JPS55128834A - Method of ultrasonically cleaning semiconductor wafer - Google Patents
Method of ultrasonically cleaning semiconductor waferInfo
- Publication number
- JPS55128834A JPS55128834A JP3648579A JP3648579A JPS55128834A JP S55128834 A JPS55128834 A JP S55128834A JP 3648579 A JP3648579 A JP 3648579A JP 3648579 A JP3648579 A JP 3648579A JP S55128834 A JPS55128834 A JP S55128834A
- Authority
- JP
- Japan
- Prior art keywords
- wafers
- cleaning
- tank
- semiconductor wafer
- elevationally
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE: To improve the cleaning capacity of a method of ultrasonically cleaning a semiconductor wafer by dipping a plurality of wafers in an ultrasonic cleaning tank, mounting the wafers while disposing the wafers in parallel with liquid surface and elevationally vibrating the wafers when cleaning the wafers.
CONSTITUTION: An ultrasonic cleaning tank 3 of vertical shape is partitioned laterally at the intermediate portion thereof, a cleaning solution 7 is filled in the upper portion of the tank 3, and an ultrasonic vibrator 1 is arranged in the lower portion of the tank 3. A semiconductor wafer mounting jig 9 hung by an elevationally moving mechanism 6 is dipped in the solution 7 next. When a plurality of semiconductor wafers 2 contained in the jig 9 are elevationally vibrated, the wafers 2 are so arranged as to become on the surfaces in parallel with the liquid surface at an interval therebetween. Thus, standing ultrasonic wave 8 of equal intensity is transmitted to the surfaces to be cleaned of the wafers so as to effectively separate substances adhered onto the surfaces of the wafers 2.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3648579A JPS55128834A (en) | 1979-03-28 | 1979-03-28 | Method of ultrasonically cleaning semiconductor wafer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3648579A JPS55128834A (en) | 1979-03-28 | 1979-03-28 | Method of ultrasonically cleaning semiconductor wafer |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS55128834A true JPS55128834A (en) | 1980-10-06 |
Family
ID=12471115
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3648579A Pending JPS55128834A (en) | 1979-03-28 | 1979-03-28 | Method of ultrasonically cleaning semiconductor wafer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55128834A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58158440U (en) * | 1982-04-16 | 1983-10-22 | 沖電気工業株式会社 | Wafer cleaning equipment |
| US4514232A (en) * | 1982-12-15 | 1985-04-30 | International Business Machines Corporation | Process for stripping silicon oil base thermal grease |
| JPS6079588U (en) * | 1983-11-08 | 1985-06-03 | 海上電機株式会社 | Vibration feedback type ultrasonic cleaning device |
| JPS6143430A (en) * | 1984-08-07 | 1986-03-03 | Mitsubishi Electric Corp | Cassette cleaner |
| US4643774A (en) * | 1984-04-19 | 1987-02-17 | Sharp Corporation | Method of washing and drying substrates |
-
1979
- 1979-03-28 JP JP3648579A patent/JPS55128834A/en active Pending
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58158440U (en) * | 1982-04-16 | 1983-10-22 | 沖電気工業株式会社 | Wafer cleaning equipment |
| US4514232A (en) * | 1982-12-15 | 1985-04-30 | International Business Machines Corporation | Process for stripping silicon oil base thermal grease |
| JPS6079588U (en) * | 1983-11-08 | 1985-06-03 | 海上電機株式会社 | Vibration feedback type ultrasonic cleaning device |
| JPS6242796Y2 (en) * | 1983-11-08 | 1987-11-02 | ||
| US4643774A (en) * | 1984-04-19 | 1987-02-17 | Sharp Corporation | Method of washing and drying substrates |
| US4714086A (en) * | 1984-04-19 | 1987-12-22 | Sharp Corporation | Apparatus for washing and drying substrates |
| JPS6143430A (en) * | 1984-08-07 | 1986-03-03 | Mitsubishi Electric Corp | Cassette cleaner |
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