JPS6481230A - Treatment device - Google Patents

Treatment device

Info

Publication number
JPS6481230A
JPS6481230A JP23722287A JP23722287A JPS6481230A JP S6481230 A JPS6481230 A JP S6481230A JP 23722287 A JP23722287 A JP 23722287A JP 23722287 A JP23722287 A JP 23722287A JP S6481230 A JPS6481230 A JP S6481230A
Authority
JP
Japan
Prior art keywords
tank
treating
agent solution
disposed
supplied
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP23722287A
Other languages
Japanese (ja)
Inventor
Kazuaki Mizogami
Masayoshi Kanematsu
Tetsuya Takagaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Renesas Eastern Japan Semiconductor Inc
Original Assignee
Hitachi Tokyo Electronics Co Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Tokyo Electronics Co Ltd, Hitachi Ltd filed Critical Hitachi Tokyo Electronics Co Ltd
Priority to JP23722287A priority Critical patent/JPS6481230A/en
Publication of JPS6481230A publication Critical patent/JPS6481230A/en
Pending legal-status Critical Current

Links

Landscapes

  • Weting (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PURPOSE:To realize a high reliability treatment by preventing foreign matter from adhering to the surface of a workpiece to be treated by constructing the title treater device such that the workpiece is vertically moved between a liquid treating part and a vapor treating part disposed in a treating space for undergoing a plurality of treatments without interruption. CONSTITUTION:A treater device 1 includes a vertically elongated treating tank 2, which tank is supplied with inactive gas through a gas supply tube 16. Then, a shutter mechanism 3 is opened at a pressure higher than the atmospheric one, and a wafer 4 is lowered into the treating tank 2. Simultaneously, a liquid treating part 6 disposed on the tank bottom is supplied with an agent solution 20 from an agent solution supply tube 17 and filled therewith. The wafer 4 is allowed to pass through a vapor treating part 5 disposed on the upper part of the tank, lowered, and dipped in the agent solution 20 in the liquid treating part 6 for a predetermined etching treatment. With completion of the etching, the agent solution 20 is discharged into a storage tank 24 disposed outside the treating tank, and a cleaning solution 21 is supplied from a cleaning solution supply tube 10 to wash out the agent solution 20 adhering to the surface.
JP23722287A 1987-09-24 1987-09-24 Treatment device Pending JPS6481230A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23722287A JPS6481230A (en) 1987-09-24 1987-09-24 Treatment device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23722287A JPS6481230A (en) 1987-09-24 1987-09-24 Treatment device

Publications (1)

Publication Number Publication Date
JPS6481230A true JPS6481230A (en) 1989-03-27

Family

ID=17012189

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23722287A Pending JPS6481230A (en) 1987-09-24 1987-09-24 Treatment device

Country Status (1)

Country Link
JP (1) JPS6481230A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0832697A2 (en) * 1996-09-27 1998-04-01 Tokyo Electron Limited Apparatus for and method of cleaning objects to be processed
US6045624A (en) * 1996-09-27 2000-04-04 Tokyo Electron Limited Apparatus for and method of cleaning objects to be processed
US6276378B1 (en) 1997-08-18 2001-08-21 Tokyo Electron Limited Apparatus for cleaning both sides of substrate
US6319329B1 (en) 1997-01-24 2001-11-20 Tokyo Electron Limited Method of cleaning objects to be processed
US6413355B1 (en) 1996-09-27 2002-07-02 Tokyo Electron Limited Apparatus for and method of cleaning objects to be processed
US6431184B1 (en) 1997-08-05 2002-08-13 Tokyo Electron Limited Apparatus and method for washing substrate

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0832697A2 (en) * 1996-09-27 1998-04-01 Tokyo Electron Limited Apparatus for and method of cleaning objects to be processed
EP0832697A3 (en) * 1996-09-27 1999-09-22 Tokyo Electron Limited Apparatus for and method of cleaning objects to be processed
US6045624A (en) * 1996-09-27 2000-04-04 Tokyo Electron Limited Apparatus for and method of cleaning objects to be processed
US6050275A (en) * 1996-09-27 2000-04-18 Tokyo Electron Limited Apparatus for and method of cleaning objects to be processed
US6413355B1 (en) 1996-09-27 2002-07-02 Tokyo Electron Limited Apparatus for and method of cleaning objects to be processed
US6746543B2 (en) 1996-09-27 2004-06-08 Tokyo Electron Limited Apparatus for and method of cleaning objects to be processed
US6319329B1 (en) 1997-01-24 2001-11-20 Tokyo Electron Limited Method of cleaning objects to be processed
US6491045B2 (en) 1997-01-24 2002-12-10 Tokyo Electron Limited Apparatus for and method of cleaning object to be processed
US6431184B1 (en) 1997-08-05 2002-08-13 Tokyo Electron Limited Apparatus and method for washing substrate
US6276378B1 (en) 1997-08-18 2001-08-21 Tokyo Electron Limited Apparatus for cleaning both sides of substrate

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