JPS62295418A - レジスト処理方法 - Google Patents

レジスト処理方法

Info

Publication number
JPS62295418A
JPS62295418A JP61138276A JP13827686A JPS62295418A JP S62295418 A JPS62295418 A JP S62295418A JP 61138276 A JP61138276 A JP 61138276A JP 13827686 A JP13827686 A JP 13827686A JP S62295418 A JPS62295418 A JP S62295418A
Authority
JP
Japan
Prior art keywords
temperature
photoresist
heat resistance
predetermined temperature
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP61138276A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0231857B2 (enrdf_load_stackoverflow
Inventor
Shinji Suzuki
信二 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ushio Denki KK
Ushio Inc
Original Assignee
Ushio Denki KK
Ushio Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ushio Denki KK, Ushio Inc filed Critical Ushio Denki KK
Priority to JP61138276A priority Critical patent/JPS62295418A/ja
Publication of JPS62295418A publication Critical patent/JPS62295418A/ja
Publication of JPH0231857B2 publication Critical patent/JPH0231857B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature

Landscapes

  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Drying Of Semiconductors (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP61138276A 1986-06-16 1986-06-16 レジスト処理方法 Granted JPS62295418A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61138276A JPS62295418A (ja) 1986-06-16 1986-06-16 レジスト処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61138276A JPS62295418A (ja) 1986-06-16 1986-06-16 レジスト処理方法

Publications (2)

Publication Number Publication Date
JPS62295418A true JPS62295418A (ja) 1987-12-22
JPH0231857B2 JPH0231857B2 (enrdf_load_stackoverflow) 1990-07-17

Family

ID=15218130

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61138276A Granted JPS62295418A (ja) 1986-06-16 1986-06-16 レジスト処理方法

Country Status (1)

Country Link
JP (1) JPS62295418A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003527738A (ja) * 1998-07-13 2003-09-16 エーケーティー株式会社 基板ハンドリングチャンバ内の基板支持体の加熱
WO2004109779A1 (ja) * 2003-06-06 2004-12-16 Tokyo Electron Limited 基板の処理膜の表面荒れを改善する方法及び基板の処理装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003527738A (ja) * 1998-07-13 2003-09-16 エーケーティー株式会社 基板ハンドリングチャンバ内の基板支持体の加熱
WO2004109779A1 (ja) * 2003-06-06 2004-12-16 Tokyo Electron Limited 基板の処理膜の表面荒れを改善する方法及び基板の処理装置
US7875420B2 (en) 2003-06-06 2011-01-25 Tokyo Electron Limited Method for improving surface roughness of processed film of substrate and apparatus for processing substrate
US8646403B2 (en) 2003-06-06 2014-02-11 Tokyo Electron Limited Method for improving surface roughness of processed film of substrate and apparatus for processing substrate

Also Published As

Publication number Publication date
JPH0231857B2 (enrdf_load_stackoverflow) 1990-07-17

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term