JPS6481230A - Treatment device - Google Patents
Treatment deviceInfo
- Publication number
- JPS6481230A JPS6481230A JP23722287A JP23722287A JPS6481230A JP S6481230 A JPS6481230 A JP S6481230A JP 23722287 A JP23722287 A JP 23722287A JP 23722287 A JP23722287 A JP 23722287A JP S6481230 A JPS6481230 A JP S6481230A
- Authority
- JP
- Japan
- Prior art keywords
- tank
- treating
- agent solution
- disposed
- supplied
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Weting (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
PURPOSE:To realize a high reliability treatment by preventing foreign matter from adhering to the surface of a workpiece to be treated by constructing the title treater device such that the workpiece is vertically moved between a liquid treating part and a vapor treating part disposed in a treating space for undergoing a plurality of treatments without interruption. CONSTITUTION:A treater device 1 includes a vertically elongated treating tank 2, which tank is supplied with inactive gas through a gas supply tube 16. Then, a shutter mechanism 3 is opened at a pressure higher than the atmospheric one, and a wafer 4 is lowered into the treating tank 2. Simultaneously, a liquid treating part 6 disposed on the tank bottom is supplied with an agent solution 20 from an agent solution supply tube 17 and filled therewith. The wafer 4 is allowed to pass through a vapor treating part 5 disposed on the upper part of the tank, lowered, and dipped in the agent solution 20 in the liquid treating part 6 for a predetermined etching treatment. With completion of the etching, the agent solution 20 is discharged into a storage tank 24 disposed outside the treating tank, and a cleaning solution 21 is supplied from a cleaning solution supply tube 10 to wash out the agent solution 20 adhering to the surface.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23722287A JPS6481230A (en) | 1987-09-24 | 1987-09-24 | Treatment device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23722287A JPS6481230A (en) | 1987-09-24 | 1987-09-24 | Treatment device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6481230A true JPS6481230A (en) | 1989-03-27 |
Family
ID=17012189
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP23722287A Pending JPS6481230A (en) | 1987-09-24 | 1987-09-24 | Treatment device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6481230A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0832697A2 (en) * | 1996-09-27 | 1998-04-01 | Tokyo Electron Limited | Apparatus for and method of cleaning objects to be processed |
US6045624A (en) * | 1996-09-27 | 2000-04-04 | Tokyo Electron Limited | Apparatus for and method of cleaning objects to be processed |
US6276378B1 (en) | 1997-08-18 | 2001-08-21 | Tokyo Electron Limited | Apparatus for cleaning both sides of substrate |
US6319329B1 (en) | 1997-01-24 | 2001-11-20 | Tokyo Electron Limited | Method of cleaning objects to be processed |
US6413355B1 (en) | 1996-09-27 | 2002-07-02 | Tokyo Electron Limited | Apparatus for and method of cleaning objects to be processed |
US6431184B1 (en) | 1997-08-05 | 2002-08-13 | Tokyo Electron Limited | Apparatus and method for washing substrate |
-
1987
- 1987-09-24 JP JP23722287A patent/JPS6481230A/en active Pending
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0832697A2 (en) * | 1996-09-27 | 1998-04-01 | Tokyo Electron Limited | Apparatus for and method of cleaning objects to be processed |
EP0832697A3 (en) * | 1996-09-27 | 1999-09-22 | Tokyo Electron Limited | Apparatus for and method of cleaning objects to be processed |
US6045624A (en) * | 1996-09-27 | 2000-04-04 | Tokyo Electron Limited | Apparatus for and method of cleaning objects to be processed |
US6050275A (en) * | 1996-09-27 | 2000-04-18 | Tokyo Electron Limited | Apparatus for and method of cleaning objects to be processed |
US6413355B1 (en) | 1996-09-27 | 2002-07-02 | Tokyo Electron Limited | Apparatus for and method of cleaning objects to be processed |
US6746543B2 (en) | 1996-09-27 | 2004-06-08 | Tokyo Electron Limited | Apparatus for and method of cleaning objects to be processed |
US6319329B1 (en) | 1997-01-24 | 2001-11-20 | Tokyo Electron Limited | Method of cleaning objects to be processed |
US6491045B2 (en) | 1997-01-24 | 2002-12-10 | Tokyo Electron Limited | Apparatus for and method of cleaning object to be processed |
US6431184B1 (en) | 1997-08-05 | 2002-08-13 | Tokyo Electron Limited | Apparatus and method for washing substrate |
US6276378B1 (en) | 1997-08-18 | 2001-08-21 | Tokyo Electron Limited | Apparatus for cleaning both sides of substrate |
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