc Apparatus for treating a gas stream
JP2013044479A (en) * 2011-08-24 2013-03-04 Japan Pionics Co Ltd Method for purifying exhaust gas containing silicon chloride compound
GB2501735B (en) * 2012-05-02 2015-07-22 Edwards Ltd Method and apparatus for warming up a vacuum pump arrangement

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5534158A (en) * 1978-09-01 1980-03-10 Sony Corp Vacuum reaction apparatus
JP2581955B2 (en) * 1988-07-11 1997-02-19 富士写真フイルム株式会社 Heat treatment equipment for semiconductor devices
JPH0910544A (en) * 1995-06-27 1997-01-14 Alpha Tec:Kk Anticontamination device, membrane formation device and etching device
US5955037A (en) * 1996-12-31 1999-09-21 Atmi Ecosys Corporation Effluent gas stream treatment system having utility for oxidation treatment of semiconductor manufacturing effluent gases
JP3215074B2 (en) * 1997-06-13 2001-10-02 カンケンテクノ株式会社 Method and device for removing semiconductor manufacturing flue gas
JP2000323466A (en) * 1999-04-30 2000-11-24 Applied Materials Inc Substrate processing device
US6673323B1 (en) * 2000-03-24 2004-01-06 Applied Materials, Inc. Treatment of hazardous gases in effluent
JP3675385B2 (en) * 2001-10-15 2005-07-27 関西日本電気株式会社 Semiconductor manufacturing apparatus and semiconductor manufacturing method
JP2004253699A (en) * 2003-02-21 2004-09-09 Toshiba Corp Detoxifying device of exhaust gas based on thermal oxidation decomposition

Also Published As

Publication number Publication date
KR20080025724A (en) 2008-03-21
JP2008545262A (en) 2008-12-11
WO2007003882A1 (en) 2007-01-11

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Legal Events

Date Code Title Description
AT Applications terminated before publication under section 16(1)