JPS5494274A - Liquid terating device of semiconductor wafers - Google Patents
Liquid terating device of semiconductor wafersInfo
- Publication number
- JPS5494274A JPS5494274A JP88978A JP88978A JPS5494274A JP S5494274 A JPS5494274 A JP S5494274A JP 88978 A JP88978 A JP 88978A JP 88978 A JP88978 A JP 88978A JP S5494274 A JPS5494274 A JP S5494274A
- Authority
- JP
- Japan
- Prior art keywords
- substrates
- vessel
- liquid
- terating
- semiconductor wafers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
Abstract
PURPOSE: To treat substrates by vertically moving a vessel which has resistance to treating liquid and permeates the liquid within a treating liquid vessel.
CONSTITUTION: Pure water is introduced through the pipe 1a on the bottom and is overflown in a vessel 1. A net 1b is provided near the bottom. A vessel 2 is constituted by a material of not eluting into water and contaminating substrates 3 and by a porous material or netting. The substrates 3 of such constitution are vertically moved by a driving device 4 via handle 2 and hook 4a. Cleaning the substrates in this way reduces the substrate treatment time and lets the substrates be evenly treated.
COPYRIGHT: (C)1979,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP88978A JPS5494274A (en) | 1978-01-10 | 1978-01-10 | Liquid terating device of semiconductor wafers |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP88978A JPS5494274A (en) | 1978-01-10 | 1978-01-10 | Liquid terating device of semiconductor wafers |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5494274A true JPS5494274A (en) | 1979-07-25 |
Family
ID=11486235
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP88978A Pending JPS5494274A (en) | 1978-01-10 | 1978-01-10 | Liquid terating device of semiconductor wafers |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5494274A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58158440U (en) * | 1982-04-16 | 1983-10-22 | 沖電気工業株式会社 | Wafer cleaning equipment |
JPS6043834A (en) * | 1983-08-20 | 1985-03-08 | Mitsubishi Electric Corp | Washing device for semiconductor wafer |
JPS61171244U (en) * | 1985-04-12 | 1986-10-24 |
-
1978
- 1978-01-10 JP JP88978A patent/JPS5494274A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58158440U (en) * | 1982-04-16 | 1983-10-22 | 沖電気工業株式会社 | Wafer cleaning equipment |
JPS6043834A (en) * | 1983-08-20 | 1985-03-08 | Mitsubishi Electric Corp | Washing device for semiconductor wafer |
JPS61171244U (en) * | 1985-04-12 | 1986-10-24 | ||
JPH0234823Y2 (en) * | 1985-04-12 | 1990-09-19 |
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