JPS647622A - Device for treatment of semiconductor substrate - Google Patents
Device for treatment of semiconductor substrateInfo
- Publication number
- JPS647622A JPS647622A JP16291387A JP16291387A JPS647622A JP S647622 A JPS647622 A JP S647622A JP 16291387 A JP16291387 A JP 16291387A JP 16291387 A JP16291387 A JP 16291387A JP S647622 A JPS647622 A JP S647622A
- Authority
- JP
- Japan
- Prior art keywords
- tank
- liquid
- semiconductor substrate
- face
- sidewall
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE:To reduce fine particles to be adhered to the surface of a semiconductor substrate and to improve quality and yield by providing an injection mechanism for spraying fluid to the liquid face of a treating tank to exhaust floating material on the liquid face out of the tank in addition to an overflow type circulation filtering system to exhaust the fine particles out of the tank without being left on the liquid face. CONSTITUTION:A device for treating a semiconductor substrate with liquid has a treating tank 1 for containing the substrate, circulation filtering mechanisms 4-6 for overflowing the liquid from the tank 1 to circulate to filter the liquid to the tank 1, and injection mechanisms 7-9, 3 for spraying the liquid to the liquid face of the tank 1 to exhaust floating material on the liquid face out of the tank. For example, an opening 2 for overflowing treatment liquid is formed at the upper edge of one sidewall of the tank 1, and an injection port 3 for injecting N2 gas is formed at the inside of the upper edge of the other sidewall. The N2 gas supplied from a supply pipe 8 through a filter 7 is introduced by a conduit provided in the sidewall of the tank 1 to the port 3 and sprayed toward the liquid face of the treatment liquid from the Port 3.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16291387A JPS647622A (en) | 1987-06-30 | 1987-06-30 | Device for treatment of semiconductor substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16291387A JPS647622A (en) | 1987-06-30 | 1987-06-30 | Device for treatment of semiconductor substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS647622A true JPS647622A (en) | 1989-01-11 |
Family
ID=15763608
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16291387A Pending JPS647622A (en) | 1987-06-30 | 1987-06-30 | Device for treatment of semiconductor substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS647622A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0368138A (en) * | 1989-08-05 | 1991-03-25 | Fujitsu Ltd | Cleaning device |
JPH09181034A (en) * | 1995-12-18 | 1997-07-11 | Lg Semicon Co Ltd | Semiconductor wafer washer and semiconductor wafer washing method |
JPH09186126A (en) * | 1995-12-19 | 1997-07-15 | Lg Semicon Co Ltd | Cleaning device for semiconductor wafer |
CN102553852A (en) * | 2010-12-28 | 2012-07-11 | 北京京东方光电科技有限公司 | Cleaning device |
JP2019053294A (en) * | 2017-09-13 | 2019-04-04 | 住友化学株式会社 | Method and system for forming polarizer film |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60229339A (en) * | 1984-04-26 | 1985-11-14 | Hitachi Plant Eng & Constr Co Ltd | Wet type washing device |
-
1987
- 1987-06-30 JP JP16291387A patent/JPS647622A/en active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60229339A (en) * | 1984-04-26 | 1985-11-14 | Hitachi Plant Eng & Constr Co Ltd | Wet type washing device |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0368138A (en) * | 1989-08-05 | 1991-03-25 | Fujitsu Ltd | Cleaning device |
JPH09181034A (en) * | 1995-12-18 | 1997-07-11 | Lg Semicon Co Ltd | Semiconductor wafer washer and semiconductor wafer washing method |
JPH09186126A (en) * | 1995-12-19 | 1997-07-15 | Lg Semicon Co Ltd | Cleaning device for semiconductor wafer |
CN102553852A (en) * | 2010-12-28 | 2012-07-11 | 北京京东方光电科技有限公司 | Cleaning device |
JP2019053294A (en) * | 2017-09-13 | 2019-04-04 | 住友化学株式会社 | Method and system for forming polarizer film |
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