JPS6412532A - Cleaning device - Google Patents
Cleaning deviceInfo
- Publication number
- JPS6412532A JPS6412532A JP16908287A JP16908287A JPS6412532A JP S6412532 A JPS6412532 A JP S6412532A JP 16908287 A JP16908287 A JP 16908287A JP 16908287 A JP16908287 A JP 16908287A JP S6412532 A JPS6412532 A JP S6412532A
- Authority
- JP
- Japan
- Prior art keywords
- tank
- flow
- uniformly
- water
- wafers
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
PURPOSE:To cleanse wafers uniformly and effectively by a method wherein the flow of water in a tank is made uniform by rectifier members. CONSTITUTION:Water to flow in through a feedwater port 3 is caused to flow uniformly on the whole feedwater surface by a straightening member 5 mounted on a cap 6 and passes through a straightening member 5 mounted on the lower part of a tank 1 to flow out through a drainage port 4. The cleaning of the surfaces of wafers held in a basket 2 in the tank 1 is uniformly performed from the upper direction toward the lower direction by a water current in a constant direction, fine particles removed from the wafer surfaces flow out without remaining in the tank 1 and the interior of the tank is also held cleanly.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16908287A JPS6412532A (en) | 1987-07-06 | 1987-07-06 | Cleaning device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16908287A JPS6412532A (en) | 1987-07-06 | 1987-07-06 | Cleaning device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6412532A true JPS6412532A (en) | 1989-01-17 |
Family
ID=15879989
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16908287A Pending JPS6412532A (en) | 1987-07-06 | 1987-07-06 | Cleaning device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6412532A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04104871A (en) * | 1990-08-21 | 1992-04-07 | Fujitsu Ltd | Washing tank |
US5467020A (en) * | 1994-03-29 | 1995-11-14 | International Business Machines Corporation | Testing fixture and method for circuit traces on a flexible substrate |
JPH0985201A (en) * | 1995-07-17 | 1997-03-31 | Dan Kagaku:Kk | Downward uniflux cleaning tank |
-
1987
- 1987-07-06 JP JP16908287A patent/JPS6412532A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04104871A (en) * | 1990-08-21 | 1992-04-07 | Fujitsu Ltd | Washing tank |
US5467020A (en) * | 1994-03-29 | 1995-11-14 | International Business Machines Corporation | Testing fixture and method for circuit traces on a flexible substrate |
JPH0985201A (en) * | 1995-07-17 | 1997-03-31 | Dan Kagaku:Kk | Downward uniflux cleaning tank |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS6412532A (en) | Cleaning device | |
JO1827B1 (en) | Water treatment method and apparatus | |
JPS6457624A (en) | Cleaning equipment | |
MY115356A (en) | Hf cleaning method of silicon wafers | |
JPS5719229A (en) | Ultrasonic fine coal cleaner | |
JPS57178327A (en) | Washer | |
JPS57170537A (en) | Treating method and device for semiconductor wafer | |
JPS6457721A (en) | Wafer cleaning equipment | |
DE3865995D1 (en) | MOBILE DEVICE FOR SUCTIONING HARMFUL LIQUIDS. | |
JPH05102118A (en) | Method and apparatus for washing semiconductor wafer | |
JPS6442134A (en) | Apparatus for cleaning semiconductor wafer | |
JPS5297265A (en) | Bubbling cleaning method for liquid pipe system | |
EP0231100A3 (en) | Water cleaning system | |
JPS5645017A (en) | Moving method and apparatus for semiconductor wafer | |
JPS54103266A (en) | Ultrasonic cleaner | |
JPS57160130A (en) | Wafer washing and drying apparatus | |
JPS56140876A (en) | Cleaning method of slurry for making laver sheet and device used therefor | |
JPS57131370A (en) | Treating device for chemical solution | |
JPH0655100A (en) | Wet type electrostatic dust precipitation method | |
DE3363073D1 (en) | Device for the admission of detergent and rinsing water in a dental care equipment | |
JPS57154854A (en) | Processing device for plate type material | |
JPS5871630A (en) | Wafer processing method and device using processing solution | |
JPS5494274A (en) | Liquid terating device of semiconductor wafers | |
RU98115197A (en) | METHOD OF GALVANOCHEMICAL PROCESSING OF PARTS, IN PARTICULAR, ON SUSPENSIONS, AT USE OF HEATED ELECTROLYTES (SOLUTIONS) OF PROCESS BATHROOMS | |
JPS57159027A (en) | Wafer cleaning device |