JPS5783036A - Cleaning device for semiconductor material - Google Patents

Cleaning device for semiconductor material

Info

Publication number
JPS5783036A
JPS5783036A JP15792580A JP15792580A JPS5783036A JP S5783036 A JPS5783036 A JP S5783036A JP 15792580 A JP15792580 A JP 15792580A JP 15792580 A JP15792580 A JP 15792580A JP S5783036 A JPS5783036 A JP S5783036A
Authority
JP
Japan
Prior art keywords
cleaning
semiconductor material
carrier
finished
shower nozzles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15792580A
Other languages
Japanese (ja)
Inventor
Seiichiro Sogo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP15792580A priority Critical patent/JPS5783036A/en
Publication of JPS5783036A publication Critical patent/JPS5783036A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PURPOSE:To enable to perform an excellently finished cleaning on the subject semiconductor material by a method wherein the cleaning device for the semiconductor material, for which chemical treatment processing has been finished, is constituted by showering devices of a plurality of stages, and the semiconductor material for which cleaning was finished is further cleaned in the pick-up process using pure water. CONSTITUTION:A cleaning vessel 1 is housed in a container 2, a pair of shower nozzles 8 are provided on the circumference of the bottom plate 3 consisting of a porous plate, and a plurality of semiconductors A, supported by a carrier 11, are placed on the bottom plate 3 which is exposed between the above shower nozzles. The lower part of the cleaning vessel is formed into a contracted state, a siphon type lead-out pipe 4 with a valve 5 and a branch pipe 6 with an electromagnetic valve 7 are provided, and the valves 4 and 7 are controlled by the float switch 10 which is provided in the cleaning vessel 1. Besides, on the carrier 11, shower nozzles 9 and 20, opposing each other, are provided in double stages, pure water is jetted out from the nozzle 9 or 20 while the carrier 11, which has been cleaned by the shower 8, is being lifted, and then the chemicals, impurities and the like which have remained on the surface of the semiconductor A are removed completely.
JP15792580A 1980-11-10 1980-11-10 Cleaning device for semiconductor material Pending JPS5783036A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15792580A JPS5783036A (en) 1980-11-10 1980-11-10 Cleaning device for semiconductor material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15792580A JPS5783036A (en) 1980-11-10 1980-11-10 Cleaning device for semiconductor material

Publications (1)

Publication Number Publication Date
JPS5783036A true JPS5783036A (en) 1982-05-24

Family

ID=15660456

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15792580A Pending JPS5783036A (en) 1980-11-10 1980-11-10 Cleaning device for semiconductor material

Country Status (1)

Country Link
JP (1) JPS5783036A (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5974887U (en) * 1982-11-09 1984-05-21 ソニー株式会社 cleaning equipment
EP0271958A2 (en) * 1986-12-19 1988-06-22 Philips Electronics Uk Limited Apparatus suitable for processing semiconductor slices
JPS63177034U (en) * 1987-05-06 1988-11-16
JPS63177031U (en) * 1987-05-06 1988-11-16
US5148823A (en) * 1990-10-16 1992-09-22 Verteg, Inc. Single chamber megasonic energy cleaner
JPH06349803A (en) * 1993-06-04 1994-12-22 Nec Corp Semiconductor substrate cleaning device
US5488964A (en) * 1991-05-08 1996-02-06 Tokyo Electron Limited Washing apparatus, and washing method
US5540247A (en) * 1993-12-08 1996-07-30 Dainippon Screen Mfg. Co., Ltd. Immersion-type apparatus for processing substrates
CN102247928A (en) * 2011-05-11 2011-11-23 江西旭阳雷迪高科技股份有限公司 Filtration device and filtration process thereof
CN112701185A (en) * 2020-12-17 2021-04-23 常州比太科技有限公司 Groove type process device for solar cell and spraying cleaning method

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5974887U (en) * 1982-11-09 1984-05-21 ソニー株式会社 cleaning equipment
JPS6231192Y2 (en) * 1982-11-09 1987-08-10
EP0271958A2 (en) * 1986-12-19 1988-06-22 Philips Electronics Uk Limited Apparatus suitable for processing semiconductor slices
JPS63177034U (en) * 1987-05-06 1988-11-16
JPS63177031U (en) * 1987-05-06 1988-11-16
US5148823A (en) * 1990-10-16 1992-09-22 Verteg, Inc. Single chamber megasonic energy cleaner
US5488964A (en) * 1991-05-08 1996-02-06 Tokyo Electron Limited Washing apparatus, and washing method
US5782990A (en) * 1991-05-08 1998-07-21 Tokyo Electron Limited Method for washing objects
JPH06349803A (en) * 1993-06-04 1994-12-22 Nec Corp Semiconductor substrate cleaning device
US5540247A (en) * 1993-12-08 1996-07-30 Dainippon Screen Mfg. Co., Ltd. Immersion-type apparatus for processing substrates
CN102247928A (en) * 2011-05-11 2011-11-23 江西旭阳雷迪高科技股份有限公司 Filtration device and filtration process thereof
CN112701185A (en) * 2020-12-17 2021-04-23 常州比太科技有限公司 Groove type process device for solar cell and spraying cleaning method

Similar Documents

Publication Publication Date Title
KR890002137B1 (en) Moisturize treatment devices
US5259407A (en) Surface treatment method and apparatus for a semiconductor wafer
US4997490A (en) Method of cleaning and rinsing wafers
US4361163A (en) Apparatus for washing semiconductor materials
JPS5783036A (en) Cleaning device for semiconductor material
JPH01120828A (en) Automatic cleaning device for semiconductor wafer
JPS6457624A (en) Cleaning equipment
JPS61247034A (en) Cleaning method of semiconductor slice
JPH04152525A (en) Process tank for wet process apparatus
JPS6169983A (en) Processing device
JPH0437131A (en) Pure water washing vessel for semiconductor wafer and washing thereof
JPH04336430A (en) Cleaning method
JPS6481230A (en) Treatment device
JPS5494274A (en) Liquid terating device of semiconductor wafers
JPS62190729A (en) Washing apparatus
CN210358301U (en) Quartz boat belt cleaning device
JPS5710239A (en) Washing method and apparatus thereof
JPS647622A (en) Device for treatment of semiconductor substrate
JPH01138721A (en) Wet etching device
JPS6412532A (en) Cleaning device
JPS63179531A (en) Method for washing semiconductor substrate with water
JPS6457721A (en) Wafer cleaning equipment
JPS6455839A (en) Wafer treating basket and treating method for wafer
JPS5871630A (en) Wafer processing method and device using processing solution
JPS63246826A (en) Washing method for semiconductor wafer with pure water