JPS6233745B2 - - Google Patents

Info

Publication number
JPS6233745B2
JPS6233745B2 JP57204413A JP20441382A JPS6233745B2 JP S6233745 B2 JPS6233745 B2 JP S6233745B2 JP 57204413 A JP57204413 A JP 57204413A JP 20441382 A JP20441382 A JP 20441382A JP S6233745 B2 JPS6233745 B2 JP S6233745B2
Authority
JP
Japan
Prior art keywords
chamber
vacuum
processed
workpiece
vacuum chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57204413A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5994435A (ja
Inventor
Hidetaka Jo
Noboru Kuryama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokuda Seisakusho Co Ltd
Original Assignee
Tokuda Seisakusho Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokuda Seisakusho Co Ltd filed Critical Tokuda Seisakusho Co Ltd
Priority to JP57204413A priority Critical patent/JPS5994435A/ja
Publication of JPS5994435A publication Critical patent/JPS5994435A/ja
Publication of JPS6233745B2 publication Critical patent/JPS6233745B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P72/0466—

Landscapes

  • Drying Of Semiconductors (AREA)
  • ing And Chemical Polishing (AREA)
JP57204413A 1982-11-20 1982-11-20 真空処理装置 Granted JPS5994435A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57204413A JPS5994435A (ja) 1982-11-20 1982-11-20 真空処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57204413A JPS5994435A (ja) 1982-11-20 1982-11-20 真空処理装置

Publications (2)

Publication Number Publication Date
JPS5994435A JPS5994435A (ja) 1984-05-31
JPS6233745B2 true JPS6233745B2 (OSRAM) 1987-07-22

Family

ID=16490125

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57204413A Granted JPS5994435A (ja) 1982-11-20 1982-11-20 真空処理装置

Country Status (1)

Country Link
JP (1) JPS5994435A (OSRAM)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3650710T2 (de) * 1985-10-24 1999-08-19 Texas Instruments Inc. System und Methode für Vakuum-Behandlung
US4949783A (en) * 1988-05-18 1990-08-21 Veeco Instruments, Inc. Substrate transport and cooling apparatus and method for same
US6989228B2 (en) 1989-02-27 2006-01-24 Hitachi, Ltd Method and apparatus for processing samples
JP2644912B2 (ja) 1990-08-29 1997-08-25 株式会社日立製作所 真空処理装置及びその運転方法
USRE39756E1 (en) 1990-08-29 2007-08-07 Hitachi, Ltd. Vacuum processing operating method with wafers, substrates and/or semiconductors
USRE39824E1 (en) 1990-08-29 2007-09-11 Hitachi, Ltd. Vacuum processing apparatus and operating method with wafers, substrates and/or semiconductors

Also Published As

Publication number Publication date
JPS5994435A (ja) 1984-05-31

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