JPS6231192Y2 - - Google Patents
Info
- Publication number
- JPS6231192Y2 JPS6231192Y2 JP1982168674U JP16867482U JPS6231192Y2 JP S6231192 Y2 JPS6231192 Y2 JP S6231192Y2 JP 1982168674 U JP1982168674 U JP 1982168674U JP 16867482 U JP16867482 U JP 16867482U JP S6231192 Y2 JPS6231192 Y2 JP S6231192Y2
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- cleaning liquid
- tank
- cleaning tank
- liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Cleaning By Liquid Or Steam (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16867482U JPS5974887U (ja) | 1982-11-09 | 1982-11-09 | 洗浄装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16867482U JPS5974887U (ja) | 1982-11-09 | 1982-11-09 | 洗浄装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5974887U JPS5974887U (ja) | 1984-05-21 |
| JPS6231192Y2 true JPS6231192Y2 (enrdf_load_html_response) | 1987-08-10 |
Family
ID=30368692
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16867482U Granted JPS5974887U (ja) | 1982-11-09 | 1982-11-09 | 洗浄装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5974887U (enrdf_load_html_response) |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3710450A (en) * | 1971-02-01 | 1973-01-16 | Allied Chem | Process and apparatus for removing liquids from solid surfaces |
| JPS5783036A (en) * | 1980-11-10 | 1982-05-24 | Seiichiro Sogo | Cleaning device for semiconductor material |
| JPS57160131A (en) * | 1981-03-30 | 1982-10-02 | Hitachi Ltd | Washing cell |
-
1982
- 1982-11-09 JP JP16867482U patent/JPS5974887U/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5974887U (ja) | 1984-05-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| SE8301624D0 (sv) | Sett vid rengoringsmaskin | |
| KR102520093B1 (ko) | 도포기 세정 장치 및 도포 장치 | |
| JPS6231192Y2 (enrdf_load_html_response) | ||
| JP2920165B2 (ja) | 枚葉洗浄用オーバーフロー槽 | |
| JPS6358840A (ja) | 洗浄方法およびその装置 | |
| JPH026447Y2 (enrdf_load_html_response) | ||
| JPH08215648A (ja) | 下降整流式浸漬洗浄装置 | |
| JP2541525B2 (ja) | 半導体基板処理装置 | |
| JP3386892B2 (ja) | 洗浄槽 | |
| DE69811355T2 (de) | Waferreinigungsvorrichtung mit einem reinigungstank und einem einsatz | |
| DE102008060390A1 (de) | Substratbearbeitungsvorrichtung | |
| KR900019160A (ko) | 반도체 웨이퍼 세정장치의 오우버플로우 탱크 | |
| JP2901705B2 (ja) | 半導体基板の洗浄方法 | |
| JPH03266431A (ja) | 基板の洗浄装置 | |
| JPS62156659A (ja) | 洗浄方法及び装置 | |
| JPH03250732A (ja) | 半導体ウェーハの洗浄装置 | |
| JP2001054766A (ja) | 多段式洗浄槽 | |
| JPH06164112A (ja) | 洗浄装置 | |
| KR200289926Y1 (ko) | 습식처리장치 | |
| KR930000401Y1 (ko) | 습식세정장치 | |
| JPS63174324A (ja) | 半導体ウエハ−の化学処理方法 | |
| JPH022961Y2 (enrdf_load_html_response) | ||
| JPH11319736A (ja) | 基板処理方法及びその装置 | |
| JPH0319984Y2 (enrdf_load_html_response) | ||
| JP2947439B2 (ja) | 写真処理装置のタンクおよびタンク内浮遊物回収方法 |