JPS58158440U - Wafer cleaning equipment - Google Patents

Wafer cleaning equipment

Info

Publication number
JPS58158440U
JPS58158440U JP5445982U JP5445982U JPS58158440U JP S58158440 U JPS58158440 U JP S58158440U JP 5445982 U JP5445982 U JP 5445982U JP 5445982 U JP5445982 U JP 5445982U JP S58158440 U JPS58158440 U JP S58158440U
Authority
JP
Japan
Prior art keywords
wafer cleaning
wafers
wafer
cleaning equipment
cleaning apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5445982U
Other languages
Japanese (ja)
Inventor
由夫 伊東
Original Assignee
沖電気工業株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 沖電気工業株式会社 filed Critical 沖電気工業株式会社
Priority to JP5445982U priority Critical patent/JPS58158440U/en
Publication of JPS58158440U publication Critical patent/JPS58158440U/en
Pending legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は従来のウェハ洗浄装置を示す断面図、第２図は
同じくその側断面図、第３図は同じくその平面図、第４
図、第５図、第６図、第７図はそれぞれ本考案ウェハ洗
浄装置の実施例を示す断面図である。 １・・・・・・溶液槽、２，２２・・・・・・ウェハ運
搬治具、２ａ・・・・・・箱型ケース、２ｂ・・・・・
・ガイド壁、３・・・・・・溶液、４・・・・・・ウェ
ハ、５・・・・・・突起、５ａ・・曲尺、６・・・・・
・吊具、７ａ、　　７ｂ・・・・・・保持具。 、−第５図 第６図”FIG. 1 is a sectional view showing a conventional wafer cleaning apparatus, FIG. 2 is a side sectional view thereof, FIG. 3 is a plan view thereof, and FIG.
5, 6, and 7 are cross-sectional views showing embodiments of the wafer cleaning apparatus of the present invention. 1... Solution tank, 2, 22... Wafer transport jig, 2a... Box-shaped case, 2b...
・Guide wall, 3...solution, 4...wafer, 5...protrusion, 5a...curved length, 6...
- Hanging tools, 7a, 7b...Holding tools. ,-Fig. 5, Fig. 6”

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 蓋のない箱型ケースに内側両サイドから下方部分にかけ
て等間隔のガイド壁のついたウェハ運搬治具に複数のウ
ェハを前記ガイド壁各々に添い立てかけて溶液槽の溶液
に浸して前記ウェハのエツチング又は洗浄を行うウェハ
洗浄装置において、ウェハ運搬治具内の複数のウェハ相
互が等間隔で傾斜するような傾斜手段を設けたことを特
徴とするウェハ洗浄装置。A plurality of wafers are placed against each of the guide walls in a wafer transport jig, which is a box-shaped case without a lid and has guide walls spaced at equal intervals from both inner sides to the lower part, and the wafers are etched by being immersed in a solution in a solution bath. Alternatively, a wafer cleaning apparatus for cleaning, characterized in that a wafer cleaning apparatus is provided with a tilting means for tilting a plurality of wafers in a wafer transport jig at equal intervals.
JP5445982U 1982-04-16 1982-04-16 Wafer cleaning equipment Pending JPS58158440U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5445982U JPS58158440U (en) 1982-04-16 1982-04-16 Wafer cleaning equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5445982U JPS58158440U (en) 1982-04-16 1982-04-16 Wafer cleaning equipment

Publications (1)

Publication Number Publication Date
JPS58158440U true JPS58158440U (en) 1983-10-22

Family

ID=30065081

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5445982U Pending JPS58158440U (en) 1982-04-16 1982-04-16 Wafer cleaning equipment

Country Status (1)

Country Link
JP (1) JPS58158440U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60223111A (en) * 1984-04-20 1985-11-07 Hitachi Ltd Housing case

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5449071A (en) * 1977-09-27 1979-04-18 Toshiba Corp Processing method by aqueous solution of photo resist layer
JPS5494274A (en) * 1978-01-10 1979-07-25 Toshiba Corp Liquid terating device of semiconductor wafers
JPS55128834A (en) * 1979-03-28 1980-10-06 Nec Corp Method of ultrasonically cleaning semiconductor wafer
JPS56126930A (en) * 1980-03-12 1981-10-05 Hitachi Ltd Washing tank
JPS5887832A (en) * 1981-11-20 1983-05-25 Toshiba Corp Semiconductor treating device

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5449071A (en) * 1977-09-27 1979-04-18 Toshiba Corp Processing method by aqueous solution of photo resist layer
JPS5494274A (en) * 1978-01-10 1979-07-25 Toshiba Corp Liquid terating device of semiconductor wafers
JPS55128834A (en) * 1979-03-28 1980-10-06 Nec Corp Method of ultrasonically cleaning semiconductor wafer
JPS56126930A (en) * 1980-03-12 1981-10-05 Hitachi Ltd Washing tank
JPS5887832A (en) * 1981-11-20 1983-05-25 Toshiba Corp Semiconductor treating device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60223111A (en) * 1984-04-20 1985-11-07 Hitachi Ltd Housing case

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